| Patent application number | Description | Published |
|---|
| 20080266929 | REFERENCE CELL LAYOUT WITH ENHANCED RTN IMMUNITY - A reference cell layout includes a plurality of active areas, in parallel to each other, and a first contact of the active areas, and a first gate, the first contact shorting the active areas. A memory device includes the reference cell layout and a corresponding array of memory cells having active areas sized substantially identical to the active areas of the reference cell layout and plural second contacts respectively contacting the active areas of the memory cells. | 10-30-2008 |
| 20110248333 | INTEGRATION OF RESISTORS AND CAPACITORS IN CHARGE TRAP MEMORY DEVICE FABRICATION - A semiconductor device structure and method to form the same. The semiconductor device structure includes a non-volatile charge trap memory device and a resistor or capacitor. A dielectric layer of a charge trap dielectric stack of the memory device is patterned to expose a portion of a first conductive layer peripheral to the memory device. A second conductive layer formed over the dielectric layer and on the exposed portion of the first conductive layer is patterned to form resistor or capacitor contacts and capacitor plates. | 10-13-2011 |
| 20120300546 | APPARATUS AND METHODS INCLUDING A BIPOLAR JUNCTION TRANSISTOR COUPLED TO A STRING OF MEMORY CELLS - Some embodiments include apparatus and methods having a string of memory cells, a conductive line and a bipolar junction transistor configured to selectively couple the string of memory cells to the conductive line. Other embodiments including additional apparatus and methods are described. | 11-29-2012 |
| 20130043505 | APPARATUSES AND METHODS COMPRISING A CHANNEL REGION HAVING DIFFERENT MINORITY CARRIER LIFETIMES - Apparatuses, such as memory devices, memory cell strings, and electronic systems, and methods of forming such apparatuses are shown. One such apparatus includes a channel region that has a minority carrier lifetime that is lower at one or more end portions, than in a middle portion. Other apparatuses and methods are also disclosed. | 02-21-2013 |
| 20140048956 | FORMING ARRAY CONTACTS IN SEMICONDUCTOR MEMORIES - Array contacts for semiconductor memories may be formed using a first set of parallel stripe masks and subsequently a second set of parallel stripe masks transverse to the first set. For example, one set of masks may be utilized to etch a dielectric layer, to form parallel spaced trenches. Then the trenches may be filled with a sacrificial material. That sacrificial material may then be masked transversely to its length and etched, for example. The resulting openings may be filled with a metal to form array contacts. | 02-20-2014 |
| 20140140134 | APPARATUS AND METHODS INCLUDING A BIPOLAR JUNCTION TRANSISTOR COUPLED TO A STRING OF MEMORY CELLS - Some embodiments include apparatus and methods having a string of memory cells, a conductive line and a bipolar junction transistor configured to selectively couple the string of memory cells to the conductive line. Other embodiments including additional apparatus and methods are described. | 05-22-2014 |
| 20140264447 | APPARATUSES AND METHODS COMPRISING A CHANNEL REGION HAVING DIFFERENT MINORITY CARRIER LIFETIMES - Apparatuses, such as memory devices, memory cell strings, and electronic systems, and methods of forming such apparatuses are shown. One such apparatus includes a channel region that has a minority carrier lifetime that is lower at one or more end portions, than in a middle portion. Other apparatuses and methods are also disclosed. | 09-18-2014 |
| 20140284812 | FORMING ARRAY CONTACTS IN SEMICONDUCTOR MEMORIES - Array contacts for semiconductor memories may be formed using a first set of parallel stripe masks and subsequently a second set of parallel stripe masks transverse to the first set. For example, one set of masks may be utilized to etch a dielectric layer, to form parallel spaced trenches. Then the trenches may be filled with a sacrificial material. That sacrificial material may then be masked transversely to its length and etched, for example. The resulting openings may be filled with a metal to form array contacts. | 09-25-2014 |
