Tatsuro Masuyama, Osaka-Shi JP
Tatsuro Masuyama, Osaka-Shi JP
Patent application number | Description | Published |
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20120100483 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, | 04-26-2012 |
20120315580 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A salt represented by formula (I): | 12-13-2012 |
20130022921 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). | 01-24-2013 |
20130177851 | PHOTORESIST COMPOSITION - A photoresist composition comprising | 07-11-2013 |
20140023971 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A photoresist composition comprising | 01-23-2014 |
20140030654 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A photoresist composition comprising | 01-30-2014 |
20150212407 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A salt which has a group represented by formula (a): | 07-30-2015 |
20150212408 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A salt which generates an acid by light irradiation, said salt comprising: | 07-30-2015 |