Patent application number | Description | Published |
20100304292 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-BB): | 12-02-2010 |
20100304294 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-AA): | 12-02-2010 |
20110039208 | PHOTORESIST COMPOSITION CONTAINING THE SAME - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): | 02-17-2011 |
20110039209 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME - The present invention provides a compound represented by the formula (C1): | 02-17-2011 |
20110065040 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): | 03-17-2011 |
20110065047 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): | 03-17-2011 |
20110200935 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): | 08-18-2011 |
20120100482 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, | 04-26-2012 |
20120219909 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), | 08-30-2012 |
20120264059 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), | 10-18-2012 |
20120270154 | RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME - The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): | 10-25-2012 |
20130040237 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A photoresist composition which comprises
| 02-14-2013 |