Patent application number | Description | Published |
20080297779 | INSPECTION DEVICE AND INSPECTION METHOD - An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value. | 12-04-2008 |
20090161095 | DEFECT INSPECTION SYSTEM - In a defect inspection system using a plurality of detectors such as an upright detector and an oblique detector, if illumination light and wafer height are adjusted to the detection field of view of one detector, a defocused image is detected by other remaining detectors, resulting in degradation of the detection sensitivity. The present invention solves this problem. | 06-25-2009 |
20110051131 | INSPECTION DEVICE AND INSPECTION METHOD - An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value. | 03-03-2011 |
20110075137 | DEFECT INSPECTION SYSTEM - In a defect inspection system using a plurality of detectors such as an upright detector and an oblique detector, if illumination light and wafer height are adjusted to the detection field of view of one detector, a defocused image is detected by other remaining detectors, resulting in degradation of the detection sensitivity. The present invention solves this problem. | 03-31-2011 |
20130033705 | INSPECTION DEVICE AND INSPECTION METHOD - An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value. | 02-07-2013 |
Patent application number | Description | Published |
20080203296 | Transmission Electron Microscope Provided with Electronic Spectroscope - In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis; a method for correcting magnification and position and a system for correcting magnification and position, both of which are capable of correcting measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis, are provided. | 08-28-2008 |
20080315097 | Charged particle beam apparatus and specimen holder - Information of a specimen holder or information of a specimen mounted on the specimen holder is stored in a memory inside the specimen holder mounted to an electron microscope. The memory is accessed to transmit the information of the specimen holder to the electron microscope, thereby ensuring that the user can use the specimen holder without mistaking characteristics of the specimen holder and danger of erroneous recording of the specimen information can be reduced. | 12-25-2008 |
20090242766 | TRANSMISSION ELECTRON MICROSCOPE HAVING ELECTRON SPECTROSCOPE - A transmission electron microscope is capable of correcting, with high efficiency and high accuracy, an electron energy loss spectrum extracted from each of measured portions included in an electron energy loss spectral image with two axes representing the amount of an energy loss and positional information on a measured portion. The transmission electron microscope has an electron spectroscope and a spectrum correction system. The spectrum correction system corrects a spectrum extracted from each measured portion included in an electron energy loss spectral image acquired from a sample based on a difference between a spectrum extracted from a standard portion of a standard spectral image and a spectrum extracted from a portion different from the standard portion. | 10-01-2009 |
20110240854 | TRANSMISSION ELECTRON MICROSCOPE HAVING ELECTRON SPECTROMETER - In a spectral image formed by two orthogonal axes, one of which is an axis of the amount of energy loss and the other of which is an axis of positional information, by the use of an electron spectrometer and a transmission electron microscope, distortion in the spectral image of a sample to be analyzed is corrected with high efficiency and high accuracy by comparing electron beam positions calculated from a two-dimensional electron beam position image formed by the two orthogonal axes (the axis of the amount of energy loss and the axis of positional information) with reference electron beam positions, and calculating amounts of the distortion based on the differences of the electron beam positions. Method and apparatus are offered which correct distortion in a spectral image with high efficiency and high accuracy, the image being formed by the two orthogonal axes (the axis of the amount of energy loss and the axis of positional information). | 10-06-2011 |