Patent application number | Description | Published |
20090206280 | CHARGED-BEAM EXPOSURE APPARATUS HAVING AN IMPROVED ALIGNMENT PRECISION AND EXPOSURE METHOD - The first charged-beam optical system, which is one of the charged-beam optical systems, detects first marks provided on the chips formed in the wafer. The positions of the chips made in the wafer are calculated from position data about the first marks detected. The charged-beam optical systems detect the second mark provided on a stage. The position of the beam generated by each charged-beam optical system is adjusted in accordance with position data about the second mark detected. The charged-beam optical systems are used in accordance with the positions of the chips, to thereby draw a pattern. | 08-20-2009 |
20090315223 | TEMPLATE AND PATTERN FORMING METHOD - A template includes a substrate, an element pattern formed on a surface of the substrate, and a light absorbing portion formed on or inside the substrate. | 12-24-2009 |
20100022036 | METHOD FOR FORMING PATTERN, AND TEMPLATE - According to an aspect of the present invention, there is provided a template including: a template substrate; patterns for forming device patterns on a wafer substrate; and a charging monitoring pattern, a size of the charging monitoring pattern being equal to a largest pattern in the patterns for forming the device patterns. | 01-28-2010 |
20100124601 | PATTERN FORMATION METHOD AND COMPUTER PROGRAM PRODUCT - A pattern forming method includes calculating amount of curable resin to be formed on a substrate, forming curable resin having the calculated amount on the substrate, filling a pattern of the template with the curable resin on the substrate by contacting the template with the curable resin on the substrate, curing the curable resin with the template being contacted with the curable resin, forming a pattern in the cured curable resin, which includes separating the template from the cured curable resin, and forming a pattern on the substrate based on the pattern formed in the curable resin, wherein the calculating the amount of curable resin to be formed on the substrate is performed based on a relationship between density or shape of a pattern to be formed on the template and filling time for filling the pattern to be formed on the template with the curable resin. | 05-20-2010 |
20100301508 | METHOD FOR FORMING AN IMPRINT PATTERN - A method for forming an imprint pattern includes: contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material; releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate; measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming; and comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not. | 12-02-2010 |
20120013042 | IMPRINT TEMPLATE AND PATTERN FORMING METHOD - Certain embodiments provide an imprint template which has a first member formed with patterns having concavities and convexities on one side thereof, and in the state in which the one side is contacted with a photocuring imprint material coated onto a substrate to be processed, cures the imprint material by light emitted from above the other side of the first member to transfer the patterns onto the imprint material. The template is provided with a second member in an end region thereof. The second member has a larger contact angle with respect to the imprint material than the first member. | 01-19-2012 |
20120222700 | TEMPLATE SUBSTRATE PROCESSING APPARATUS AND TEMPLATE SUBSTRATE PROCESSING METHOD - According to one embodiment, a template substrate processing apparatus used in imprint lithography, includes a stage which has a convex portion that engages with a concave portion formed at an underside of the template substrate. | 09-06-2012 |
20130064415 | TEMPLATE CLEANING APPARATUS AND TEMPLATE CLEANING METHOD - According to one embodiment, there is disclosed a template cleaning apparatus to clean a template for imprint. The template includes a concave-convex pattern and a groove portion, and an image obtaining unit which obtains an image of a region including a side surface of the groove portion of the template. The apparatus further includes a cleaning time determination (CTD) unit having a function to determine cleaning time of the template. The function includes determining the cleaning time by comparing the image obtained by the image obtaining unit with a previously obtained reference image. The apparatus further includes a cleaning unit which cleans the template, based on the cleaning time determined by the CTD unit. | 03-14-2013 |