Patent application number | Description | Published |
20080210868 | Transmission electron microscope - Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement. | 09-04-2008 |
20080237465 | Scanning electron microscope - A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens | 10-02-2008 |
20080315122 | CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM - The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel. | 12-25-2008 |
20090101817 | CHARGED PARTICLE APPLICATION APPARATUS - The present invention provides a highly sensitive, thin detector useful for observing low-voltage, high-resolution SEM images, and provides a charged particle beam application apparatus based on such a detector. The charged particle beam application apparatus includes a charged particle irradiation source, a charged particle optics for irradiating a sample with a charged particle beam emitted from the charged particle irradiation source, and an electron detection section for detecting electrons that are secondarily generated from the sample. The electron detection section includes a diode device that is a combination of a phosphor layer, which converts the electrons to an optical signal, and a device for converting the optical signal to electrons and subjecting the electrons to avalanche multiplication, or includes a diode device having an electron absorption region that is composed of at least a wide-gap semiconductor substrate with a bandgap greater than 2 eV. | 04-23-2009 |
20090173888 | Gas field ion source, charged particle microscope, and apparatus - A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature. | 07-09-2009 |
20090294697 | Charged particle beam apparatus - The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10 | 12-03-2009 |
20110089336 | CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME - Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher. | 04-21-2011 |
20110186735 | ELECTRON SOURCE, ELECTRON GUN, AND ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE USING IT - An electron source is implemented which has a lower work function of an electron emission surface, yields emitted electrons of a narrower energy bandwidth and higher current density, and lasts longer than existing Zr/O/W electron sources. Further, an electron microscope which yields an image of higher-resolution in a shorter time and an electron beam lithography device which yields higher throughput are also provided. The electron source comprises a needle-shaped electrode made of metal having its tip in a needle shape, a heating body which heats up the needle-shaped electrode, and a diffusion source capable of being heated up by the heating body and made of a mixture of barium composite containing oxygen and carbon particles. | 08-04-2011 |
20110240855 | ELECTRON BEAM DEVICE AND ELECTRON BEAM APPLICATION DEVICE USING THE SAME - To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 μm and less than 1 μm, and the cone angle α of a conical portion at a portion in the vicinity of the tip at a distance of | 10-06-2011 |
20120085925 | CHARGED PARTICLE RADIATION DEVICE - An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source | 04-12-2012 |
20120119086 | GAS FIELD ION SOURCE, CHARGED PARTICLE MICROSCOPE, AND APPARATUS - A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature. | 05-17-2012 |
20120298864 | Charged Particle Beam Apparatus - In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source ( | 11-29-2012 |
20130043388 | CHARGED PARTICLE RADIATION DEVICE - Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined. | 02-21-2013 |
20130063029 | CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME - Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10 | 03-14-2013 |
20130146766 | Electron Beam Apparatus - The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate ( | 06-13-2013 |
Patent application number | Description | Published |
20140197725 | ELECTRIC FIELD DISCHARGE-TYPE ELECTRON SOURCE - Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source. | 07-17-2014 |
20140361167 | SCANNING ELECTRON MICROSCOPE - To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun ( | 12-11-2014 |
20150014530 | CHARGED PARTICLE BEAM APPARATUS - Provided is a charged particle beam apparatus ( | 01-15-2015 |
20150214002 | ELECTRON MICROSCOPE AND ELECTRON BEAM DETECTOR - An electron microscope is provided with a scintillator ( | 07-30-2015 |
20150318143 | Sample Base, Charged Particle Beam Device and Sample Observation Method - This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform. | 11-05-2015 |
20160025659 | Charged Particle Beam Device, Sample Observation Method, Sample Platform, Observation System, and Light Emitting Member - The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device ( | 01-28-2016 |