Patent application number | Description | Published |
20080212046 | Lithographic apparatus and device manufacturing method - A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape. | 09-04-2008 |
20080246936 | Lithographic apparatus and device manufacturing method - A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model. | 10-09-2008 |
20080316441 | Lithographic apparatus having parts with a coated film adhered thereto - A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure. | 12-25-2008 |
20090231566 | Lithographic Apparatus, Stage System and Stage Control Method - In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage. | 09-17-2009 |
20090237632 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife. | 09-24-2009 |
20090244767 | CONTROLLER FOR A POSITIONING DEVICE, METHOD FOR CONTROLLING A POSITIONING DEVICE, POSITIONING DEVICE, AND LITHOGRAPHIC APPARATUS PROVIDED WITH A POSITIONING DEVICE - A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain an error signal, selectively modify the error signal based on the amplitude and the frequency content of the error signal to obtain a modified error signal, generate a control signal for controlling the positioning device on the basis of the modified error signal. The controller may be applied to control a positioning device in a lithographic apparatus. | 10-01-2009 |
20110005603 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure. | 01-13-2011 |
20120019801 | POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD TO CONTROL A POSITION OF A MOVABLE OBJECT - A position control system to control the position of a movable object, including a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal on the basis of a comparison of the actual position related quantity and the position related set-point signal, a controller to provide a control signal on the basis of the error signal, a feed-forward device to provide a feed-forward signal on the basis of the position related set-point signal, and one or more actuators to act on the movable object on the basis of the control signal and the feed-forward signal, wherein the feed-forward device includes a disturbance force correction table including estimations of disturbance forces exerted on the movable object in dependence of a position of the movable object. | 01-26-2012 |
20130149649 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system. | 06-13-2013 |
20140098353 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape. | 04-10-2014 |