Patent application number | Description | Published |
20080210548 | Method for Controlling Plasma Density or the Distribution Thereof - Magnetron source has a target configuration with a sputter surface, a magnet configuration generating above the sputter surface a magnetic field which forms, in top view onto the sputter surface, at least one magnet field loop. Viewed in a cross-sectional direction upon the target configuration, a tunnel-shaped arc magnet field is formed and further an electrode configuration is provided which generates, when supplied by a positive electric potential with respect to an electric potential applied to the target configuration, an electric field which crosses at an angle the magnetic field and wherein the electrode configuration comprises a distinct electrode arrangement in a limited segment area of the electrode configuration, which is substantially shorter than the overall length of the magnet field loop. The electrode arrangement along the limited segment area is electrically isolated from the remainder of the electrode configuration so as to be electrically operated differently than the remainder of the electrode configuration. | 09-04-2008 |
20090107396 | Vacuum chamber on a frame basis for coating installations - The present invention relates to a vacuum chamber and to its production. According to the invention, the vacuum chamber comprises a frame into which insert plates are placed. The insert plates form together with the frame a closed space in which a vacuum can be created. Preferably, the shell of the frame is extracted from an integrally formed metal piece, with a large portion of material being removed, leading to openings for the insert plates to be created. This has among others the advantage that no welding seams are necessary where the individual plates are inserted. | 04-30-2009 |
20090145554 | Procedure and device for the production of a plasma - The present invention concerns a procedure for the production of a plasma that is at least co-produced in the vacuum chamber ( | 06-11-2009 |
20090260977 | METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE - Planetary carriers ( | 10-22-2009 |
20110220495 | IGNITION APPARATUS FOR ARC SOURCES - The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target. | 09-15-2011 |
20110281026 | CLEANING METHOD FOR COATING SYSTEMS - The present invention relates to a pretreatment method to be applied to secondary surfaces in coating systems prior to coating. To this end, a non-stick coating is applied to the secondary surfaces, which can be easily detached from the secondary surfaces, even after coating material has been deposited thereon. In this way, the cleaning process of the coating system after the coating process is considerably simplified. | 11-17-2011 |
20110308941 | MODIFIABLE MAGNET CONFIGURATION FOR ARC VAPORIZATION SOURCES - The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set. | 12-22-2011 |
20120279450 | COIL SECTION ASSEMBLY FOR SIMULATING CIRCULAR COILS FOR VACUUM DEVICES - The invention relates to a vacuum treatment chamber, comprising a coil arrangement for generating a magnetic field in the chamber, wherein the coil arrangement comprises at least one first coil section and a second coil section, wherein the first coil section and the second coil section are arranged adjacent to each other in cross-section and preferably in one plane, such that at least a partial section of the first coil substantially follows the course of a partial section of the second coil, wherein the spacing of the first partial section from the second partial section is at least one order of magnitude smaller than the cross-section of the optionally smaller coil section. | 11-08-2012 |
20130126347 | ARC DEPOSITION SOURCE HAVING A DEFINED ELECTRIC FIELD - The invention relates to an arc deposition device, comprising a cathode, an anode, as well as a voltage source for putting the anode at positive potential relative to the cathode. The device also comprises magnetic elements, which cause a magnetic field over the cathode surface, wherein the anode is arranged in the vicinity of the cathode in such a way that the magnetic field lines exiting from the cathode surface hit the anode. | 05-23-2013 |
20130126348 | TARGET FOR SPARK VAPORIZATION WITH PHYSICAL LIMITING OF THE PROPAGATION OF THE SPARK - The present invention relates to a target for an ARC source having a first body ( | 05-23-2013 |
20140048209 | IGNITION APPARATUS FOR ARC SOURCES - The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target. | 02-20-2014 |
20140061030 | HIGH-POWER SPUTTERING SOURCE - The invention relates to a magnetron sputtering process that allows material to be sputtered from a target surface in such a way that a high percentage of the sputtered material is provided in the form of ions. According to the invention, said aim is achieved using a simple generator, the power of which is fed to multiple magnetron sputtering sources spread out over several time intervals, i.e. the maximum power is supplied to one sputtering source during one time interval, and the maximum power is supplied to the following sputtering source in the subsequent time interval, such that discharge current densities of more than 0.2 A/cm | 03-06-2014 |
20140217892 | PLASMA SOURCE - The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided. | 08-07-2014 |
20140248100 | DRILL HAVING A COATING - The present invention relates to a method for coating a substrate, preferably a drill, wherein at least one first HiPIMS layer is applied by means of a HiPIMS process. Preferably, at least one second layer is applied to the first HiPIMS layer by means of a coating process that does not contain a HiPIMS process. | 09-04-2014 |
20140287209 | ALUMINUM TITANIUM NITRIDE COATING WITH ADAPTED MORPHOLOGY FOR ENHANCED WEAR RESISTANCE IN MACHINING OPERATIONS AND METHOD THEREOF - The present invention relates to an (AI,Ti)N coating exhibiting at least two different coating portions, A and B, having grain size in nanometer magnitude order characterized in that the coating portion A exhibit larger grain size and higher elastic modulus than the coating portion B. The present invention relates as well to a method for coating a substrate with a coating as described above whereby at least the coating portion A and/or the coating portion B of the (AI,Ti)N coating are/is deposited by means of PVD techniques. | 09-25-2014 |
20140305792 | HIPIMS LAYERING - The present invention relates to a method for the vapor deposition of PVD layer systems by means of sputtering on at least one substrate, wherein the layer system comprises at least a first layer, characterized in that, at least in one step of the method, a HiPIMS method is used with a power density of at least 250 W/Cm | 10-16-2014 |
20140311892 | REACTIVE SPUTTERING PROCESS - Reactive sputtering in which, by ion bombardment, material is ejected from the surface of a target and transitions to the gas phase. Negative voltage pulses are applied to the target to establish electric current having a current density greater than 0.5 A/cm | 10-23-2014 |
20140339917 | METHOD FOR PROVIDING SEQUENTIAL POWER PULSES - The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted. | 11-20-2014 |
20140369387 | METHOD FOR THE TEMPERATURE MEASUREMENT OF SUBSTRATES IN A VACUUM CHAMBER - The present invention relates to a temperature-measuring system, comprising a temperature sensor and a reference body, wherein means for determining temperature changes of the reference body and/or for control of the temperature of the reference body are provided. When the temperature measuring-system is used in a vacuum, the reference body forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor. | 12-18-2014 |
20150060261 | TARGET ADAPTED TO AN INDIRECT COOLING DEVICE - The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and/or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel. | 03-05-2015 |