Patent application number | Description | Published |
20100283980 | LIQUID IMMERSION MEMBER - A liquid immersion member is disposed around an optical member having an emergent surface from at least part of which exposure light is emitted and which holds a liquid between itself and an object opposing the emergent surface so that an optical path of exposure light between the emergent surface and the object is filled with a liquid to form an immersion space. The liquid immersion member comprises: an opening that recovers a liquid on the object with a gas; a space into which the liquid and the gas from the opening are entered; a recovery passageway into which only a liquid in the space is entered; an inner side surface that opposes at least part of a side surface of the optical member with a gap therebetween; and a recovery port that recovers at least part of a liquid in the gap. | 11-11-2010 |
20100304310 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate. | 12-02-2010 |
20110199591 | EXPOSURE APPARATUS, EXPOSING METHOD, MAINTENANCE METHOD AND DEVICE FABRICATING METHOD - An exposure apparatus exposes a substrate with exposure light, which transits a first liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a liquid immersion member, which at least partly surrounds an optical path of the exposure light emerging from the emergent surface, has a lower surface that the substrate opposes during an exposure of the substrate, and holds the first liquid between the substrate and at least part of the lower surface; and a plate member, which has a first surface and a second surface that faces the opposite direction to the first surface and which is capable of moving to a position at which it opposes the lower surface; wherein, cleaning is performed in a state wherein the first surface opposes the lower surface. | 08-18-2011 |
20110222031 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member can form an immersion space such that an optical path of exposure light is filled with a liquid. The liquid immersion member comprises: a recovery port, which recovers at least some of the liquid on an object disposed such that it faces an emergent surface wherefrom the exposure light emerges; a recovery passageway, wherein flows the liquid recovered via the recovery port; a first suction port, which faces the recovery passageway and suctions only a gas from the recovery passageway; and a second suction port, which faces the recovery passageway and suctions the liquid from the recovery passageway | 09-15-2011 |
20120013862 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprises: a first member, which has a first surface, a second surface that faces a direction other than that faced by the first surface, and a plurality of holes that connects the first surface and the second surface, that recovers at least some of the liquid from the space above the object opposing the first surface via the holes; a recovery passageway, wherethrough the liquid recovered via the holes of the first member flows; and a discharge part, which separately discharges a liquid and a gas from the recovery passageway. The first member comprises a first portion and a second portion. The second portion hinders a gas flowing from a space between the object and the first surface into the recovery passageway via the holes more than the first portion does. | 01-19-2012 |
20120013863 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprises: a first member, which has a recovery port that recovers at least some of the liquid from the space above the object; a recovery passageway, wherethrough the liquid recovered via the recovery port flows; a discharge part, which has a first discharge port for discharging the liquid from the recovery passageway and a second discharge port for discharging a gas from the recovery passageway, that separately discharges the liquid and the gas from the recovery passageway; and a hindering part, which hinders the liquid in the recovery passageway from contacting the second discharge port. | 01-19-2012 |
20120013864 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprising: a first member, which has a recovery port that recovers at least some of the liquid from a space above the object; a recovery passageway, wherein the liquid recovered via the recovery port flows; a second member, which faces the recovery passageway and has a first discharge port that is for discharging the liquid from the recovery passageway; and a third member, which faces the recovery passageway and has a second discharge port that is for discharging a gas from the recovery passageway. The second member comprises a first portion and a second portion, which is disposed at a position higher than the first portion is and is capable of discharging a greater amount of the liquid than the first portion is. | 01-19-2012 |
20120162619 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member inside an immersion exposure apparatus that is disposed at least partly around an optical member and an optical path of exposure light wherethrough a first liquid between the optical member and an object passes includes a first liquid immersion member, which is disposed at least partly around the optical path and forms a first immersion space of the first liquid at an emergent surface side of the optical member; a guide part, which guides at least some of the first liquid in the first immersion space to a first guide space, which is partly around the optical path; and a second liquid immersion member, which is disposed at an outer side of the first liquid immersion member with respect to the optical path and forms a second immersion space of a second liquid partly around the first immersion space and adjacent to the first guide space. | 06-28-2012 |
20130057838 | EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND STORAGE MEDIUM - An exposure apparatus exposing a substrate with exposure light through liquid, including: an optical member having an emitting surface from which exposure light is emitted; a substrate holding apparatus that includes: a first holding portion holding a lower surface of substrate so that lower surface of substrate can be released, and a first member that defines an opening where substrate can be arranged, and that has an upper surface which is arranged at a vicinity of an upper surface of the substrate in a state which the substrate is held by the first holding portion; and a porous member of which at least a part is arranged at a gap between the substrate and the first member, and which has an upper surface liquid-repellent with respect to the liquid, wherein at least a part of the liquid which flows into the gap is recovered through the porous member. | 03-07-2013 |
20130135594 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member including: a first member provided in at least a portion of the surrounding of an optical member, including a first lower surface which can face an object facing the emission surface, and that forms a first immersion space of a first liquid in an optical path space on an emission surface side and at least a portion of a first space on a first lower surface side; a second member provided outside the first member with respect to the optical path, including a second lower surface which can face the object, and that forms a second immersion space of a second liquid in at least a portion of a second space on a second lower surface side; and a third member that restricts the movement of the first liquid from the first to the second space. | 05-30-2013 |
20130169944 | EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus that exposes a substrate with exposure light through a first liquid. The exposure apparatus includes: an optical member that has an emission surface which emits the exposure light; a first member that forms a first liquid immersion space of the first liquid in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; and a second member that forms a second liquid immersion space of a second liquid, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space. | 07-04-2013 |
20130265556 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member forms a liquid immersion space on an object which is movable below an optical member so that an optical path of exposure light emitted from an emitting surface of the optical member is filled with liquid. The liquid immersion member includes a first member that has a first lower surface, a second member that has a second upper surface which faces the first lower surface via a gap and a second lower surface which the object is able to face, and that is movable with respect to the first member, and a recovery part that recovers at least a portion of a liquid from a second space, which is between the second lower surface and the object, at an outside of the second lower surface with respect to the optical path. | 10-10-2013 |
20140022522 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate via liquid by exposure light, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light, that includes a second upper surface which is opposite to the first lower surface of the first member via a gap, a second lower surface which is capable of being opposite to the object, and a fluid recovery part which is disposed at at least a portion of surrounding of the second lower surface, and that is relatively movable with respect to the first member. | 01-23-2014 |
20140253886 | EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the first being disposed at at least a portion of surrounding of the optical member, the second being disposed at at least a portion of surrounding of an optical path of the exposure light below the first member, being movable with respect to the first member and including a second upper and lower surface, the second upper surface being opposite a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, which is movable below the optical member; and a vibration isolator configured to suppress a vibration of the first member. | 09-11-2014 |
20140285781 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, and a first liquid supply part, is disposed at at least a portion of surrounding of the first opening part and capable of opposing the surface of the object, are provided at the first part, and a second member includes a first liquid recovery part which can be opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path. | 09-25-2014 |
20140300875 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that includes at least a portion disposed below the first member, that is capable of being opposite to the object and that is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space. | 10-09-2014 |
20140307235 | EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions. | 10-16-2014 |
20150036112 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate. | 02-05-2015 |
20150124230 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member is used in a liquid immersion exposure apparatus, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light and is relatively movable with respect to the first member. The second member includes a second upper surface that is opposite to a first lower surface of the first member via a gap, a second lower surface that is capable of being opposite to the object, and a fluid recovery part that is disposed at at least a portion of surrounding of the second lower surface. | 05-07-2015 |
20150277236 | EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACURING DEVICE, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame. | 10-01-2015 |
20150286142 | Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium - An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows. | 10-08-2015 |
Patent application number | Description | Published |
20090233412 | METHOD FOR ANGULAR DOPING OF SOURCE AND DRAIN REGIONS FOR ODD AND EVEN NAND BLOCKS - Stacked gate structures for a NAND string are created on a substrate. Source implantations are performed at a first implantation angle to areas between the stacked gate structures. Drain implantations are performed at a second implantation angle to areas between the stacked gate structures. The drain implantations create lower doped regions of a first conductivity type in the substrate on drain sides of the stacked gate structures. The source implantations create higher doped regions of the first conductivity type in the substrate on source sides of the stacked gate structures. | 09-17-2009 |
20090290429 | ENHANCED BIT-LINE PRE-CHARGE SCHEME FOR INCREASING CHANNEL BOOSTING IN NON-VOLATILE STORAGE - Channel boosting is improved in non-volatile storage to reduce program disturb. A pre-charge module voltage source is used to pre-charge bit lines during a programming operation. The pre-charge module voltage source is coupled to a substrate channel via the bit lines to boost the channel. An additional source of boosting is provided by electromagnetically coupling a voltage from a conductive element to the bit lines and the channel. To achieve this, the bit lines and the channel are allowed to float together by disconnecting the bit lines from the voltage sources. The conductive element can be a source line, power supply line or substrate body, for instance, which receives an increasing voltage during the pre-charging and is proximate to the bit lines. | 11-26-2009 |
20100246257 | FABRICATING AND OPERATING A MEMORY ARRAY HAVING A MULTI-LEVEL CELL REGION AND A SINGLE-LEVEL CELL REGION - Techniques are disclosed herein for applying different process steps to single-level cell (SLC) blocks in a memory array than to multi-level cell (MLC) blocks such that the SLC blocks will have high endurance and the MLC blocks will have high reliability. In some aspects, different doping is used in the MLC blocks than the SLC blocks. In some aspects, different isolation is used in the MLC blocks than the SLC blocks. Techniques are disclosed that apply different read parameters depending on how many times a block has been programmed/erased. Therefore, blocks that have been cycled many times are read using different parameters than blocks that have been cycled fewer times. | 09-30-2010 |
20100297823 | METHOD FOR ANGULAR DOPING OF SOURCE AND DRAIN REGIONS FOR ODD AND EVEN NAND BLOCKS - Stacked gate structures for a NAND string are created on a substrate. Source implantations are performed at a first implantation angle to areas between the stacked gate structures. Drain implantations are performed at a second implantation angle to areas between the stacked gate structures. The drain implantations create lower doped regions of a first conductivity type in the substrate on drain sides of the stacked gate structures. The source implantations create higher doped regions of the first conductivity type in the substrate on source sides of the stacked gate structures. | 11-25-2010 |
20110151636 | Method For Angular Doping Of Source And Drain Regions For Odd And Even NAND Blocks - A method for creating NAND flash memory. Source implantations are performed at a first implantation angle to areas between stacked gate structures of a NAND string. Drain implantations are performed at a second implantation angle to areas between the stacked gate structures. The source implantation can include n-type and p-type materials implanted under different angles, and the drain implantation can include n-type and p-type materials implanted under different angles. Or, the source implantation can include multiple n-type implantations under different angles, and the drain implantation can include multiple n-type implantations under different angles. | 06-23-2011 |
20110205823 | Non-Volatile Storage With Temperature Compensation Based On Neighbor State Information - Data is programmed into and read from a set of target memory cells. When reading the data, temperature compensation is provided. The temperature compensation is based on temperature information and the state of one or more neighbor memory cells. In one embodiment, when data is read from set of target memory cells, the system senses the current temperature and determines the differences in temperature between the current temperature and the temperature at the time the data was programmed. If the difference in temperature is greater than a threshold, then the process of reading the data includes providing temperature compensation based on temperature information and neighbor state information. In one alternative, the decision to provide the temperature compensation can be triggered by conditions other than a temperature differential. | 08-25-2011 |
20110275186 | FABRICATING AND OPERATING A MEMORY ARRAY HAVING A MULTI-LEVEL CELL REGION AND A SINGLE-LEVEL CELL REGION - Techniques are disclosed herein for applying different process steps to single-level cell (SLC) blocks in a memory array than to multi-level cell (MLC) blocks such that the SLC blocks will have high endurance and the MLC blocks will have high reliability. In some aspects, different doping is used in the MLC blocks than the SLC blocks. In some aspects, different isolation is used in the MLC blocks than the SLC blocks. Techniques are disclosed that apply different read parameters depending on how many times a block has been programmed/erased. Therefore, blocks that have been cycled many times are read using different parameters than blocks that have been cycled fewer times. | 11-10-2011 |
20120236670 | Non-Volatile Storage With Temperature Compensation Based On Neighbor State Information - Data is programmed into and read from a set of target memory cells. When reading the data, temperature compensation is provided. The temperature compensation is based on temperature information and the state of one or more neighbor memory cells. In one embodiment, when data is read from set of target memory cells, the system senses the current temperature and determines the differences in temperature between the current temperature and the temperature at the time the data was programmed. If the difference in temperature is greater than a threshold, then the process of reading the data includes providing temperature compensation based on temperature information and neighbor state information. In one alternative, the decision to provide the temperature compensation can be triggered by conditions other than a temperature differential. | 09-20-2012 |
20130097370 | FABRICATING AND OPERATING A MEMORY ARRAY HAVING A MULTI-LEVEL CELL REGION AND A SINGLE-LEVEL CELL REGION - Techniques are disclosed herein for applying different process steps to single-level cell (SLC) blocks in a memory array than to multi-level cell (MLC) blocks such that the SLC blocks will have high endurance and the MLC blocks will have high reliability. In some aspects, different doping is used in the MLC blocks than the SLC blocks. In some aspects, different isolation is used in the MLC blocks than the SLC blocks. Techniques are disclosed that apply different read parameters depending on how many times a block has been programmed/erased. Therefore, blocks that have been cycled many times are read using different parameters than blocks that have been cycled fewer times. | 04-18-2013 |
20130163340 | NON-VOLATILE STORAGE SYSTEM WITH THREE LAYER FLOATING GATE - A non-volatile storage system includes memory cells with floating gates that comprises three layers separated by two dielectric layers (an upper dielectric layer and lower dielectric layer). The dielectric layers may be an oxide layers, nitride layers, combinations of oxide and nitride, or some other suitable dielectric material. The lower dielectric layer is close to the bottom of the floating gate (near interface between floating gate and tunnel dielectric), while the upper dielectric layer is close to top of the floating gate (near interface between floating gate and inter-gate dielectric). | 06-27-2013 |
20130250689 | SELECTED WORD LINE DEPENDENT SELECT GATE DIFFUSION REGION VOLTAGE DURING PROGRAMMING - Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming. Applying a selected word line dependent program condition may reduce or eliminate program disturb. The voltage applied to a common source line may depend on the location of the word line that is selected for programming. This may prevent or reduce punch-through conduction, which may prevent or reduce program disturb. The voltage applied to bit lines of unselected NAND strings may depend on the location of the word line that is selected for programming. This may prevent or reduce punch-through conduction. | 09-26-2013 |
20130250690 | SELECTED WORD LINE DEPENDENT SELECT GATE VOLTAGE DURING PROGRAM - Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming, which may reduce or eliminate program disturb. The voltage applied to the gate of a select transistor of a NAND string may depend on the location of the selected word line. This could be either a source side or drain side select transistor. This may prevent or reduce program disturb that could result due to DIBL. This may also prevent or reduce program disturb that could result due to GIDL. A negative bias may be applied to the gate of a source side select transistor when programming at least some of the word lines. In one embodiment, progressively lower voltages are used for the gate of the drain side select transistor when programming progressively higher word lines. | 09-26-2013 |
20130301351 | Channel Boosting Using Secondary Neighbor Channel Coupling In Non-Volatile Memory - In a non-volatile storage system, a programming portion of a program-verify iteration has multiple programming pulses, and storage elements along a word line are selected for programming according to a pattern. Unselected storage elements are grouped to benefit from channel-to-channel capacitive coupling from both primary and secondary neighbor storage elements. The coupling is helpful to boost channel regions of the unselected storage elements to a higher channel potential to prevent program disturb. Each selected storage element has a different relative position within its set. For example, during a first programming pulse, first, second and third storage elements are selected in first, second and third sets, respectively. During a second programming pulse, second, third and first storage elements are selected in the first, second and third sets, respectively. During a third programming pulse, third, first and second storage elements are selected in the first, second and third sets, respectively. | 11-14-2013 |
20140160848 | SELECT GATE BIAS DURING PROGRAM OF NON-VOLATILE STORAGE - Techniques disclosed herein may prevent program disturb by preventing a select transistor of an unselected NAND string from unintentionally turning on. The Vgs of a select transistor of a NAND string may be lowered from one programming pulse to the next programming pulse multiple times. The select transistor may be a drain side select transistor or a source side select transistor. Progressively lowering the Vgs of the select transistor of an unselected NAND string as programming progresses may prevent the select transistor from unintentionally turning on. Therefore, program disturb is prevented or reduced. Vgs may be lowered by applying a lower voltage to a select line associated with the select transistor. Vgs may be lowered by applying a higher voltage to bit lines associated with the unselected NAND strings as programming progresses. Vgs may be lowered by applying a higher voltage to a common source line as programming progresses. | 06-12-2014 |
20150043281 | NON-VOLATILE STORAGE WITH TEMPERATURE COMPENSATION BASED ON NEIGHBOR STATE INFORMATION - Data is programmed into and read from a set of target memory cells. When reading the data, temperature compensation is provided. The temperature compensation is based on temperature information and the state of one or more neighbor memory cells. In one embodiment, when data is read from set of target memory cells, the system senses the current temperature and determines the differences in temperature between the current temperature and the temperature at the time the data was programmed. If the difference in temperature is greater than a threshold, then the process of reading the data includes providing temperature compensation based on temperature information and neighbor state information. In one alternative, the decision to provide the temperature compensation can be triggered by conditions other than a temperature differential. | 02-12-2015 |