Patent application number | Description | Published |
20130205833 | GLASS BASE MATERIAL ELONGATING METHOD - A glass base material elongating method of elongating a glass base material to make a diameter of the glass base material smaller by connecting a pulling dummy at an end of the glass base material and then gripping and pulling the pulling dummy with a pair of rollers that grip or release the pulling dummy is provided. The method includes forming a rough surface part on the pulling dummy before elongating the glass base material. | 08-15-2013 |
20130205834 | POROUS GLASS BASE MATERIAL SINTERING METHOD - It is an objective of the present invention to provide a method for sintering a porous glass base material that can experience an earthquake or large vibration without the base material falling or decreasing in quality when performing sintering, dehydration, and transparent vitrification on the porous glass base material. Provided is a method of sintering a porous glass base material including sintering by lowering the porous glass base material vertically through a furnace from above while rotating the porous glass base material, the method comprising changing rotational speed of the porous glass base material during the sintering. | 08-15-2013 |
20130206229 | SOLAR CELL AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a solar cell, including the steps of: forming an SiNx film over a second principal surface of an n-type semiconductor substrate; forming a p-type diffusion layer over a first principal surface of the n-type semiconductor substrate after the SiNx film forming step; and forming an SiO | 08-15-2013 |
20130207041 | FLUORESCENT COMPOUND, MAKING METHOD, AND FLUORESCENT RESIN COMPOSITION - Novel fluorescent compounds having a specific structure are provided. They have improved solubility in organic solvents and compatibility even with low polar resins, especially silicone resins. Using the compounds, transparency fluorescent resin compositions are formulated. Since the fluorescent compound is a single compound, it can be purified to a high purity and has a high fluorescence efficiency. | 08-15-2013 |
20130209935 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development. | 08-15-2013 |
20130209936 | PATTERNING PROCESS AND RESIST COMPOSITION - A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units, acid labile group-containing recurring units and carbamate-containing recurring units, and a photoacid generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for inactivation to acid, coating a second positive resist composition comprising a C | 08-15-2013 |
20130210229 | SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMING COMPOSITION CONTAINING THE SAME, AND PATTERNING PROCESS - The present invention provides a silicon-containing surface modifier containing one or more repeating units each represented by the following general formula (A), or one or more partial structures each represented by the following general formula (C): | 08-15-2013 |
20130210236 | SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS - The present invention provides a silicon-containing surface modifier wherein the modifier contains one or more of a repeating unit shown by the following general formula (A) and a partial structure shown by the following general formula (C).The present invention has an object to provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound. | 08-15-2013 |
20130217307 | METHOD AND APPARATUS FOR MULTIPLE CUTOFF MACHINING OF RARE EARTH MAGNET BLOCK, CUTTING FLUID FEED NOZZLE, AND MAGNET BLOCK SECURING JIG - In a method for multiple cutoff machining a rare earth magnet block, a cutting fluid feed nozzle having a plurality of slits is combined with a plurality of cutoff abrasive blades coaxially mounted on a rotating shaft, each said blade comprising a base disk and a peripheral cutting part. The slits in the feed nozzle into which the outer peripheral portions of cutoff abrasive blades are inserted serve to restrict any axial run-out of the cutoff abrasive blades during rotation. Cutting fluid is fed from the feed nozzle through slits to the rotating cutoff abrasive blades and eventually to points of cutoff machining on the magnet block. | 08-22-2013 |
20130220214 | BASE MATERIAL FOR GROWING SINGLE CRYSTAL DIAMOND AND METHOD FOR PRODUCING SINGLE CRYSTAL DIAMOND SUBSTRATE - The present invention is a base material for growing a single crystal diamond comprising a single crystal silicon substrate, a MgO film heteroepitaxially grown on a side of the single crystal silicon substrate where the single crystal diamond is to be grown, and an iridium film or a rhodium film heteroepitaxially grown on the MgO film. As a result, there is provided a base material for growing a single crystal diamond and a method for producing a single crystal diamond substrate which can grow the single crystal diamond having a large area and good crystallinity and produce a high quality single crystal diamond substrate at low cost. | 08-29-2013 |
20130220687 | WAFER PROCESS BODY, WAFER PROCESSING MEMBER, WAFER PROCESSING TEMPORARY ADHESIVE MATERIAL, AND METHOD FOR MANUFACTURING THIN WAFER - Disclosed is a wafer process body, a temporary adhesive layer is formed on a supporting body, and a wafer having a circuit-formed front surface and a to-be-processed back surface is stacked on the temporary adhesive layer, wherein the temporary adhesive layer is provided with a first temporary adhesive layer including a non-aromatic saturated hydrocarbon group-containing organopolysiloxane layer (A) which is adhered to the front surface of the wafer so as to be detachable and a second temporary adhesive layer comprised of a thermosetting-modified siloxane polymer layer (B) which is stacked on the first temporary adhesive layer and adhered to the supporting body so as to be detachable. Thus, temporary adhesion of a wafer with a supporting body may become easy, process conformity with the TSV formation process and with the wafer-back surface-wiring process may become high, and removal may be done easily, with high productivity. | 08-29-2013 |
20130224502 | ADDITION CURABLE SILICONE EMULSION RELEASE COMPOSITION AND RELEASE FILM - An addition curable silicone emulsion release composition suitable for forming a releasable film having a high releasability to a pressure sensitive adhesives simultaneously with good adhesion to a plastic film substrate is provided. A release film prepared by coating and curing such composition on a plastic film is also provided. The good adhesion and the high releasability to acryl pressure sensitive adhesives are realized despite the low content of the organopolysiloxane containing a large amount of trifunctional siloxane units and alkenyl groups which had been used for realizing the adhesion. The addition curable silicone emulsion release composition is prepared by blending predetermined proportion of mixtures of high molecular weight organopolysiloxanes each containing an alkenyl group and phenyl group at particular ratio. | 08-29-2013 |
20130224657 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS - The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: | 08-29-2013 |
20130224659 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS - A sulfonic acid anion-containing polymer having an alkylsulfonium cation not in covalent bond thereto can be readily prepared by reacting a sulfonic acid anion-containing polymer having an ammonium or metal cation with an alkylsulfonium salt under mild conditions. A resist composition comprising the inventive polymer is effective for suppressing acid diffusion since the sulfonium salt is bound to the polymer backbone. When processed by the ArF lithography, the polymer exhibits a lower absorption at the exposure wavelength than the triarylsulfonium salt form PAGs, resulting in improved resolution, mask fidelity, and LWR. | 08-29-2013 |
20130224660 | PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A sulfonic acid anion-containing polymer having a triarylsulfonium cation is prepared by (1) preparing a sulfonic acid anion-containing polymer having an ammonium or metal cation not bound thereto, (2) purifying the polymer by water washing or crystallization, and (3) then reacting the polymer with a triarylsulfonium salt. A resist composition comprising the inventive polymer is effective for controlling acid diffusion since the sulfonium salt is bound to the polymer backbone. | 08-29-2013 |
20130231491 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS - A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C | 09-05-2013 |
20130279867 | OPTICAL FIBER - In order to decrease transmission loss caused by Rayleigh scattering in an optical fiber, without negatively affecting the curvature loss, provided is an optical fiber comprising a core at a center thereof, a low refractive index layer that is adjacent to the core and covers an outer circumference of the core, and a cladding that is adjacent to the low refractive index layer and covers an outer circumference of the low refractive index layer, wherein a refractive index of the core is higher than a refractive index of the cladding, a refractive index of the low refractive index layer is lower than the refractive index of the cladding, and the refractive index of the low refractive index layer decreases in a direction from an inner portion of the low refractive index layer to an outer portion of the low refractive index layer. | 10-24-2013 |