Patent application number | Description | Published |
20080213695 | Chemically amplified resist composition - The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): | 09-04-2008 |
20080220369 | CHEMICALLY AMPLIFIED RESIST COMPOSITION - The present invention provides a chemically amplified resist composition containing:
| 09-11-2008 |
20080248423 | Chemically amplified resist composition - A chemically amplified resist composition comprising: | 10-09-2008 |
20100279226 | RESIST PROCESSING METHOD - The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern. | 11-04-2010 |
20100323296 | RESIN AND RESIST COMPOSITION - A resin comprises a structural unit derived from a compound represented by the formula (aa) | 12-23-2010 |
20110076617 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): | 03-31-2011 |
20110156786 | FLIP-FLOP CIRCUIT AND FREQUENCY DIVIDING CIRCUIT - A flip-flop circuit has a function of respectively switching ON/OFF state of operation of a first data retaining circuit in a master side element and a second data retaining circuit in a slave side element, i.e., constituent elements of the flip-flop circuit, wherein the flip-flop circuit performs timing control, so as to reduce unnecessary current, eliminate the affect caused by parasitic capacitance. The flip-flop circuit operates with a low power consumption but has a high maximum operating frequency. | 06-30-2011 |
20110171576 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I): | 07-14-2011 |
20110200935 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): | 08-18-2011 |
20120219909 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), | 08-30-2012 |
20120219912 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. | 08-30-2012 |
20120231392 | SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A salt represented by the formula (I) and a resist composition containing the salt are provided, | 09-13-2012 |
20120258404 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), | 10-11-2012 |
20130022928 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, | 01-24-2013 |
20130176066 | LEVEL SHIFT CIRCUIT - The invention provides a level shift circuit which uses a low supply voltage level shift circuit as a first level shift element and a high supply voltage level shift circuit as a second level shift element and which is configured to switch these level shift circuits in accordance with supply voltage. The low supply voltage level shift circuit is in an operating state with its power supply turned ON when supply voltage is low and in a shut-down state with the power supply turned OFF to ensure the breakdown voltages of the elements when supply voltage is high. The high supply voltage level shift circuit is in a shut-down state with its power supply turned OFF when supply voltage is low and comes into an operating state with the power supply turned ON while ensuring the breakdown voltages of elements when supply voltage is high. | 07-11-2013 |
Patent application number | Description | Published |
20090123868 | Resist polymer and method for producing the polymer - Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined, by gel permeation chromatography (GPC). | 05-14-2009 |
20100324245 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION - In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. | 12-23-2010 |
Patent application number | Description | Published |
20080266147 | VARIABLE LENGTH CODE DECODING APPARATUS - A variable length code decoding apparatus according to the present invention includes: an extracting unit which extracts a bit string from a beginning of a bit stream; a first storage unit for storing a plurality of code words in which one piece of data has been coded, and decoded data and code lengths respectively corresponding to the code words; a second storage unit for storing a plurality of code words in which two or more pieces of data have been coded, and decoded data and code lengths respectively corresponding to the code words; a first judging unit which judges whether one of the code words stored in the first storage unit is included in the extracted bit string, and, when judged as being included, outputs the decoded data and the code length of the code word; and a second judging unit which judges whether a code word stored in the second storage unit is included in the extracted bit string, and when judged as being included, outputs the decoded data and the code length of the code word, wherein the extracting unit extracts the bit string to be decoded next in the same cycle as a cycle in which the judgment was made by the first judging unit, and extracts the bit string to be decoded next in a cycle following the cycle in which the judgment was made by the second judging unit. | 10-30-2008 |
20090053390 | Novel Candy and Process for Producing the Same - A delicious candy in which crystallized xylitol has been molded in a desired shape and which has a beautiful shape and gives a cooling feeling attributable to xylitol; and a process by which the candy can be easily and industrially continuously produced. The novel candy ( | 02-26-2009 |
20100193335 | Method and device for sorting irregularly shaped articles - There exists a demand for providing a method and apparatus capable of sorting articles whose upper and lower attitudes are inverted, in a simple and positive manner, from among different-formed articles such as candies having upper and lower portions different in outside diameter. To meet such a demand, different-formed articles having upper and lower portions different in outside diameter are fed between a pair of right and left slant members from a start end side of the same members, the slant members being arranged at a width narrower than a maximum diameter of the different-formed articles and wider than a minimum diameter of the different-formed articles and in such a manner as to be low on the start end side and high on a terminal end side thereof, then only the articles having upper portions larger in diameter than respective lower portions are caught on the pair of slant members, while the articles having upper portions smaller in diameter than respective lower portions are allowed to pass as they are, thereby sorting the both of them. | 08-05-2010 |
20120027087 | IMAGE DECODING DEVICE - An image decoding device for processing an input bit stream containing encoded data obtained by encoding a moving picture using intra-frame prediction, includes a stream divider configured to divide the input bit stream into a plurality of sub-streams, and a plurality of image decoders each configured to decode the corresponding one of the plurality of sub-streams, thereby outputting images. The stream divider divides the input bit stream so that the plurality of sub-streams each contain the encoded data corresponding to one or more prediction units, where macroblocks of the moving picture each include a plurality of the prediction units for the intra-frame prediction. | 02-02-2012 |
20120257838 | IMAGE DECODING APPARATUS AND IMAGE DECODING METHOD - An image decoding apparatus according to one aspect of the present invention includes: a management information storage unit that stores first management information for identifying areas in each of which one of first decoded image signals is stored, and second management information for identifying areas in each of which one of second decoded image signals is stored; and a control unit that notifies, by referring to the first management information, an image decoding unit of an area in which a reference image to be referred to when a first coded signal is decoded is stored, and notifies, by referring to the first management information and the second management information, the image decoding unit of an area in which a reference image to be referred to when a second coded signal is decoded is stored. | 10-11-2012 |
20140334552 | IMAGE DECODING DEVICE - An image decoding device includes: an arithmetic decoding unit performing arithmetic decoding of a bitstream to obtain a binary symbol; and a bitstream decoding control unit selecting a bitstream on which the arithmetic decoding is performed by the arithmetic decoding unit. The bitstream decoding control unit causes the arithmetic decoding unit to suspend the arithmetic decoding one bit stream and start the arithmetic decoding of another bitstream at a time point when a predetermined time period elapses, and suspend the arithmetic decoding of the other bitstream and resume the arithmetic decoding of the one bitstream at a time point when another predetermined time period elapses. | 11-13-2014 |
Patent application number | Description | Published |
20090161227 | ZOOM OPTICAL SYSTEM, OPTICAL INSTRUMENT INCORPORATING THE ZOOM OPTICAL SYSTEM, AND METHOD OF MANUFACTURING THE ZOOM OPTICAL SYSTEM - A zoom optical system has a first lens group having a positive refracting power; a second lens group having a negative refracting power; a third lens group having a positive refracting power; a fourth lens group having a negative refracting power; and a fifth lens group having a positive refracting power, in the order from the object side. The fourth lens group is composed of a cemented lens of a negative lens and a positive lens in the order from the object side, and a condition of the following expression is satisfied: vp> | 06-25-2009 |
20090244720 | ZOOM LENS SYSTEM, OPTICAL DEVICE WITH THE ZOOM LENS SYSTEM, AND METHOD OF MANUFACTURING THE ZOOM LENS SYSTEM - A zoom lens system has a front lens group and a rear lens group along the optical axis and in order from the object side. The rear lens group has a first lens unit having a positive refracting power, a second lens unit having a negative refracting power, and a third lens unit having a positive refracting power. Upon zooming from a wide-angle end state to a telephoto end state, a space between the front lens group and the first lens unit varies, a space between the first lens unit and the second lens unit increases, and a space between the second lens unit and the third lens unit decreases. At least a part of the second lens unit is movable so as to have a component in a direction perpendicular to the optical axis. | 10-01-2009 |
20110228406 | ZOOM LENS SYSTEM, OPTICAL DEVICE WITH THE ZOOM LENS SYSTEM, AND METHOD OF MANUFACTURING THE ZOOM LENS SYSTEM - A zoom lens system has a front lens group and a rear lens group along the optical axis and in order from the object side. The rear lens group has a first lens unit having a positive refracting power, a second lens unit having a negative refracting power, and a third lens unit having a positive refracting power. Upon zooming from a wide-angle end state to a telephoto end state, a space between the front lens group and the first lens unit varies, a space between the first lens unit and the second lens unit increases, and a space between the second lens unit and the third lens unit decreases. At least a part of the second lens unit is movable so as to have a component in a direction perpendicular to the optical axis. | 09-22-2011 |
20110228407 | ZOOM OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD OF MANUFACTURING ZOOM OPTICAL SYSTEM - A zoom optical system includes, in order from its object side along its optical axis, a first lens group G | 09-22-2011 |
20120194918 | ZOOM OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD OF MANUFACTURING ZOOM OPTICAL SYSTEM - A zoom optical system includes, in order from its object side along its optical axis, a first lens group G | 08-02-2012 |
20130120854 | Zoom Lens System, Optical Device with the Zoom Lens System, and Method of Manufacturing the Zoom Lens System - A zoom lens system has a front lens group and a rear lens group along the optical axis and in order from the object side. The rear lens group has a first lens unit having a positive refracting power, a second lens unit having a negative refracting power, and a third lens unit having a positive refracting power. Upon zooming from a wide-angle end state to a telephoto end state, a space between the front lens group and the first lens unit varies, a space between the first lens unit and the second lens unit increases, and a space between the second lens unit and the third lens unit decreases. At least a part of the second lens unit is movable so as to have a component in a direction perpendicular to the optical axis. | 05-16-2013 |
20150153550 | VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL DEVICE, AND PRODUCTION METHOD FOR VARIABLE MAGNIFICATION OPTICAL SYSTEM - Comprising, in order from an object side: a first lens group G1 having positive refractive power; a second lens group G2 having negative refractive power; a third lens group G3 having positive refractive power; and a fourth lens group G4 having positive refractive power; upon zooming from a wide-angle end state to a telephoto end state, the first lens group G1 being fixed in the position in the direction of the optical axis, at least the second lens group G2 and the third lens group G3 being moved in the direction of the optical axis such that a distance between the first lens group G1 and the second lens group G2 is increased and a distance between the second lens group G2 and the third lens group G3 is decreased; and a predetermined conditional expression being satisfied, thereby providing a variable magnification optical system which can suppress variations in aberrations upon zooming and having excellent optical performance from a wide angle end state to a telephoto end state, an optical apparatus, and a method for manufacturing a variable magnification optical system. | 06-04-2015 |
Patent application number | Description | Published |
20120219899 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), | 08-30-2012 |
20120219906 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II), | 08-30-2012 |
20120251946 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising the following components (A), (B) and (X):
| 10-04-2012 |
20120258405 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), | 10-11-2012 |
20130022909 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), | 01-24-2013 |
20130022919 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), | 01-24-2013 |
20130022921 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). | 01-24-2013 |
20130095425 | PHOTORESIST COMPOSITION - A photoresist composition which comprises
| 04-18-2013 |
20140023971 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A photoresist composition comprising | 01-23-2014 |
20140030654 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A photoresist composition comprising
| 01-30-2014 |