Patent application number | Description | Published |
20080202226 | Bearing Arrangement For Mounting at least One Machine Elements on a Support - The invention relates to a bearing arrangement for mounting at least one machine element on a support, wherein the machine element is movably mounted on the support, wherein the bearing arrangement is provided with at least one measuring sleeve and with at least one measuring element on the measuring sleeve, wherein the measuring sleeve is formed separately from the support and wherein the measuring element is provided at least for measuring physical parameters and processes in the bearing arrangement. | 08-28-2008 |
20080209979 | Method for Calibrating a Sensor System of a Measuring Bearing for a Storage Installation - The invention relates to a method for calibrating a sensor system of at least one measuring bearing for a bearing installation, said method being used to adjust individual measured values of an individual bearing installation using representative reference values of a reference installation. | 09-04-2008 |
20080226213 | Wheel Bearing Unit - The invention relates to a wheel bearing unit having at least one outer part, having at least one inner part, and having at least two rows of rolling bodies between the outer part and the inner part, wherein in each case at least one inner raceway is formed on the outer part and in each case at least one outer raceway is formed on the inner part for the rolling bodies of one row. A ratio of the diameter of the reference circle of at least one row of the wheel bearing unit to the diameter of the rolling bodies of the respective row is greater than the numerical value six. The row spacing between the rows corresponds to at most 1.65 times the diameter of the rolling bodies. | 09-18-2008 |
20080310785 | Wheel Bearing Unit - The invention relates to a wheel bearing unit having at least one outer part, having at least one inner part and having at least two rows of rolling bodies between the outer part and the inner part, wherein in each case at least one inner raceway is formed on the outer part and in each case at least one outer raceway is formed on the inner part for the rolling bodies of one row, and wherein the wheel hub has an internal toothing, which projects radially inwards in the direction of the rotational axis, for engaging into an external toothing on a drive pin, and is rotationally fixedly at least coupled to the outer raceway. The ratio of the diameter d | 12-18-2008 |
20090142012 | UNIT COMPRISING A WHEEL BEARING AND AT LEAST ONE VEHICLE-SIDED FIXED SUPPORT - The invention relates to a unit comprising a wheel bearing and at least one vehicle-sided fixed support. The wheel bearing comprising at least one outer part which is rigidly fixed to at least one bearing seat which is embodied as an axial passage of a sheet metal moulded part of the support, and at least one end section of the outer part is surrounded in a radial and supple manner, at least in the proximity of said passage such that the end section engages in an axial mariner behind the support. | 06-04-2009 |
20090160244 | UNIT COMPRISING AT LEAST ONE CARRIER AND A WHEEL BEARING - The invention relates to a unit comprising a carrier and a wheel bearing. The wheel bearing comprises at least one outer ring which is provided with at least one track for the rolling bodies. According the invention, the wheel bearing is maintained on the carrier in a fixed manner in relation to the carrier in a first receiving element by means of a first connection projection, and in a second receiving element by means of a second connection projection, at least in both axial directions of the wheel bearing, respectively by means of an end which axially borders on each of the connection projections. | 06-25-2009 |
20090317030 | ANGULAR CONTACT ROLLER BEARINGS, IN PARTICULAR MULTI-ROW BALL ROLLER BEARINGS - The invention relates to an angular contact roller bearing having an outer bearing ring, an inner bearing ring, a plurality of ball rollers arranged between the rings, and a bearing cage. The ball rollers in the two adjacent rows have pressure angle axes extending parallel to one another and are arranged directly one next to the other with their side faces point toward one another. Adjacent ball rollers in the two rows are arranged on a common rotational axis. The ball rollers have diameters and widths which are dimensioned in such a way that envelope cones which form tangents with all the ball rollers at their diameters are arranged with their cone tips precisely at the intersection point of the common rotational axes of the bearing longitudinal axis. | 12-24-2009 |
Patent application number | Description | Published |
20090306921 | SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS - The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion. | 12-10-2009 |
20100026978 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates a projection objective of a microlithographic projection exposure apparatus, as well as a related microlithographic projection exposure apparatus and method. The projection objective can include a lens of a cubically crystalline material whose crystal orientation is oriented at an angle of at most 15° relative to the optical axis of the projection objective. The projection objective can also include a polarization correction element which has at least two subelements of birefringent, optically uniaxial material and having at least one respective aspheric surface. During use of the projection objective, the polarization correction element at least partially compensates for an intrinsic birefringence of the lens. | 02-04-2010 |
20120320358 | METHOD FOR OPERATING A PROJECTION EXPOSURE APPARATUS WITH CORRECTION OF IMAGING ABERRATIONS INDUCED BY THE MASK - The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in different structure directions. Wavefront aberrations induced by the mask are reduced by a manipulator of the projection exposure apparatus for microlithography. | 12-20-2012 |
20130100428 | MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPTIMISING THE IMAGING OF A MASK | 04-25-2013 |
20130156939 | METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK DEFECT - The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures. | 06-20-2013 |
20130188160 | Optical System of a Microlithographic Projection Exposure Apparatus and Method of Reducing Image Placement Errors - A method of reducing image placement errors in a microlithographic projection exposure apparatus includes providing a mask, a light sensitive layer and a microlithographic projection exposure apparatus which images features of the mask onto the light sensitive surface using projection light. Subsequently, image placement errors associated with an image of the features formed on the light sensitive surface are determined either by simulation or metrologically. Then an input state of polarization of the projection light is changed to an elliptical output state of polarization which is selected such that the image placement errors are reduced. | 07-25-2013 |
20130188163 | Mirror and Related EUV Systems and Methods - A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture. | 07-25-2013 |
20130250265 | Projection Exposure Apparatus for EUV Microlithography and Method for Microlithographic Exposure - The disclosure relates to a projection exposure apparatus for EUV microlithography which includes an illumination system for illuminating a pattern, and a projection objective for imaging the pattern onto a light-sensitive substrate. The projection objective has a pupil plane with an obscuration. The illumination system generates light with an angular distribution having an illumination pole which extends over a range of polar angles and a range of azimuth angles and within which the light intensity is greater than an illumination pole minimum value. From the illumination pole toward large polar angles a dark zone is excluded within which the light intensity is less than the illumination pole minimum value, and which has in regions a form corresponding to the form of the obscuration of the pupil plane. | 09-26-2013 |
20140111785 | ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY - An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination. | 04-24-2014 |
20140132942 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE - The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element, which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray and a second partial ray, with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element for generating a desired polarized illumination setting from the first partial ray and the second partial ray, wherein the ray-splitting optical element is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one. | 05-15-2014 |
20140176928 | IMAGING CATOPTRIC EUV PROJECTION OPTICAL UNIT - An imaging catoptric optical unit has at least four mirror, which image an object field in an object plane into an image field in an image plane. A first chief ray plane of the optical unit is prescribed by propagation of a chief ray of a central object field point during the reflection at one of the mirrors. A second chief ray plane of the optical unit is prescribed by propagation of the chief ray of the central object field point during the reflection at one of the other mirrors. The two chief ray planes include an angle that differs from 0. In an alternative or additional aspect, the imaging optical unit, considered via the image field, has a maximum diattenuation of 10% or a diattenuation that prefers a tangential polarization of the imaging light for a respectively considered illumination angle. The result of both aspects is an imaging optical unit in which bothersome polarization influences are reduced during the reflection of imaging light at the mirrors of the imaging optical unit. | 06-26-2014 |
20140192339 | COLLECTOR - A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum. | 07-10-2014 |
20140240686 | ARRANGEMENT OF A MIRROR - A mirror for EUV radiation comprises a total reflection surface, which has a first EUV-radiation-reflecting region and at least one second EUV-radiation-reflecting region, wherein the EUV-radiation-reflecting regions are structurally delimited from one another, wherein the first region comprises at least one first partial reflection surface which is surrounded along a circumference in each case by the at least one second region, and wherein the at least one second EUV-radiation-reflecting region comprises at least one second partial reflection surface which is embodied in a path-connected fashion and which is embodied in a continuous fashion. | 08-28-2014 |
20140347646 | METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM - The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated. | 11-27-2014 |
20150160561 | MIRROR - Mirror having a fragmented total surface area, wherein the fragmentation forms an aperiodic arrangement. | 06-11-2015 |
20150234289 | METHOD FOR OPERATING A PROJECTION EXPOSURE APPARATUS WITH CORRECTION OF IMAGING ABERRATIONS INDUCED BY THE MASK - The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in different structure directions. Wavefront aberrations induced by the mask are reduced by a manipulator of the projection exposure apparatus for microlithography. | 08-20-2015 |
20160004164 | ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR THEREFOR - The invention relates to an illumination system for an EUV lithography device, comprising: a first facet mirror having facet elements that reflect EUV radiation, and a second facet mirror having facet elements for reflecting the EUV radiation reflected by the first facet mirror onto an illumination field. At least one of the facet elements of the first facet mirror or of the second facet mirror is designed as a diffractive optical element for diffracting the EUV radiation. In particular, at least one of the facet elements of the second facet mirror is designed as a diffractive optical element for illuminating only a part of the illumination field. The invention also relates to an EUV lithography device comprising such an illumination system, and to a facet mirror comprising at least one diffractive facet element. | 01-07-2016 |
Patent application number | Description | Published |
20110142556 | TOOL FOR MACHINING, IN PARTICULAR LONGITUDINAL TURNING TOOL - The present invention relates to a tool for machining a workpiece, comprising a tool body, a cutting tool, and fastening means for fastening the cutting tool in a receiving recess of the tool body, the cutting tool having a cutting edge and a cutting-tool through-bore, and the tool body having a tool-body through-bore that opens into the receiving recess, wherein the fastening means comprises a clamping bushing that is provided with an internal thread, and comprises a clamping screw that is provided with an external thread corresponding to the internal thread of the clamping bushing, which are inserted into the cutting-tool bore or into the tool-body bore from opposing sides in order to fasten the cutting tool to the tool body, the clamping bushing is screwed directly to the clamping screw, irrespective of whether it is inserted into the cutting-tool bore or into the tool-body bore, and anti-rotation means are provided to prevent the clamping bushing from rotating about its longitudinal axis when being screwed and undone by means of the clamping screw. | 06-16-2011 |
20120009030 | Tool For Machining, In Particular Straight Turning Tool - The present invention relates to a tool for machining a workpiece, comprising a tool body, a cutting tool and fastening means for fastening the cutting tool in an accommodating recess of the tool body, wherein the cutting tool has a cutting edge and a cutting tool through-bore, and wherein the tool body has a tool body through-bore opening into the accommodating recess. According to the invention, in order to provide a simple possibility of being able to change the cutting tool from both sides, depending on accessibility, the fastening means have a clamping bush provided with an internal thread and a clamping screw provided with an external thread corresponding with the internal thread of the clamping bush, the clamping screw is selectively either inserted through the cutting tool bore into the tool body bore and is screwed to the clamping bush or is inserted from the opposite side through the tool body bore into the cutting tool bore and is screwed to the clamping bush, wherein both ways of inserting of the clamping screw are enabled, and anti-rotation locking means are provided which prevent rotation of the clamping bush about the longitudinal axis thereof during the screwing-down and release by means of the clamping screw, wherein the anti-rotation locking means are formed by a tapered surface on the clamping hush and/or by a tapered surface on the clamping screw head, said tapered surfaces being adapted to at least part of the tool body bore and/or the cutting tool bore. | 01-12-2012 |