Patent application number | Description | Published |
20090126870 | METHOD OF MAKING SUB-SURFACE PHOTOALTERATIONS IN A MATERIAL - A method of photoaltering a material using a pulsed laser beam includes selecting a first pulse energy and a first focal point separation based on a relationship of pulse energy and focal point separation combinations enabling layer separation of the material by photoalteration, and scanning the pulsed laser beam along a scan region at the first pulse energy and the first focal point separation. The relationship has a slope and has a distinct change in the slope. The distinct change in the slope is associated with a second pulse energy of the relationships and the first pulse energy is equal to or less than the second pulse energy. | 05-21-2009 |
20090171329 | Spaster pattern and pulse blanking - System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern. | 07-02-2009 |
20090237768 | Method and System for Laser Amplification Using a Dual Crystal Pockels Cell - A system for laser amplification includes a dual-crystal Pockels cell which is used to control emission of laser pulses from an ultra-fast laser. The Pockels cell is constructed to enable adjustment of the rotational orientation of one crystal relative to the other crystal. The rotational orientation of one or both crystals in the Pockels cell is adjusted to control sidebands in the laser pulse. | 09-24-2009 |
20110013262 | Method and System for Laser Amplification Using a Dual Crystal Pockels Cell - A system for laser amplification includes a dual-crystal Pockels cell which is used to control emission of laser pulses from an ultra-fast laser. The Pockels cell is constructed to enable adjustment of the rotational orientation of one crystal relative to the other crystal. The rotational orientation of one or both crystals in the Pockels cell is adjusted to control sidebands in the laser pulse. | 01-20-2011 |
20110267683 | SYSTEM AND METHOD FOR MONITORING IN-SITU PROCESSING OF SPECIMENS USING COHERENT ANTI-STOKES RAMAN SCATTERING (CARS) MICROSCOPY - System and method are disclosed for in-situ monitoring of a specimen while undergoing a defined process. The system includes a processing system adapted to perform the defined process on the specimen, and a coherent anti-Stokes Raman scattering (CARS) microscopy system adapted to in-situ monitor the specimen. In another aspect, the CARS microscopy system is adapted to in-situ monitor the specimen simultaneous with the defined process being performed on the specimen by the processing system. In still another aspect, the CARS microscopy system is adapted to perform a measurement of the specimen while the defined process being performed on the specimen is paused or temporarily halted. | 11-03-2011 |
20130211390 | SYSTEM AND METHOD FOR SCANNING A PULSED LASER BEAM - Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern. | 08-15-2013 |
20140160467 | SYSTEM AND METHOD FOR CHARACTERIZING MATERIAL SHRINKAGE USING COHERENT ANTI-STOKES RAMAN SCATTERING (CARS) MICROSCOPY - System and method are disclosed for measuring properties (e.g., shrinkage) of a photosensitive material (e.g., photoresist) while undergoing a defined photolithography process. The system includes a photolithography processing system adapted to perform a defined photolithography process of the photosensitive material, and a coherent anti-Stokes Raman scattering (CARS) microscopy system adapted to perform measurement of the properties of the photosensitive material. In another aspect, the CARS microscopy system is adapted to measure properties of the photosensitive material simultaneous with the defined photolithography process being performed on the photosensitive material by the photolithography processing system. In still another aspect, the CARS microscopy system is adapted to measure properties of the photosensitive material while the defined photolithography process on the photosensitive material is paused. Another system is adapted to perform similar measurements during the manufacturing of the photosensitive material. | 06-12-2014 |
20150190282 | METHOD FOR SCANNING A PULSED LASER BEAM - Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern. | 07-09-2015 |
20150190283 | METHOD FOR SCANNING A PULSED LASER BEAM - Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern. | 07-09-2015 |