Patent application number | Description | Published |
20090218519 | Three-Dimensional Direct-Write Lithography - A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength. | 09-03-2009 |
20100145648 | SYSTEM AND METHOD FOR CORRECTING SAMPLING ERRORS ASSOCIATED WITH RADIATION SOURCE TUNING RATE FLUCTUATIONS IN SWEPT-WAVELENGTH INTERFEROMETRY - The frequency-sampling method is widely used to accommodate nonlinear electromagnetic source tuning in swept-wavelength interferometric techniques, such as optical frequency domain reflectometry (OFDR) and swept-wavelength optical coherence tomography (OCT). Two sources of sampling errors are associated with the frequency-sampling method. One source of error is the limit of an underlying approximation for long interferometer path mismatches and fast electromagnetic source tuning rates. A second source of error is transmission delays in data acquisition hardware. Aspects of the invention relate to a method and system for correcting to sampling errors in swept-wavelength interferometry systems such that the two error sources correct sampling errors associated with the first radiation path and the second radiation path cancel to second order. | 06-10-2010 |
20120008146 | Systems, Methods and Computer-Accessible Medium Which Provide Microscopic Images of at Least One Anatomical Structure at a Particular Resolution - Exemplary embodiments of apparatus, systems and methods can be provided for providing at least one electro-magnetic radiation to at least one sample. For example, a plurality of wave-guiding arrangements can be provided which are configured to (i) provide the electro-magnetic radiation(s), and (ii) at a point of emission of each of the wave guiding arrangements, cause a phase of each of the electro-magnetic radiation(s) to have a predetermined value. The exemplary apparatus can be part of a probe. Further the exemplary apparatus can include an interferometric arrangement provided in communication with the probe and/or be part of the probe. | 01-12-2012 |
20120092632 | DIFFRACTION UNLIMITED PHOTOLITHOGRAPHY - Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed. | 04-19-2012 |
20130214439 | Three-Dimensional Direct-Write Lithography - A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength. | 08-22-2013 |
20130252178 | Liquid Deposition Photolithography - Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods. | 09-26-2013 |
20140168603 | Systems And Methods For Creating Aberration-Corrected Gradient Index Lenses - Embodiments include methods, systems, and/or devices that may be used to create aberration-corrected gradient index lenses. In some embodiments, data related to aberration measurements is received. This data is processed and an inverse map is generated to compensate for the aberration measurements. An intensity pattern corresponding to the inverse map is then projected onto a blank lens (e.g., to locally polymerize a mobile monomer) to create an exposed lens with a gradient index to correct for the aberration measurement. For example, in some embodiments, the lens may be an intraocular lens and the data can be generated by using a wavefront sensor to measure aberrations (e.g., an optical phase profile to correct defocus or astigmatism) in a patient's eye. | 06-19-2014 |
20140316521 | Rewriteable Aberration-Corrected Gradient-Index Intraocular Lenses - Systems and methods for rewritable aberration-corrected gradient-index intraocular lenses are provided. Various embodiments relate to rewritable aberration-corrected gradient-index intraocular lenses. Some embodiments provide for polymer materials and processing to create full or partial rewritable phakic or pseudophakic intraocular lenses which allow for adjustable visual performance by doctors. Various methods to fabricate and adjust the lenses with optical and/or mechanical properties customized to the individual patient are also disclosed. | 10-23-2014 |