Patent application number | Description | Published |
20100025693 | Wide band gap semiconductor device including junction field effect transistor - A wide band gap semiconductor device has a transistor cell region, a diode forming region, an electric field relaxation region located between the transistor cell region and the diode forming region, and an outer peripheral region surrounding the transistor cell region and the diode forming region. In the transistor cell region, a junction field effect transistor is disposed. In the diode forming region, a diode is disposed. In the electric field relaxation region, an isolating part is provided. The isolating part includes a trench dividing the transistor cell region and the diode forming region, a first conductivity-type layer disposed on an inner wall of the trench, and a second conductivity-type layer disposed on a surface of the first conductivity-type layer so as to fill the trench. The first conductivity-type layer and the second conductivity-type layer provide a PN junction. | 02-04-2010 |
20110002083 | CERAMIC MATERIAL AND ELECTRONIC DEVICE - A ceramic material has a perovskite structure and is represented by formula of (1−x)ABO | 01-06-2011 |
20110133211 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A wide band gap semiconductor device having a JFET, a MESFET, or a MOSFET mainly includes a semiconductor substrate, a first conductivity type semiconductor layer, and a first conductivity type channel layer. The semiconductor layer is formed on a main surface of the substrate. A recess is formed in the semiconductor layer in such a manner that the semiconductor layer is divided into a source region and a drain region. The recess has a bottom defined by the main surface of the substrate and a side wall defined by the semiconductor layer. The channel layer has an impurity concentration lower than an impurity concentration of the semiconductor layer. The channel layer is formed on the bottom and the side wall of the recess by epitaxial growth. | 06-09-2011 |
20110156052 | Semiconductor device having JFET and method for manufacturing the same - A semiconductor device having a JFET includes: a substrate made of semi-insulating semiconductor material; a gate region in a surface portion of the substrate; a channel region disposed on and contacting the gate region; a source region and a drain region disposed on both sides of the gate region so as to sandwich the channel region, respectively; a source electrode electrically coupled with the source region; a drain electrode electrically coupled with the drain region; and a gate electrode electrically coupled with the gate region. An impurity concentration of each of the source region and the drain region is higher than an impurity concentration of the channel region. | 06-30-2011 |
20110156053 | SEMICONDUCTOR DEVICE HAVING D MODE JFET AND E MODE JFET AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes: a substrate; and depletion and enhancement mode JFETs. The depletion mode JFET includes: a concavity on the substrate; a channel layer in the concavity; a first gate region on the channel layer; first source and drain regions on respective sides of the first gate region in the channel layer; first gate, source and drain electrodes. The enhancement mode JFET includes: a convexity on the substrate; the channel layer on the convexity; a second gate region on the channel layer; second source and drain regions on respective sides of the second gate region in the channel layer; second gate, source and drain electrodes. A thickness of the channel layer in the concavity is larger than a thickness of the channel layer on the convexity. | 06-30-2011 |
20110156054 | SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A silicon carbide semiconductor device having a JFET or a MOSFET includes a semiconductor substrate and a trench. The semiconductor substrate has a silicon carbide substrate, a drift layer on the silicon carbide substrate, a first gate region on the drift layer, and a source region on the first gate region. The trench has a strip shape with a longitudinal direction and reaches the drift layer by penetrating the source region and the first gate region. The trench is filled with a channel layer and a second gate region on the channel layer. The source region is not located at an end portion of the trench in the longitudinal direction. | 06-30-2011 |
20110186861 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device having a JFET or a MESFET mainly includes a semiconductor substrate, a first conductivity type semiconductor channel layer on the substrate, a first conductivity type semiconductor layer on the channel layer, and an i-type sidewall layer on a sidewall of a recess that penetrates the semiconductor layer to divide the semiconductor layer into a source region and a drain region. The semiconductor layer has an impurity concentration greater than an impurity concentration of the channel layer. The semiconductor device further includes a second conductivity type gate region that is located on the channel layer in the recess and on the i-type sidewall layer. The gate region is spaced from the source region and the drain region by the i-type sidewall layer. | 08-04-2011 |
20110198612 | SIC SEMICONDUCTOR DEVICE HAVING CJFET AND METHOD FOR MANUFACTURING THE SAME - A SiC semiconductor device includes: a SiC substrate made of intrinsic SiC having semi-insulating property; first and second conductive type SiC layers disposed in the substrate; an insulation separation layer made of intrinsic SiC for isolating the first conductive type SiC layer from the second conductive type SiC layer; first and second conductive type channel JFETs disposed in the first and second conductive type SiC layers, respectively. The first and second conductive type channel JFETs provide a complementary junction field effect transistor. Since an electric element is formed on a flat surface, a manufacturing method is simplified. Further, noise propagation at high frequency and current leakage at high temperature are restricted. | 08-18-2011 |
20110254177 | POWER ELECTRONIC PACKAGE HAVING TWO SUBSTRATES WITH MULTIPLE SEMICONDUCTOR CHIPS AND ELECTRONIC COMPONENTS - A power electronic package includes: first and second high thermal conductivity insulating non-planar substrates; and multiple semiconductor chips and electronic components between the substrates. Each substrate includes multiple electrical insulator layers and patterned electrical conductor layers connecting to the electronic components, and further includes multiple raised regions or posts, which are bonded together so that the substrates are mechanically and electrically connected. The number, arrangement, and shape of the raised regions or posts are adjusted to have mechanical separation between the substrates. The electrical conductor layers are separated and isolated one another so that multiple electric circuits are provided on at least one of the substrates. | 10-20-2011 |
20120080728 | SEMICONDUCTOR DEVICE WITH JUNCTION FIELD-EFFECT TRANSISTOR AND MANUFACTURING METHOD OF THE SAME - A semiconductor device with a JFET is disclosed. The semiconductor device includes a trench and a contact embedded layer formed in the trench. A gate wire is connected to the contact embedded layer, so that the gate wire is connected to an embedded gate layer via the contact embedded layer. In this configuration, it is possible to downsize a contact structure between the embedded gate layer and the gate wire. | 04-05-2012 |