Patent application number | Description | Published |
20090261063 | Method for Producing a Nanostructure on a Plastic Surface - A nanostructure is produced at a surface of a substrate composed of a plastic by means of a plasma etching process. A thin layer is applied to the plastic substrate and the plasma etching process is subsequently carried out. | 10-22-2009 |
20100033819 | Optical Element with an Anti-Fog Layer and Method for its Production - An optical element is provided with a fog reducing polymer layer. A reflection reducing nanostructure is formed on the surface of the fog reducing polymer layer. | 02-11-2010 |
20100062175 | Method for Manufacturing an Optical Waveguide Layer - A method for manufacturing an optical waveguide layer includes a substrate that is prepared, onto which a first part-layer is first grown. Subsequently, a second part-layer of the waveguide layer, consisting of the same material as the first part-layer, is grown on the first part-layer. The second part-layer is bombarded with ions as it grows. The method permits manufacturing optical waveguide layers on temperature-sensitive polymer substrates. | 03-11-2010 |
20110051246 | Reflection-Reducing Interference Layer System and Method for Producing It - A reflection-reducing interference layer system is disclosed, which has at least three alternating layers having different refractive indices. At least one nanostructured layer comprising an organic material or an organic-inorganic hybrid material is applied to the alternating layers. With the interference layer system, it is possible to obtain very low reflection over a wide wavelength and incident angle range. | 03-03-2011 |
20130182329 | Plastic Substrate having a Porous Layer and Method for Producing the Porous Layer - A plastic substrate has a porous layer on a surface. The porous layer is formed at least partially from a material of the plastic substrate and has pores. The proportion by volume of pores is greater in a first region of the porous layer than in a second region of the porous layer. The second region follows the first region, as seen proceeding from the plastic substrate. The porous layer can be produced by a plasma process that simultaneously effects structuring of the plastic substrate by ion bombardment and coating of the plastic substrate. | 07-18-2013 |
20140072721 | Method for Modifying a Surface of a Substrate using Ion Bombardment - A process is described for modification of a surface of a substrate by ion bombardment, in which the ions are produced by means of a magnetic field-assisted glow discharge in a process gas. The magnetic field-assisted glow discharge is produced by means of a magnetron having an electrode and at least one magnet for production of the magnetic field. The process gas has at least one electronegative constituent, such that negative ions are produced in the magnetic field-assisted glow discharge, and the negative ions which are produced at the surface of the electrode are accelerated in the direction of the substrate by an electrical voltage applied to the electrode. | 03-13-2014 |
20140374377 | Method for Producing an Antireflection Coating - A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process. | 12-25-2014 |
20150309214 | Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element - A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method. | 10-29-2015 |