Patent application number | Description | Published |
20090134501 | DEVICE AND METHOD INCLUDING A SOLDERING PROCESS - A device and method of making a device is disclosed. One embodiment provides a substrate. A semiconductor chip is provided having a first surface with a roughness of at least 100 nm. A diffusion soldering process is performed to join the first surface of the semiconductor chip to the substrate. | 05-28-2009 |
20110294289 | Method for Producing a Connection Electrode for Two Semiconductor Zones Arranged One Above Another - A method for producing a connection electrode for a first and second adjacent and complementarily doped semiconductor zones includes a step of producing a trench extending through the first semiconductor zone into the second semiconductor zone in such a way that the first semiconductor zone is uncovered at sidewalls of the trench and the second semiconductor zone is uncovered at least at a bottom of the trench. The method also includes producing a first connection zone in the first semiconductor zone by implanting dopant atoms into the sidewalls at least at a first angle. The method further includes producing a second connection zone in the second semiconductor zone by implanting dopant atoms at least at a second, different angle. The method also includes depositing an electrode layer at least onto the sidewalls and the bottom of the trench for the purpose of producing the connection electrode. | 12-01-2011 |
20120013029 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES HAVING A METALLISATION LAYER - A method for manufacturing semiconductor devices is disclosed. In one embodiment a semiconductor substrate having a first surface, a second surface opposite to the first surface and a plurality of semiconductor components is provided. The semiconductor substrate has a device thickness. At least one metallisation layer is formed on the second surface of the semiconductor substrate. The metallisation layer has a thickness which is greater than the device thickness. | 01-19-2012 |
20120267770 | DEVICE AND METHOD INCLUDING A SOLDERING PROCESS - A device and method of making a device is disclosed. One embodiment provides a substrate. A semiconductor chip is provided having a first surface with a roughness of at least 100 nm. A diffusion soldering process is performed to join the first surface of the semiconductor chip to the substrate. | 10-25-2012 |
20130017651 | METHOD FOR MANUFACTURING A SEMICONDUCTOR PACKAGEAANM Standing; MartinAACI VillachAACO ATAAGP Standing; Martin Villach ATAANM Ganitzer; PaulAACI VillachAACO ATAAGP Ganitzer; Paul Villach AT - A method for manufacturing a semiconductor package, the method comprising providing a substrate having opposite first and second surfaces and having one or more through openings formed therethrough from the first to the second surfaces at predefined positions; providing at least one first die having first and second opposite surfaces and having one or more first contact terminals on the first surface of the at least one first die; placing the at least one first die with the first surface thereof on the first surface of the substrate, with an adhesive applied therebetween outside the one or more through openings, such that the one or more through openings are aligned to the one or more first contact terminals, whereby a die assembly having correspondingly opposite first and second surfaces is formed; providing the first surface of the die assembly with a first plating layer of an electrically conductive plating material to electrically contact the one or more first contact terminals, wherein the plating material of the first plating layer extends in the through openings to electrically contact the one or more first contact terminals therethrough. | 01-17-2013 |
20140167209 | Method of Manufacturing a Semiconductor Device and a Semiconductor Workpiece - A semiconductor device is manufactured in a semiconductor substrate comprising a first main surface, the semiconductor substrate including chip areas. The method of manufacturing the semiconductor substrate comprises forming components of the semiconductor device in the first main surface in the chip areas, removing substrate material from a second main surface of the semiconductor substrate, the second main surface being opposite to the first main surface, forming a separation trench into a first main surface of the semiconductor substrate, the separation trench being disposed between adjacent chip areas. The method further comprises forming at least one sacrificial material in the separation trench, and removing the at least one sacrificial material from the trench. | 06-19-2014 |
20140167270 | Method of Fabricating a Layer Stack - In one embodiment method, a first Ti based layer is deposited on the substrate. An intermediate Al based layer is deposited on the first layer, a second NiV based layer is deposited on the intermediate layer, and a third Ag based layer is deposited on the second layer. The layer stack is tempered in such a way that at least one inter-metallic phase is formed between at least two metals of the group containing Ti, Al, Ni and V. | 06-19-2014 |
20140284819 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES HAVING A METALLISATION LAYER - A method for manufacturing semiconductor devices is disclosed. In one embodiment a semiconductor substrate having a first surface, a second surface opposite to the first surface and a plurality of semiconductor components is provided. The semiconductor substrate has a device thickness. At least one metallisation layer is formed on the second surface of the semiconductor substrate. The metallisation layer has a thickness which is greater than the device thickness. | 09-25-2014 |