Okajo
Sumitaka Okajo, Minato-Ku JP
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20110043869 | INFORMATION PROCESSING SYSTEM, ITS METHOD AND PROGRAM - It is an object to provide an information processing system characterized in comprising an object classification means that classifies a document-composing object extracted from an electronic document or a document image into a text region-composing object and a chart region-composing object by using at least an area histogram of the object including a text. | 02-24-2011 |
Sumitaka Okajo, Tokyo JP
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20130080892 | INFORMATION PROCESSING DEVICE, GUI MANIPULATION ASSISTANCE METHOD, AND COMPUTER-READABLE RECORDING MEDIUM - An information processing device ( | 03-28-2013 |
Taketoshi Okajo, Nirasaki JP
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20110048453 | CHAMBER CLEANING METHOD - Provided is a chamber cleaning method capable of efficiently removing a CF-based shoulder deposit containing Si and Al deposited on an outer periphery of an ESC. A mixed gas of an O | 03-03-2011 |
Taketoshi Okajo, Nirasaki City JP
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20100122774 | SUBSTRATE MOUNTING TABLE AND SUBSTRATE PROCESSING APPARATUS HAVING SAME - A substrate mounting table includes a mounting table main body, a mounting unit provided at an upper portion of the mounting table main body, a heat source transferring a (cold) heat to the upper portion of the mounting table main body, and a heat transfer control part. The heat transfer control part includes a cavity portion provided in the mounting table main body to correspond to the mounted substrate, and a solid member filled in the cavity portion and having pores communicating with one another. The heat transfer control part controls a heat transfer level from the heat source by supplying or exhausting a heat transfer gas to or from the cavity portion. A controller controls the supplying and the exhausting of the heat transfer gas to and from the cavity portion by a heat transfer gas supply unit and a heat transfer gas exhaust unit, respectively. | 05-20-2010 |
Taketoshi Okajo, Nirasaki-Shi JP
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20080212640 | APPARATUS AND METHOD FOR TESTING A TEMPERATURE MONITORING SUBSTRATE - A testing apparatus for a temperature monitoring substrate includes a heat flow generating unit for generating a heat flow in the temperature monitoring substrate in a depthwise direction of the temperature sensors, wherein the temperature sensors are buried in the depthwise direction. Further, a testing method for a temperature monitoring substrate includes generating a heat flow in the temperature monitoring substrate in a depthwise direction, wherein the temperature sensors are buried in the depthwise direction; processing a temperature of the substrate measured by the temperature sensor under the heat flow by a prescribed method; and determining whether or not an error occurs in the temperature sensor. | 09-04-2008 |
Taketoshi Okajo, Miyagi JP
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20130228323 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF CHANGING SUBSTRATE TEMPERATURE SETTING REGION - A substrate processing apparatus includes: a processing chamber; a support base; an electrostatic chuck; a chiller; a first channel; a second channel; a bypass channel; and a flow rate control valve. The first channel connects the chiller and a coolant entrance of the support base and the second channel connects the chiller and a coolant exit of the support base. The bypass channel branches from a midway of the first channel and is connected to a midway of the second channel. The flow rate control valve controls a flow rate of coolant flowing through the bypass channel. | 09-05-2013 |