Patent application number | Description | Published |
20090059393 | OPTICAL SYSTEM AND OPTICAL APPARATUS - Providing an optical system having a large aperture ratio, a long back focal length, high optical performance with excellently correcting various aberrations, and an optical apparatus equipped with the optical system. The system includes, in order from an object along an optical axis of the optical system, a first lens group G | 03-05-2009 |
20090309989 | Camera capable of taking movie - An imaging apparatus includes: an imaging unit that repeatedly captures images of a subject to obtain image information; a recording unit that records timing information indicative of a given point in time during an imaging period of the image information; and a display unit that displays an image corresponding to the timing information, which is extracted from the image information, in response to an end of the imaging period. | 12-17-2009 |
20100027959 | Image processing program, image processing device and image processing method - An image processing program that is executed by a computer includes: reading process of reading a plurality of image data items that have been photographed and acquired by a plurality of cameras; and editing process of extracting image data items of which dates and times of photography overlap within a same time band from among the plurality of image data items that have been read, and generating a data item for playback by editing the plurality of extracted image data items. | 02-04-2010 |
20110096416 | LENS SYSTEM AND OPTICAL APPARATUS - A lens system comprising, in order from an object side: a first lens group G | 04-28-2011 |
20110128630 | LENS SYSTEM AND OPTICAL APPARATUS - A lens system comprising, in order from an object side: a first lens group G | 06-02-2011 |
20110273776 | ZOOM LENS SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING ZOOM LENS SYSTEM - Including, in order from an object side: a first lens group G | 11-10-2011 |
20120105966 | ZOOM LENS, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING ZOOM LENS - A zoom lens includes, in order from an object side along an optical axis, a first lens group G | 05-03-2012 |
20120188647 | ZOOM LENS SYSTEM, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING ZOOM LENS SYSTEM - With including, in order from an object side along an optical axis: a first lens group having positive refractive power; a second lens group having negative refractive power; a third lens group having positive refractive power; a fourth lens group having negative refractive power; and a fifth lens group having positive refractive power, upon zooming from a wide-angle end state to a telephoto end state, the first lens group being moved with respect to an image plane, a distance between the first lens group and the second lens group increasing, a distance between the second lens group and the third lens group decreasing, a distance between the third lens group and the fourth lens group varying, and a distance between the fourth lens group and the fifth lens group varying, and a given conditional expression being satisfied, thereby providing a zoom lens system having sufficiently high optical performance. | 07-26-2012 |
20130010377 | LENS BARREL, CAMERA DEVICE AND LENS HOOD - At the inside wall face of the first tube portion | 01-10-2013 |
20130301143 | LENS SYSTEM AND OPTICAL APPARATUS - A lens system comprising, in order from an object side: a first lens group G | 11-14-2013 |
20140334013 | ZOOM LENS SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING ZOOM LENS SYSTEM - In a zoom lens system, an optical apparatus, and a manufacturing method, there are provided, in order from an object side: a first lens group having positive power, a second lens group having negative power, a third lens group having positive power, a fourth lens group having negative power, a fifth group having positive power, and an aperture stop disposed to an image side of the second lens group. Upon zooming from a wide-angle end state to a telephoto end state, a distance between the first lens and second lens groups increases, a distance between the second and third lens groups decreases, a distance between the third and fourth lens groups varies, and a distance between the fourth and fifth lens groups varies. With given conditions being satisfied, high optical performance with suppressing variation in aberrations are achieved. | 11-13-2014 |
20140362452 | ZOOMING OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING ZOOMING OPTICAL SYSTEM - A zooming optical system that is compact and has high zooming ratio and superb optical performance, optical system and a method for manufacturing the zooming optical system, are provided. The zooming optical system includes, in order from an object along the optical axis, a first lens group G | 12-11-2014 |
Patent application number | Description | Published |
20090283502 | PLASMA PROCESSING APPARATUS AND CONTROL METHOD FOR PLASMA PROCESSING APPARATUS - A unit for minimizing the problem that affects a substrate to be processed at the time of turning off a plasma is provided in a plasma processing apparatus using a magnetic field. The plasma processing apparatus comprises: a plasma-generating high-frequency power supply; a bias power supply; and a coil power supply which is connected to a coil disposed outside a vacuum process chamber and generates a magnetic field inside the vacuum process chamber, and the plasma processing apparatus further comprises: a magnetic field measuring unit which measures a magnetic field strength inside the vacuum process chamber; and a control unit which turns off an output on/off signal of the plasma-generating high-frequency power supply or the bias power supply when a magnetic field strength, which is measured after an output on/off signal of the coil power supply is turned off, decays to a predetermined value. | 11-19-2009 |
20090321391 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus includes a plasma-generation high-frequency power supply which generates plasma in a processing chamber, a biasing high-frequency power supply which applies high-frequency bias electric power to an electrode on which a sample is placed, a monitor which monitors a peak-to-peak value of the high-frequency bias electric power applied to the electrode, an electrostatic chuck power supply which makes the electrode electrostatically attract the sample, a self-bias voltage calculating unit which calculates self-bias voltage of the sample by monitoring the peak-to-peak value of the high-frequency bias electric power applied to the electrode, and an output voltage control unit which controls output voltage of the electrostatic chuck power supply based on the calculated self-bias voltage. | 12-31-2009 |
20100068009 | VACUUM PROCESSING APPARATUS - A vacuum processing apparatus includes a plurality of vacuum containers; a vacuumized transfer unit connected with the vacuum containers and having a transfer chamber; a plurality of lock chambers connected to the vacuumized transfer unit; a vacuumized transferring section arranged in the transfer chamber to transfer the sample between each of the lock chambers and each of the processing chambers inside the plurality of vacuum containers; an atmospheric transfer container having a space through which the sample is transferred under the atmospheric pressure; an atmospheric transfer unit arranged in the atmospheric transfer container and adapted to transfer the sample from a cassette; and a controller operative on the basis of schedule information of a plurality of operations to adjust the operations, the information including times of stagnation of the plurality of samples and set therefor. | 03-18-2010 |
20100163184 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus for processing a surface of a to-be-processed substrate includes a processing chamber, a first electrode provided in the processing chamber, a second electrode arranged in opposition to the first electrode, a main power source for supplying the first or second electrode with power for generating a plasma, a biasing power source for supplying the second or first electrode with biasing power, a gas supplying unit for supplying a processing gas into the processing chamber and a control unit for controlling the main power source, the biasing power source and the gas supplying unit. The control unit performs a control such that, during a time of transition from a stationary state of plasma, in which a plasma processing is to be carried out, to a plasma quenching, an output of the main power source is kept not larger than an output of the biasing power source. | 07-01-2010 |
20120186747 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus is provided with a processing chamber which is arranged inside a vacuum container and plasma is formed inside, a circular shape plate member made of a dielectric material arranged above the processing chamber through which an electric field is transmitted, and a cavity part having a cylindrical shape arranged above the plate member and the electric field is introduced inside, in which the cavity part is provided with a first cylindrical cavity part having a cylindrical shape cavity with a large diameter and having the plate member as the bottom face, a second cylindrical cavity part arranged above to be connected to the first cylindrical cavity part and having a cylindrical shape cavity with a small diameter, and a step portion for connecting these between the first and the second cylindrical cavity parts. | 07-26-2012 |
20130075036 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus includes a plasma-generation high-frequency power supply which generates plasma in a processing chamber, a biasing high-frequency power supply which applies high-frequency bias electric power to an electrode on which a sample is placed, a monitor which monitors a peak-to-peak value of the high-frequency bias electric power applied to the electrode, an electrostatic chuck power supply which makes the electrode electrostatically attract the sample, a self-bias voltage calculating unit which calculates self-bias voltage of the sample by monitoring the peak-to-peak value of the high-frequency bias electric power applied to the electrode, and an output voltage control unit which controls output voltage of the electrostatic chuck power supply based on the calculated self-bias voltage. | 03-28-2013 |