Patent application number | Description | Published |
20090031948 | Substrate processing apparatus - A substrate processing apparatus includes a rotary cup disposed outside a substrate holding member to surround a substrate held on the substrate holding member and to rotate along with the substrate holding member, and having a wall portion that receives a process liquid thrown off from the substrate being rotated. Further, this apparatus includes an exhaust and drain cup disposed outside the rotary cup to surround the rotary cup and the substrate holding member, and including an annular liquid receptacle that receives the process liquid thrown off from the substrate being rotated and an inner annular space formed on an inward side from the annular liquid receptacle. An exhaust mechanism is connected to the inner annular space of the exhaust and drain cup. | 02-05-2009 |
20090056764 | Liquid processing apparatus, liquid processing method, and storage medium - A liquid processing apparatus | 03-05-2009 |
20110023909 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - The liquid processing apparatus includes: a liquid supply mechanism; a supply line connected to the liquid supply mechanism, the supply line having a discharge opening for discharging a temperature-regulated liquid; a processing unit supporting the discharge opening of the supply line; a return line configured to return the liquid supplied to the supply line to the liquid supply mechanism; and a liquid-supply switching valve configured to switch between supply of the liquid, which is used in a processing of an object to be processed in the processing unit, and stoppage of the liquid supply. The liquid-supply switching valve is disposed on the supply line on a route of the liquid returning from the supply line to the liquid supply mechanism through the return line. | 02-03-2011 |
20120312332 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus | 12-13-2012 |
20130014784 | LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHODAANM ITO; NorihiroAACI Koshi-shiAACO JPAAGP ITO; Norihiro Koshi-shi JPAANM AlURA; KazuhiroAACI Koshi-shiAACO JPAAGP AlURA; Kazuhiro Koshi-shi JPAANM SHINDO; NaokiAACI Koshi-shiAACO JPAAGP SHINDO; Naoki Koshi-shi JPAANM HACHIYA; YosukeAACI Koshi-shiAACO JPAAGP HACHIYA; Yosuke Koshi-shi JPAANM NAGAI; TakashiAACI Koshi-shiAACO JPAAGP NAGAI; Takashi Koshi-shi JP - A top plate | 01-17-2013 |
20130014786 | LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHODAANM Ito; NorihiroAACI Koshi-shiAACO JPAAGP Ito; Norihiro Koshi-shi JPAANM Aiura; KazuhiroAACI Koshi-shiAACO JPAAGP Aiura; Kazuhiro Koshi-shi JPAANM Shindo; NaokiAACI Koshi-shiAACO JPAAGP Shindo; Naoki Koshi-shi JPAANM Hachiya; YosukeAACI Koshi-shiAACO JPAAGP Hachiya; Yosuke Koshi-shi JPAANM Nagai; TakashiAACI Koshi-shiAACO JPAAGP Nagai; Takashi Koshi-shi JP - A top plate | 01-17-2013 |
20130319476 | LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD - A liquid treatment apparatus includes a substrate holding member ( | 12-05-2013 |
20140248774 | LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD - The liquid treatment apparatus according to the present invention includes a substrate holder configured to horizontally hold a substrate, and a top plate configured to be rotatable and to cover the substrate held by the substrate holder from above so as to define a treatment space. In the treatment space, a chemical liquid is supplied by a chemical liquid nozzle onto the substrate, and an atmosphere replacement gas is supplied by a replacement nozzle into the treatment space. The replacement nozzle is supported by a replacement nozzle support arm configured to be horizontally moved between an advanced position at which the replacement nozzle support arm is advanced into the treatment space and a retracted position at which the replacement nozzle support arm is retracted outside from the treatment space. The replacement nozzle is configured to discharge, above the substrate, the atmosphere replacement gas upward. | 09-04-2014 |