Patent application number | Description | Published |
20090011194 | SUBSTRATE PROCESSING METHOD - Method for the treatment of at least one surface portion of at least one layer A located between a substrate and a layer B of a thin-film multilayer, the layers of which are vacuum-deposited on the substrate having a glass function, according to the invention, is characterized in that:
| 01-08-2009 |
20090017314 | METHOD FOR DEPOSITION OF AN ANTI-SCRATCH COATING - Process for the vacuum deposition of at least one boron-based thin film on a substrate, characterized in that:
| 01-15-2009 |
20100062245 | SUBSTRATE WHICH IS EQUIPPED WITH A STACK HAVING THERMAL PROPERTIES - The invention relates to a substrate ( | 03-11-2010 |
20100071810 | METHOD FOR DEPOSITING A THIN LAYER AND PRODUCT THUS OBTAINED - One subject of the invention is a process for the treatment of at least one thin continuous film deposited on a first side of a substrate, characterized in that said at least one thin film is raised to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. on the opposite side of said substrate to said first side, so as to increase the degree of crystallization of said thin film while keeping it continuous and without a step of melting said thin film. | 03-25-2010 |
20110117293 | METHOD FOR THIN LAYER DEPOSITION - The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps:
| 05-19-2011 |
20110311732 | THIN FILM DEPOSITION METHOD - The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate ( | 12-22-2011 |
20120087005 | THIN FILM DEPOSITION METHOD AND RESULTING PRODUCT - A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%. | 04-12-2012 |
20120094075 | METHOD FOR DEPOSITING A THIN FILM, AND RESULTING MATERIAL - A method of obtaining a substrate coated on a first face with at least one transparent and electrically conductive thin layer based on at least one oxide, including depositing the at least one thin layer on the substrate and subjecting the at least one thin layer to a heat treatment in which the at least one layer is irradiated with aid of radiation having a wavelength between 500 and 2000 nm and focused on a zone of the at least one layer, at least one dimension of which does not exceed 10 cm. The radiation is delivered by at least one radiation device facing the at least one layer, a relative displacement being created between the radiation device and the substrate to treat the desired surface, the heat treatment being such that resistivity of the at least one layer is reduced during the treatment. | 04-19-2012 |
20120171439 | THIN FILM DEPOSITION METHOD - The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps:
| 07-05-2012 |