Patent application number | Description | Published |
20080276955 | Vibrating Mascara Applicator - The present invention is an improved vibrating mascara applicator. The head is caused to vibrate in a controlled manner through electromechanical urging. The source of the vibration is substantially close to the applicator head. The improved vibrating applicator improves applicator performance, mascara performance, consumer experience and energy efficiency. | 11-13-2008 |
20090056737 | Head For A Cosmetic Applicator - An applicator for applying a cosmetic to keratinous material is provided. The applicator is a single-piece molded unit formed of a single material and includes a slim, tapered head portion, having an arcuate configuration. The head portion comprises a support and at least two rows of projecting tines integrally molded therewith. The tines extend transversely away from one side of the support relative to the longitudinal axis of the head, the opposite side of the support being smooth and free from tines. The arcuate and tapered shape of the support facilitates the application of cosmetic product to the eyelash fringe including the shortest eyelashes located in the corners of the eye. | 03-05-2009 |
20090324318 | Single-Use Cosmetic Package - A single-use cosmetic package has a pouch with a front wall and a back wall. A wand is stored in the pouch. Upper and lower seals hermetically seal the perimeter of the pouch. A middle seal divides the pouch into a product reservoir in a lower half of the pouch and a dry chamber in the upper half. The wand projects from a handle end in the dry chamber through the middle seal to an applicator end in the product reservoir. A dog-bone shaped sealing structure on the wand forms a hermetic seal with the middle seal. The dry chamber is opened by pulling opposite tabs to peel the front wall from the back wall. When the wand is pulled from the pouch, a flange on the wand expands the middle seal to form a wiper opening in the product reservoir. The wiper opening is sized to wipe the applicator end of the wand, or an applicator attached to the end of the wand. | 12-31-2009 |
20110103878 | Ceramic Cosmetic Applicator - A cosmetic applicator formed from ceramic material designed to provide a product chilling effect when applying creams, lotions, treatment products, etc. The applicator is provided with a relatively substantial mass so that it has a greater thermal capacity than the dose of cosmetic and the application area combined. The applicator is in the form of a molded-ceramic applicator head or applicator tip designed to provide a relatively larger product-chilling effect to both the dose of cosmetic applied and to the user's skin in the application area when applying creams, lotions, treatment products, etc. The applicator provides an application device which will deliver the creams, lotions, treatment products, etc. such that the temperature of the product being delivered is lower than the temperature of the skin, and to provide a means of lowering the temperature of the skin by virtue of the thermal absorption capacity of the applicator head or tip, and to provide a vehicle by which formulations may be activated or enhanced by specific compounds in the ceramic material from which the applicator tip is comprised. | 05-05-2011 |
20110103879 | Metal Clad Ceramic Cosmetic Applicator - A cosmetic applicator formed from ceramic material covered in a metal sheath. The tip is designed to provide a product chilling effect when applying creams, lotions, treatment products, etc. The applicator is provided with a relatively substantial mass of ceramic material so that it has a greater thermal capacity than the dose of cosmetic and the application area combined. The applicator is in the form of a molded-ceramic applicator head or applicator tip sheathed, coated or plated in metal. The tip provides a relatively larger product-chilling effect to both the dose of cosmetic applied and to the user's skin in the application area when applying creams, lotions, treatment products, etc. The applicator provides an application device which will deliver the creams, lotions, treatment products, etc. such that the temperature of the product being delivered is lower than the temperature of the skin, and to provide a means of lowering the temperature of the skin by virtue of the thermal absorption capacity of the applicator head or tip, and to provide a vehicle by which formulations may be activated or enhanced by specific compounds in the ceramic material from which the applicator tip is comprised. | 05-05-2011 |
Patent application number | Description | Published |
20080251104 | Systems and Methods for Determination of Endpoint of Chamber Cleaning Processes - Apparatus and method for determination of the endpoint of a cleaning process in which cleaning fluid is contacted with a structure to effect cleaning thereof. The cleaning process includes contacting a cleaning fluid with a structure to be cleaned and producing a cleaning effluent having a sensible heat thermal energy characteristic corresponding to extent of cleaning of the structure, disposing an object in the cleaning effluent that interacts with the cleaning effluent to produce a response indicative of the sensible heat thermal energy characteristic of the cleaning effluent, and monitoring such response to determine when the cleaning is completed. An endpointing algorithm and endpoint monitoring are also described, as well as endpoint monitor sensor elements that are useful to determine endpoint conditions in an efficient and reproduceable manner. | 10-16-2008 |
20090095713 | NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS - A method and apparatus for cleaning residue from components of an ion source region of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region or the vacuum chamber. | 04-16-2009 |
20090305427 | APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS - A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF | 12-10-2009 |
20100139369 | FEEDBACK CONTROL SYSTEM AND METHOD FOR MAINTAINING CONSTANT RESISTANCE OPERATION OF ELECTRICALLY HEATED ELEMENTS - A system and method for controlling electrical heating of an element to maintain a constant electrical resistance, by adjusting electrical power supplied to such element according to an adaptive feedback control algorithm, in which all the parameters are (1) arbitrarily selected; (2) pre-determined by the physical properties of the controlled element; or (3) measured in real time. Unlike the conventional proportion-integral-derivative (PID) control mechanism, the system and method of the present invention do not require re-tuning of proportionality constants when used in connection with a different controlled element or under different operating conditions, and are therefore adaptive to changes in the controlled element and the operating conditions. | 06-10-2010 |
20100154835 | CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS - A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF | 06-24-2010 |