Nam, Chungcheongbuk-Do
Donghee Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20100079069 | DIELECTRIC COMPOSITION AND PLASMA DISPLAY PANEL INCLUDING THE SAME - A dielectric composition for plasma display panel and a plasma display panel including the same are disclosed. The dielectric composition includes about 38 to 68 parts by weight of Bi2O3, about 10 to 35 parts by weight of B2O3, about 1 to 17 parts by weight of SiO2, and about 1 to 15 parts by weight of Al2O3. | 04-01-2010 |
Hye-Yeong Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20110029069 | Bioactive Material Coating Method And Tube - A method for coating bioactive material and a structured coated with a bioactive material are disclosed. The bioactive material coating method includes: flowing a coating solution, produced as a bioactive material is dissolved in a mixed solvent, inside a structure having a lumen; and coating the bioactive material on at least one of inner and outer surfaces of the structure, with different concentrations. The mixed solvent is mixed with two or more solvents having different features. The occurrence of the strangulation of blood vessels and inflammation can be reduced. An increase in the size of the myofibroblast is not suppressed. The coating solution is produced as a medication is dissolved in a mixed solvent, where the mixed solvent is produced as a polar solvent and a nonpolar solvent are mixed with each other at a certain ratio. | 02-03-2011 |
Hyun-Hee Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20080233674 | Photo mask and method for fabricating image sensor using the same - A method for fabricating an image sensor includes forming an insulation layer over a substrate in a logic circuit region and a pixel region, forming a photoresist over the insulation layer, patterning the photoresist to form a photoresist pattern where the insulation layer in the pixel region is exposed and the insulation layer in the logic circuit region is not exposed, wherein a thickness of the photoresist pattern is gradually decreased in an interfacial region between the pixel region and the logic circuit region in a direction of the logic circuit region to the pixel region, and performing an etch back process over the insulation layer and the photoresist pattern in conditions that an etch rate of the photoresist pattern are substantially the same as that of the insulation layer. | 09-25-2008 |
20110291214 | PHOTO MASK AND METHOD FOR FABRICATING IMAGE SENSORS - A method for fabricating an image sensor includes forming an insulation layer over a substrate in a logic circuit region and a pixel region, forming a photoresist over the insulation layer, patterning the photoresist to form a photoresist pattern where the insulation layer in the pixel region is exposed and the insulation layer in the logic circuit region is not exposed, wherein a thickness of the photoresist pattern is gradually decreased in an interfacial region between the pixel region and the logic circuit region in a direction of the logic circuit region to the pixel region, and performing an etch back process over the insulation layer and the photoresist pattern in conditions that an etch rate of the photoresist pattern are substantially the same as that of the insulation layer. | 12-01-2011 |
20110294046 | PHOTO MASK AND METHOD FOR FABRICATING IMAGE SENSORS - A method for fabricating an image sensor includes forming an insulation layer over a substrate in a logic circuit region and a pixel region, forming a photoresist over the insulation layer, patterning the photoresist to form a photoresist pattern where the insulation layer in the pixel region is exposed and the insulation layer in the logic circuit region is not exposed, wherein a thickness of the photoresist pattern is gradually decreased in an interfacial region between the pixel region and the logic circuit region in a direction of the logic circuit region to the pixel region, and performing an etch back process over the insulation layer and the photoresist pattern in conditions that an etch rate of the photoresist pattern are substantially the same as that of the insulation layer. | 12-01-2011 |
Jeong-Bum Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20080279969 | Composition Comprising Bamboo Extract for Androgen Agonist - The present invention relates to a use of bamboo or bamboo extract to prevent or treat symptoms related to decrease of androgen; a composition for androgen agonist comprising bamboo or bamboo extract; a method for preventing or treating symptoms related to decrease of androgen by administering composition for androgen agonist; and a method of preparing composition for androgen agonist. The present composition obtained from natural material can be used as Phyto-androgen for the preventing and treating symptoms of male climacteric without dangerousness according to hormone replacement therapy. | 11-13-2008 |
20090304830 | Composition Comprising Bamboo Extract for Androgen Agonist - The present invention relates to a use of bamboo or bamboo extract to prevent or treat symptoms related to decrease of androgen; a composition for androgen agonist comprising bamboo or bamboo extract; a method for preventing or treating symptoms related to decrease of androgen by administering composition for androgen agonist; and a method of preparing composition for androgen agonist. The present composition obtained from natural material can be used as Phyto-androgen for the preventing and treating symptoms of male climacteric without dangerousness according to hormone replacement therapy. | 12-10-2009 |
Ki Chan Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20120170986 | DOUBLE-SIDED CUTTING INSERT - A double-sided cutting insert includes: rectangular shaped upper and lower surfaces formed at upper and lower sides of the insert; four side surfaces of each of the upper and lower surfaces; an assembling hole perpendicular to the upper surface; major cutting edges, at corners of one side surface, and rotationally symmetrical with respect to a center of an outer shape of the insert in a plan view where the upper surface is the front and rotationally symmetrical with respect to the center in a front view where the one of the side surfaces is the front; minor cutting edges, formed at one side of each major cutting edge, and rotationally symmetrical with respect to the center in the plan view; and minor side surfaces formed on a surface where the minor cutting edges meet the side surfaces and inclined toward the center with respect to an assembling hole central axis. | 07-05-2012 |
20130336735 | CUTTING INSERT - A cutting insert, and more particularly, an improved double-sided cutting insert is provided, which provides improved machinability obtained due to increased rake angle, without compromising coupling state. The double-sided cutting insert includes a top surface, a bottom surface, a plurality of lateral relief surfaces connecting the top and bottom surfaces, and a cutting edge formed by the top and bottom surfaces and the plurality of lateral relief surfaces, in which one or more lateral relief surfaces of the plurality of lateral relief surfaces are formed into three stages in sequence which are a first positive surface, a negative surface and a second positive surface in a direction from the top surface to the bottom surface. | 12-19-2013 |
Sang Hyuk Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20130277726 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a substrate including a plurality of active regions divided by a plurality of trenches, a plurality of tunnel insulating layer patterns formed over the active regions, a plurality of conductive film patterns formed over the tunnel insulating film patterns, a plurality of first isolation layers formed on sidewalls and bottom surfaces of the trenches, and a plurality of second isolation layers formed between the conductive film patterns. | 10-24-2013 |
20150348980 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a substrate including a plurality of active regions divided by a plurality of trenches, a plurality of tunnel insulating layer patterns formed over the active regions, a plurality of conductive film patterns formed over the tunnel insulating film patterns, a plurality of first isolation layers formed on sidewalls and bottom surfaces of the trenches, and a plurality of second isolation layers formed between the conductive film patterns. | 12-03-2015 |
Sangkwon Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20120040209 | SECONDARY BATTERY PACK OF NOVEL STRUCTURE - Disclosed herein is a secondary battery pack including a battery cell including first and second electrode terminals of specific structures, a protection circuit module (PCM) including connection members A and B connected to the first and second electrode terminals and an electrically insulated top cap, wherein a connection portion of the connection member B connected to the second electrode terminal of the battery cell is located at the bottom of the PCB so that the connection member B is electrically connected to the second electrode terminal via the safety element, the connection member A is coupled to the bottom of the PCB in a state in which the connection member A protrudes from one end of the PCB in the lateral direction so that a connection portion of the connection member A connected to the first electrode terminal of the battery cell is exposed through a corresponding one of the through holes formed at the top cap, a coupling hole is formed at the protruding portion of the connection member A, and wherein coupling members are coupled into the respective coupling grooves of the battery cell through the through holes of the top cap in a state in which the PCM and the top cap are disposed at the top of the battery cell, and the connection member A is mechanically coupled and electrically connected to the first electrode terminal by a corresponding one of the coupling members. | 02-16-2012 |
Sang-Woo Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20100019307 | METHOD OF FABRICATING FLASH MEMORY DEVICE - A method of fabricating a flash memory which increases a coupling ratio between a floating gate and a control gate in a cell. The method comprises sequentially forming a tunnel oxide film, and polysilicon and first insulation films for a floating gate on an active area of a semiconductor substrate; forming a photoresist as a mask on the first insulation film, and performing an etching process using the photoresist as the mask; forming a hard mask by depositing a second insulation film for prevention of oxidation on the semiconductor substrate; forming an STI by using the hard mask; oxidizing sidewalls of the STI and gap-filling the STI; forming a floating gate by removing the second insulation film remaining as the hard mask; and sequentially forming an ONO film and a control gate on the floating gate. | 01-28-2010 |
Seok Ho Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20160123703 | APPARATUS AND METHOD OF GENERATING MOMENTUM USING SUPERCONDUCTING COILS - The present invention relates to an apparatus of generating momentum which drives an object. The present invention provides a momentum generating apparatus in which a pair of high temperature superconducting coils which are wound in different directions and have different superconducting properties are arranged in parallel and the same current flows in the pair of coils to be in a stable state where magnetic fields generated in the coils are cancelled and an asymmetric current is suddenly applied to the pair of coils through a switching operation to generate a magnetic field and an eddy current is induced in a plate due to the generated magnetic field and the plate is floated using a repulsive force between the magnetic field generated in the plate due to the eddy current and the magnetic field generated in the pair of coils, to instantaneously generate force using a small amount of superconducting coils. | 05-05-2016 |
Seung-Baik Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20090049786 | FLOORING HAVING TRANSFER-PRINTED HDF AND PROCESS FOR MANUFACTURING THE SAME - Disclosed herein is a low-priced flooring comprising a transfer-printed high-density fiberboard (HDF). According to the flooring, an aqueous primer layer is formed on a high-density fiberboard as a core layer and transfer printing is performed on the surface of the primer layer to form a printed layer so that the background fiber pattern of the high-density fiberboard is covered, the adhesion of the core layer to the printed layer is enhanced, and the natural beauty of wood is faithfully imparted to the surface of the flooring. | 02-26-2009 |
20090197036 | Wood Flooring With Laminated Wood And HDF Using Symmetric Structure And Process For Manufacturing The Same - Disclosed is a wood flooring containing laminated wood and high-density fiberboard using a symmetric structure and a process for manufacturing the same. The wood flooring includes a high-density fiberboard core layer and an upper laminated wood layer and lower laminated wood or veneer layer symmetrically stacked about the high-density fiberboard core layer to achieve a stable structure, and the lower laminated wood or veneer layer has a density of 100±30% of that of the upper laminated wood layer to keep the balance therebetween. With this configuration it is possible to completely eliminate deformation problems caused by variation of environmental conditions such as temperature, humidity, etc., and to impart the natural texture of raw lumber and high durability to the flooring surface. | 08-06-2009 |
Youn-Woo Nam, Chungcheongbuk-Do KR
Patent application number | Description | Published |
---|---|---|
20110236617 | BIODEGRADABLE MATERIAL FOR ADVERTISEMENT AND METHOD FOR MANUFACTURING THE SAME - Disclosed are a material for advertisement and a method for manufacturing the same. The material for advertisement includes a surface film layer, a pressure-sensitive adhesive layer and a release layer stacked in sequence, in which the surface film layer is composed of a biodegradable film layer containing 5 to 40 wt % of a biodegradable polymer and 95 to 60 wt % of an aliphatic polyester. The material including the biodegradable film layer can be used for print advertisement to be discarded after being used for a short period of time, and has biodegradability of 60% or more as compared with cellulose within six months when discarded, so that a toxic environmental hormone due to polyvinylchloride (PVC) is not emitted, and the environment is protected, thereby being very friendly toward humans and the earth. | 09-29-2011 |