Patent application number | Description | Published |
20140306187 | ADHESIVE HAVING ADHESIVE CAPSULE AND ORGANIC LIGHT EMITTING DISPLAY DEVICE COMPRISING ADHESIVE LAYER FORMED BY THE ADHESIVE - An adhesive includes a polymer matrix, and a plurality of adhesive capsules in the polymer matrix, wherein each of the adhesive capsules includes a shell, configured to shatter under pressure, and an adhesive polymer in the shell. | 10-16-2014 |
20150050421 | METHOD OF DEPOSITING AN ATOMIC LAYER AND ATOMIC LAYER DEPOSITION APPARATUS - A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer. | 02-19-2015 |
20150110974 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus including: a chamber configured to provide a space for processing a substrate; a substrate stage configured to support the substrate within the chamber and including a first electrode, the first electrode configured to receive a first radio frequency signal; a second electrode disposed on an upper portion of the chamber to face the first electrode, the second electrode configured to receive a second radio frequency signal; a gas supply unit configured to supply a process gas onto the substrate within the chamber; and a thermal control unit configured to circulate a heat transfer medium through a first fluid passage provided in the first electrode and a second fluid passage provided in the second electrode to maintain the first and second electrodes at the same temperature. | 04-23-2015 |
20150184289 | DEPOSITION APPARATUS AND DEPOSITION METHOD - An apparatus may be used for forming a material layer on a substrate. The apparatus may include a reactor that includes a supply unit set configured to supply a material to the substrate. The apparatus may further include a control mechanism configured to control whether the material is provided to the supply unit set according to a position of the substrate with respect to the reactor. | 07-02-2015 |
20150190832 | THIN FILM FORMING APPARATUS AND METHOD - A thin film forming apparatus comprises a first storage unit, a first nozzle unit, a first light-irradiating unit, a second storage unit, a second nozzle unit, and a second light-irradiating unit. The first storage unit is configured to store a first organic material. The first nozzle unit is connected to the first storage unit and is configured to spray the first organic material stored in the first storage unit. The first light-irradiating unit is disposed adjacent to the first nozzle unit and is configured to irradiate light having a wavelength that cures the first organic material. The second storage unit is configured to store a second organic material. The second nozzle unit is disposed adjacent to the first nozzle unit, is connected to the second storage unit, and is configured to spray the second organic material stored in the second storage unit. The second light-irradiating unit is disposed adjacent to the second nozzle unit and is configured to irradiate light having a wavelength that cures the second organic material. | 07-09-2015 |
20150259798 | ATOMIC LAYER DEPOSITION APPARATUS - An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion. | 09-17-2015 |
20150275362 | ATOMIC LAYER DEPOSITION APPARATUS AND METHOD OF ATOMIC LAYER DEPOSITION USING THE SAME - An atomic layer deposition apparatus includes: a substrate support supporting a substrate; a first divider including a plurality of first division modules provided on the substrate support and selectively spraying a source gas, a reaction gas, and a purge gas to each of predetermined areas; and a second divider including a plurality of second division modules provided on the first divider and supplying the gases to the respective first division modules, wherein each of the plurality of second division modules is formed of a first through-hole and a second through-hole, and the gas passed through the first and second through-holes moves to the first division modules. | 10-01-2015 |
20160138157 | THIN FILM DEPOSITION APPARATUS - A thin film deposition apparatus, including a plurality of linear nozzle parts separated from each other; and an exhaust plate to which is attached the plurality of linear nozzle parts, each linear nozzle part including a linear body member; a pair of first reaction gas pipes in the linear body member and inflowing a first reaction gas; a second reaction gas pipe between the pair of first reaction gas pipes and inflowing a second reaction gas; and a pair of control gas pipes between each of the first reaction gas pipes and the second reaction gas pipe and inflowing a control gas controlling a flow of the second reaction gas. | 05-19-2016 |