Patent application number | Description | Published |
20140309782 | OPERATORLESS PARTICLE PROCESSING SYSTEMS AND METHODS - The present disclosure provides improved particle processing (e.g., cytometry and/or cell purification) systems and methods that can operate in an autonomous fashion. More particularly, the present disclosure provides for assemblies, systems and methods for analyzing, sorting, and/or processing (e.g., purifying, measuring, isolating, detecting and/or enriching) particles (e.g., cells, microscopic particles, etc.) where human intervention is not required and/or is minimized. The systems, assemblies and methods of the present disclosure advantageously improve run performance of particle processing systems (e.g., cell purification systems, cytometers) by significantly reducing and/or substantially eliminating the burden of operation for human intervention by automating numerous functions, features and/or steps of the disclosed systems and methods. | 10-16-2014 |
20140318645 | HYDRODYNAMIC FOCUSING APPARATUS AND METHODS - A microfluidic chip having a micro channel for processing a sample is provided. The micro channel may focus the sample by using focusing fluid and a core stream forming geometry. The core stream forming geometry may include a lateral fluid focusing component and one or more vertical fluid focusing components. A microfluidic chip may include a plurality micro channels operating in parallel on a microfluidic chip. | 10-30-2014 |
20140370536 | ASSEMBLIES AND METHODS FOR REDUCING OPTICAL CROSSTALK IN PARTICLE PROCESSING SYSTEMS - The present disclosure relates to optical crosstalk reduction in particle processing (e.g., cytometry including flow cytometry using microfluidic based sorters, drop formation based sorters, and/or cell purification) systems and methods in order to improve performance. More particularly, the present disclosure relates to assemblies, systems and methods for minimizing optical crosstalk during the analyzing, sorting, and/or processing (e.g., purifying, measuring, isolating, detecting, monitoring and/or enriching) of particles (e.g., cells, microscopic particles, etc.). The exemplary systems and methods for crosstalk reduction in particle processing systems (e.g., cell purification systems) may be particularly useful in the area of cellular medicine or the like. The systems and methods may be modular and used singly or in combination to optimize cell purification based on the crosstalk environment and specific requirements of the operator and/or system. | 12-18-2014 |
20150276576 | MULTIPLE FLOW CHANNEL PARTICLE ANALYSIS SYSTEM - A microfluidic multiple channel particle analysis system which allows particles from a plurality of particle sources to be independently simultaneously entrained in a corresponding plurality of fluid streams for analysis and sorting into particle subpopulations based upon one or more particle characteristics. | 10-01-2015 |
20150330385 | FLUID HANDLING SYSTEM FOR A PARTICLE PROCESSING APPARATUS - A fluid handling system for a particle processing instrument includes a pump, a pulse attenuator, a pressure transducer, and a pump controller. The pump may be configured to supply a pulsed flow of fluid having a first pulse characteristic to the pulse attenuator. The pulse attenuator may have a single, undivided, volume, fluid inlets, fluid outlets, and a pressure sensor port. The pulse attenuator may supply an outlet flow of fluid having a second pulse characteristic different from the first pulse characteristic. The pressure transducer may be in fluid communication with the pressure sensor port and in control communication with the pump controller. The pump controller may be in control communication with the pump to maintain a substantially constant nominal pressure within the pulse attenuator by controlling the pump motor. | 11-19-2015 |
20150331429 | FLUID HANDLING SYSTEM FOR A FLUID FLOW INSTRUMENT - A fluid handling system for supplying a working fluid to a fluid flow instrument is disclosed. The system includes a controller configured to receive sensor signals indicative of a deformation of a flexible barrier located between a control fluid volume containing a control fluid and a working fluid volume containing the working fluid. Based on the sensor signals, the controller may send signals to control the operation of a working fluid flow generator in order to regulate or control the fluid characteristic of the working fluid being provided to the fluid flow instrument. | 11-19-2015 |
Patent application number | Description | Published |
20080248647 | Method of depositing materials on a non-planar surface - A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like. | 10-09-2008 |
20080276451 | Method of and apparatus for inline deposition of materials on a non-planar surface - In manufacturing a semiconductor device, a first chamber is provided. An opening couples the first chamber to a first environment through which at least one substrate can pass. A first seal environmentally isolates the first chamber from the first environment. A process chamber is coupled to the first chamber. Another seal environmental isolates the first and the process chambers. The substrate is placed within the first chamber, and the first chamber and the outside environment are isolated. The second opening is opened, and the substrate moves into the semiconductor process chamber. The first chamber is again environmentally isolated from the second volume. A semiconductor processing step is performed on the substrate within the processing chamber. While the substrate is processed, the substrate is rotated and translated through the processing chamber. | 11-13-2008 |
Patent application number | Description | Published |
20090255471 | METHOD OF DEPOSITING MATERIALS ON A NON-PLANAR SURFACE - A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like. | 10-15-2009 |
20110045674 | METHOD AND APPARATUS FOR INLINE DEPOSITION OF MATERIALS ON A NON-PLANAR SURFACE - In manufacturing a semiconductor device, a first chamber is provided. An opening couples the first chamber to a first environment through which at least one substrate can pass. A first seal environmentally isolates the first chamber from the first environment. A process chamber is coupled to the first chamber. Another seal environmental isolates the first and the process chambers. The substrate is placed within the first chamber, and the first chamber and the outside environment are isolated. The second opening is opened, and the substrate moves into the semiconductor process chamber. The first chamber is again environmentally isolated from the second volume. A semiconductor processing step is performed on the substrate within the processing chamber. While the substrate is processed, the substrate is rotated and translated through the processing chamber. | 02-24-2011 |