Mohara
Goro Mohara, Matsudo-Shi JP
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20100284881 | DEPHOSPHORIZATION MATERIAL, DEPHOSPHORIZATION APPARATUS, AND DEPHOSPHORIZATION BY-PRODUCT - A dephosphorization material is formed from concrete sludge resulting from centrifugal casting of concrete products, production of concrete, cleaning of concrete production equipment, or cleaning of concrete transporting vehicles. The dephosphorization material is used for dephosphorization treatment by a dephosphorization apparatus that includes a single reaction tank provided with a wastewater supply means, a dephosphorization material supply mean, and a recovery means. The dephosphorization apparatus removes phosphorus from phosphorus-containing wastewater, such as sewage water, based on the formula 10Ca | 11-11-2010 |
Kensuke Mohara, Settsu-Shi JP
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20100185007 | PROCESS FOR PREPARING FLUOROAMIDE AND FLUORONITRILE - There are provided simple processes for preparing a fluoroamide and a fluoronitrile which assure higher yield, i.e., a process for preparing a fluoroamide represented by the formula (2): CF | 07-22-2010 |
20120325419 | WATER AND OIL RESISTANT AGENT FOR PAPER AND PAPER TREATMENT PROCESS - Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby. | 12-27-2012 |
20150080510 | AQUEOUS EMULSION COMPOSITION - Provided is an aqueous emulsion composition which has excellent chemical stability (stability with respect to impurities) and excellent mechanical stability. Disclosed is an aqueous emulsion composition which contains: (A) a polymer that contains a fluoroalkyl group; and (B) a surfactant that contains (B1) an amidoamine surfactant having an amide group and an amino group, and (B2) a nonionic surfactant. It is preferable that the surfactant does not contain a monool having an unsaturated triple bond or an alkylene oxide addition product of a polyol. | 03-19-2015 |
Komei Mohara, Minamikoma-Gun JP
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20110316215 | Post-processing apparatus and image formation system provided with the apparatus - To provide a post-processing apparatus for enabling a bunch of sheets and a single sheet to be folded in simplified structure, and further enabling the folded sheet and sheets that are not folded to be mixed and bound, the post-processing apparatus has a processing tray to collate and collect sheets to perform binding processing, and a folding processing path having a folding processing section, and a folded sheet carrying-out path for carrying out a folded sheet is provided on the downstream side of the folding processing path. Then, the folded sheet carrying-out path is comprised of a circulating path for guiding the folded sheet again to the folding processing section, a post-processing path for guiding the folded sheet to the processing tray to perform post-processing, and a sheet discharge path for guiding the folded sheet to a storage stacker. | 12-29-2011 |
Yukihisa Mohara, Kamisato JP
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20080204724 | Method Of Apparatus For Detecting Particles On A Specimen - A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors. | 08-28-2008 |
20110032515 | METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN - A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors. | 02-10-2011 |
20110228258 | METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN - A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors. | 09-22-2011 |
Yukihisa Mohara, Hitachinaka JP
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20080239319 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge. | 10-02-2008 |
20100208251 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage,a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge. | 08-19-2010 |
20110285989 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge. | 11-24-2011 |
20120224173 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge. | 09-06-2012 |
20130194579 | INSPECTION APPARATUS - In a conventional art, vibrations of compositions (for example, a Z-stage, a θ-stage, a wafer chuck, and a detection optical system mounted above a stage linear scale) within a device are not precisely fed back to a coordinate value. | 08-01-2013 |
Yukihisa Mohara, Tokyo JP
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20140192352 | OPTICAL TYPE INSPECTION APPARATUS, INSPECTION SYSTEM AND THE WAFER FOR COORDINATES MANAGEMENT - This optical inspection device has: a line sensor on which channels are arranged; a moving means for moving a wafer mounted on a stage relative to the line sensor; a stage position detection means for detecting the on-stage positions of pseudo-defects in images formed on the channels as pseudo-defect stage coordinates, said coordinate management wafer being a wafer on which one pseudo-defect die is formed per row and column of a matrix of dies and each pseudo-defect die has a plurality of pseudo-defects formed in a line in the columnar direction; a coordinate transformation means for transforming the pseudo-defect stage coordinates into pseudo-defect die coordinates; a difference computation means for computing the differences of the pseudo-defect die coordinates from design coordinates; and a characteristic pattern acquisition means for obtaining a coordinate error characteristic pattern in which the differences from the pseudo-defect stage coordinates increase or decrease along a straight line. | 07-10-2014 |