Mizutani, Yokohama
Hiroki Mizutani, Yokohama JP
Patent application number | Description | Published |
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20100190910 | RESIN COMPOSITIONS FOR WRINKLE-PATTERN PAINT PURPOSES - Disclosed is a resin composition which can be used for wrinkle pattern paints having excellent aging stability and staining resistance. The resin composition contains (A) a hydroxyl group containing polyester resin having a hydroxyl group value from 5 to 200 mgKOH/g, (B) hexakis-alkoxymethylated melamine resin, (C) de-watering agent, (D) blocked sulfonic acid compound which has been blocked with a tertiary amine compound of boiling point from 50 to 300° C. where the mol ratio with respect to the sulfonic acid is from 0.2 to 0.9, (E) silicate compound and (F) at least one material selected from among (a) organic resin particles of average particle diameter not more than 40 μm, (b) inorganic glass particles of average particle diameter not more than 100 μm and (c) inorganic fibers of average length not more than 300 μm. | 07-29-2010 |
20110015318 | RESIN COMPOSITIONS FOR WRINKLE PATTERN PAINTS - Disclosed is a resin composition comprising (A) hydroxyl group containing acrylic resin having a hydroxyl group value of from 5 to 200 mgKOH/g and a number average molecular weight of from 500 to 20,000, (B) hexakisalkoxymethylated melamine resin, (C) de-watering agent, (D) blocked sulfonic acid compound which has been blocked with a tertiary amine compound of boiling point from 50 to 300° C. in which the mol ratio with respect to the sulfonic acid is from 0.2 to 0.9, (E) silicate compound and (F) at least one type of material selected from among (a) organic resin particle of average particle diameter not more than 40 μm, (b) inorganic glass particles of average particle diameter not more than 100 μm and (c) inorganic fibers of average length not more than 300 μm. | 01-20-2011 |
20150307737 | Paint Composition Which Has Excellent Staining Resistance And Paint Films Obtained By Coating Same - Described is a paint composition comprising: a hydroxyl group-containing resin (A); a crosslinking agent (B), which reacts with hydroxyl groups; a radical copolymer (C); and an organosilica sol (D); wherein the radical copolymer (C): (a) has a monomer composition, with respect to the total mass of radically polymerizable monomer, of from 70.0 to 99.8 mass % unsaturated carboxylic acid amide, from 0.2 to 10 mass % radically polymerizable organosiloxane and from 0 to 29.8 mass % other radically polymerizable monomer, (b) is of weight average molecular weight from 1,500 to 15,000, and (c) has a hydroxyl group value of from 10 to 50 mgKOH/g, wherein the organosilica sol (D) is of average particle diameter from 1 to 30 nm, and wherein the solid fraction mass ratio represented by {(C) component+(D) component}/{(A) component+(B) component} is from 3 to 30% and the solid fraction mass ratio represented by {(C) component/(D) component} is from 0.2 to 5.0. | 10-29-2015 |
Hiroyuki Mizutani, Yokohama JP
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20150363367 | DISPLAY PROCESSING DEVICE, DISPLAY PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCT - According to an embodiment, a display processing device includes a reader and a display controller. The reader is configured to read content data that is to be displayed on a display. The display controller is configured to display, on the display, virtual content data in which one end of a display target area of the content data and the other end opposite to the one end of the display target area are connected, when a width of the display target area is larger than a width of the display. | 12-17-2015 |
20160092729 | INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCT - According to an embodiment, an information processing device includes a storage unit, a reception unit, a recognition unit, and a specification unit. The storage unit stores therein accumulated information containing entry information of multiple types of forms accumulated by form type and entry field. The reception unit receives a form. The recognition unit recognizes the entry information contained in the form received by the reception unit. The specification unit compares the accumulated information and the entry information recognized by the recognition unit to specify the type of the form received by the reception unit. | 03-31-2016 |
Kazuhiro Mizutani, Yokohama JP
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20130299892 | SEMICONDUCTOR DEVICE WITH STI AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE - A semiconductor device includes: a semiconductor substrate having first and second areas; an STI isolation region being made of an isolation trench formed in the semiconductor substrate and an insulating film burying the isolation trench and defining a plurality of active regions in the first and second areas; a first structure formed on an area from the active region in the first area to a nearby STI isolation region and having a first height; and a second structure formed on an area from the active region in the second area to a nearby STI isolation region and having a second height, wherein the surface of the said STI isolation region in the first area is lower than the surface of said STI isolation region in the second area. | 11-14-2013 |
20130302967 | SEMICONDUCTOR DEVICE WITH STI AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE - A semiconductor device includes: a semiconductor substrate having first and second areas; an STI isolation region being made of an isolation trench formed in the semiconductor substrate and an insulating film burying the isolation trench and defining a plurality of active regions in the first and second areas; a first structure formed on an area from the active region in the first area to a nearby STI isolation region and having a first height; and a second structure formed on an area from the active region in the second area to a nearby STI isolation region and having a second height, wherein the surface of the said STI isolation region in the first area is lower than the surface of said STI isolation region in the second area. | 11-14-2013 |
Kouji Mizutani, Yokohama JP
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20130176063 | SEMICONDUCTOR APPARATUS - A semiconductor apparatus includes a first chip including a first port configured to receive an operation clock signal, a first circuit configured to operate in synchronization with the operation clock signal, and a second chip mounted on the first chip. The second chip includes a delay control part configured to generate a delay control signal indicating a delay amount based on a cycle of a reference clock signal, plural delay circuits connected in multiple stages and configured to delay clock signals input to the plural delay control circuits based on the delay control signal and sequentially output the delayed clock signals to a subsequent stage, and a second port connected to the first port and configured to receive the operation clock signal based on the delayed clock signals output from the plural delay circuits. | 07-11-2013 |