Patent application number | Description | Published |
20080236875 | WIRING STRUCTURE AND METHOD OF FORMING THE SAME - A CNT bundle is formed by growing a plurality of CNTs from opposing surfaces of contact blocks toward mutual opposing surfaces, and by contacting the CNTs so that they intersect to electrically connect with each other. Subsequently, a gap of the electrically connected CNT bundle is filled with a metal material, to thereby form a wiring being a composite state of the CNT bundle and the metal material. | 10-02-2008 |
20080237858 | ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME - An electronic device includes a conductive pattern formed on a first insulating film, a second insulating film formed on the conductive pattern and the first insulating film, a hole formed in the second insulating film on the conductive pattern, carbon nanotubes formed in the hole to extend from a surface of the conductive pattern, and a buried film buried in clearances among the carbon nanotubes in the hole. | 10-02-2008 |
20080296551 | RESISTANCE MEMORY ELEMENT AND METHOD OF MANUFACTURING THE SAME - A resistance memory element having a pair of electrodes and an insulating film sandwiched between a pair of electrodes includes a plurality of cylindrical electrodes of a cylindrical structure of carbon formed in a region of at least one of the pair of electrodes, which is in contact with the insulating film. Thus, the position of the filament-shaped current path which contributes to the resistance states of the resistance memory element can be controlled by the positions and the density of the cylindrical electrodes. | 12-04-2008 |
20090035209 | METHOD OF MANUFACTURING CARBON NANOTUBE - According to a method of manufacturing carbon nanotubes, minute concavities and convexities are formed at a surface of a substrate, a catalyst metal layer having a predetermined film thickness is formed on the surface having the concavities and convexities, the substrate is subject to a heat treatment at a predetermined temperature to change the catalyst metal layer into a plurality of isolated fine particles. The catalyst metal fine particles have a uniform particle diameter and uniform distribution. Then, the substrate supporting the plurality of fine particles is placed in a carbon-containing gas atmosphere to grow carbon nanotubes on the catalyst metal fine particles by a CVD method using the carbon-containing gas. The carbon nanotubes can be formed to have a desired diameter and a desired shell number with superior reproducibility. | 02-05-2009 |
20090269921 | Method for growing carbon nanotubes, and electronic device having structure of ohmic connection to carbon element cylindrical structure body and production method thereof - An electronic device having a structure of an ohmic connection to a carbon element cylindrical structure body, wherein a metal material is positioned inside the junction part of a carbon element cylindrical structure body joined to a connection objective and the carbon element cylindrical structure body and the connection objective are connected by an ohmic contact. Methods for producing such an electronic device are also disclosed. Further, a method for growing a carbon nanotube is disclosed. | 10-29-2009 |
20090291216 | Carbon nanotube device and manufacturing method of the same - After forming an opening, a resist film is formed on the entire surface and a resist pattern is formed by patterning the resist film. The shape of the resist pattern is such that it covers one side of the bottom of the opening. As a result, a Si substrate is exposed only in one part of the opening. Then, using the resist pattern as a mask, a catalytic layer is formed on the bottom of the opening. Then, the resist pattern is removed. Carbon nanotubes are grown on the catalytic layer. At this time, since the catalytic layer is formed on only one side of the bottom of the opening, the Van der Waals force biased towards that side works horizontally on the growing carbon nanotubes. Therefore, the carbon nanotubes are attracted towards the nearest side of the SiO | 11-26-2009 |
20100151662 | FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD - The present invention is an object to provide a high-performance vertical field effect transistor having a microminiaturized structure in which the distance between the gate and the channel is made short not through a microfabrication process, having a large gate capacitance, and so elaborated that the gate can control the channel current with a low voltage, and a method for simply and efficiently manufacturing such a field effect transistor not through a complex process such as a microfabrication process. The field effect transistor of the present invention comprises a first electrode, a second electrode so arranged as to be electrically insulated from the first electrode, a semiconductive rod-shaped body extending through at least one of the first and second electrodes, provided along the inner wall of a hole in which the first and second electrodes are exposed, and interconnecting the first and second electrodes, and a third electrode at least partially inserted in the hole and opposed to the semiconductive rod-shaped body with an insulating layer interposed between the third electrode and the semiconductive rod-shaped body. The aspect preferably include an aspect in which the thickness of the insulating layer is 50 nm or less and an aspect in which the semiconductive rod-shaped body is a single-wall carbon nanotube. | 06-17-2010 |
20110073833 | RESISTANCE MEMORY ELEMENT AND METHOD OF MANUFACTURING THE SAME - A resistance memory element having a pair of electrodes and an insulating film sandwiched between a pair of electrodes includes a plurality of cylindrical electrodes of a cylindrical structure of carbon formed in a region of at least one of the pair of electrodes, which is in contact with the insulating film. Thus, the position of the filament-shaped current path which contributes to the resistance states of the resistance memory element can be controlled by the positions and the density of the cylindrical electrodes. | 03-31-2011 |