Patent application number | Description | Published |
20080239904 | METHOD AND APPARATUS FOR INSPECTING A SURFACE OF A SPECIMEN - Inspection with respect to a defect on a surface of a substrate with an inherent or partial wave-like distortion is performed with high accuracy in consideration with the fluctuation caused by the wave-like distortion detected by the defect in excess of the signal level. The substrate is diagonally illuminated while being rotated and moved toward one axial direction to detect the specular reflected light and the scattered light. Based on the detected signal waveform, the state with respect to the inherent or partial wave-like distortion is determined. When the wave-like distortion exists in the substrate, the waveform is divided, and the threshold value is set for the divided regions. The signal higher than the threshold value will be output or displayed as the defect. | 10-02-2008 |
20090066943 | Apparatus And Method For Inspecting Pattern - A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside. | 03-12-2009 |
20090073443 | Method And Equipment For Detecting Pattern Defect - An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern. | 03-19-2009 |
20090153840 | Method And Apparatus For Inspecting Pattern Defects - An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor. | 06-18-2009 |
20090190123 | METHOD AND APPARATUS FOR DETECTING DEFECTS ON A DISK SURFACE - The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects. | 07-30-2009 |
20090237669 | SURFACE DEFECT INSPECTING APPARATUS WITH DEFECT DETECTION OPTICAL SYSTEM AND DEFECT-DETECTED IMAGE PROCESSING - There is provided a defect inspecting apparatus, which includes an irradiating optical system of irradiating a light beam on a surface of a face plate of a disk mounted on a stage to scan the surface of the face plate, a light-receiving optical system of receiving specular reflection light that has transmitted a shading filter with a shading difference that changes an amount of the specular reflection light from the face plate resulting from the light beam irradiated on the disk, and a processing unit of identifying defects on the surface of the face plate from the change in amount of the specular reflection light that has transmitted a filter, so that a size and a height of the defect can be measured with high accuracy when irregular defects are determined, which is not easily achieved by a conventional lens effect. | 09-24-2009 |
20100085855 | METHOD AND DEVICE FOR DETECTING SHAPE OF SURFACE OF MEDIUM - A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process. | 04-08-2010 |
20100098320 | METHOD AND DEVICE FOR INSPECTING PATTERNED MEDIUM - An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium. | 04-22-2010 |
20100104173 | Method And Apparatus For Inspecting A Pattern Formed On A Substrate - A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected. | 04-29-2010 |
20100182589 | SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME - In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object. | 07-22-2010 |
20100201975 | DISK SURFACE INSPECTION APPARATUS, INSPECTION SYSTEM THEREOF, AND INSPECTION METHOD THEREOF - The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base. | 08-12-2010 |
20100205699 | MAGNETIC DEVICE INSPECTION APPARATUS AND MAGNETIC DEVICE INSPECTION METHOD - Applying an alternating current to a magnetic head as a sample generates an alternate-current magnetic field from the sample. A cantilever includes a probe that is made of a magnetic material or is coated with a magnetic material. The cantilever is displaced when it approaches the sample. Detecting the displacement of the cantilever detects distribution of the magnetic field from the sample. It is possible to fast measure distribution of the magnetic field generated from the sample when a frequency of the alternating current applied to the sample differs from a resonance frequency of the cantilever. | 08-12-2010 |
20110001972 | Method And Equipment For Detecting Pattern Defect - An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern. | 01-06-2011 |
20110057649 | METHOD AND ITS APPARATUS FOR DETECTING DEFECTS - In the present invention, to make corrective matching thereof, it is designed as follows; position effect of defects coordinates, which are output from an inspection apparatus, is allowed, coordinates of inspected data are mutually corrected, and a state of coincidence or non-coincidence among a plurality sets of inspected data is output or displayed. Inspection data is designed to include kinds, kinds difference and dimension of defects. A state of coincidence or non-coincidence between inspected data is designed to be output or displayed appropriately, by kinds or dimensions, or by a grouping thereof, of a defects object. The same sample is inspected by every time of passing a production step, and a state of data increase or decrease, or coincidence or non-coincidence between the inspected data is designed to be output or displayed. | 03-10-2011 |
20110170092 | APPARATUS AND METHOD FOR INSPECTING PATTERN - A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside. | 07-14-2011 |
20120013890 | PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME - There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head | 01-19-2012 |
20120019813 | WAVEFRONT ABERRATION MEASURING METHOD AND DEVICE THEREFOR - Measurement cannot be made when trying to measure a wavefront aberration of a wide-angle lens, being wide in a field of view, comparing to a focus distance, by a Shack-Hartmann sensor, since an inclination of the wavefront exceeds an allowable value of inclination of the Shack-Hartmann sensor. | 01-26-2012 |
20120176602 | APPARATUS AND METHOD FOR INSPECTING PATTERN - A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside. | 07-12-2012 |