Patent application number | Description | Published |
20080315120 | Focusing and positioning device for a particle-optical raster microscope - The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical scanning microscope. The focusing and positioning ancillary device includes an illuminating device, a camera, a display and a control unit. The illuminating device produces a collimated or focused light beam at an angle to the particle-optical beam axis which intersects the particle-optical beam axis at a predetermined position. The camera is sensitive to the wavelength of the light beam and records an image of the object, which is positioned on the object table, at a second angle to the particle-optical beam axis. The control unit produces an image captured by the camera on the display together with a marking which indicates the position of the particle-optical beam axis in the image. | 12-25-2008 |
20100102223 | Method and device for examining a surface of an object - A method for treating a surface of an object and a device suitable in particular for performing this method provide for examining the surface of the object with the aid of a particle beam to counteract the charge buildup on the object. A gas is supplied to convey the charge away from the surface and/or to neutralize it. | 04-29-2010 |
20100200750 | Particle beam system - A particle beam system comprises a particle beam source | 08-12-2010 |
20110031215 | Particle beam systems and methods - An inspection method comprises
| 02-10-2011 |
20110049361 | Particle beam apparatus having an aperture unit and method for setting a beam current in a particle beam apparatus - A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided. | 03-03-2011 |
20120025077 | Particle Beam System - A particle beam system comprises a particle beam source | 02-02-2012 |
20120025078 | Particle Beam System - A particle beam system comprises a particle beam source | 02-02-2012 |
20120112089 | Aperture unit for a particle beam device - An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening. | 05-10-2012 |
20140070097 | PARTICLE BEAM DEVICE AND METHOD FOR OPERATING A PARTICLE BEAM DEVICE - A particle beam device, in particular an electron beam device, is provided having a beam generator for generating a primary particle beam, an objective lens for focusing the primary particle beam onto an object, and a detector for detecting particles emitted by the object. The objective lens has at least one magnetic unit, with the magnetic unit generating at least one first crossover and at least one second crossover. The first crossover is arranged in the objective lens or in a region between the objective lens and the object. The second crossover is arranged at the object. The device permits the examination of the object using particles which have a low energy, with good imaging properties. A method for operating the particle beam device is also provided. | 03-13-2014 |