Patent application number | Description | Published |
20090154214 | SEMICONDUCTOR MEMORY - Borderless contacts for word lines or via contacts for bit lines are formed using interconnect patterns, a part of which is removed. A semiconductor memory includes: a plurality of active regions AA | 06-18-2009 |
20100155814 | EEPROM ARRAY WITH WELL CONTACTS - A semiconductor integrated circuit device includes a cell well, a memory cell array formed on the cell well and having a memory cell area and cell well contact area, first wiring bodies arranged in the memory cell area, and second wiring bodies arranged in the cell well contact area. The layout pattern of the second wiring bodies is the same as the layout pattern of the first wiring bodies. The cell well contact area comprises cell well contacts that have the same dopant type as the cell well and that function as source/drain regions of dummy transistors formed in the cell well contact area. | 06-24-2010 |
20100173471 | NONVOLATILE SEMICONDUCTOR MEMORY AND FABRICATION METHOD FOR THE SAME - A nonvolatile semiconductor memory includes a memory cell transistor including a first floating gate electrode layer formed on a first tunneling insulating film, a first inter-gate insulating film, a first and a second control gate electrode layer, and a first metallic silicide film; a high voltage transistor including a high voltage gate electrode layer formed on the high voltage gate insulating film, a second inter-gate insulating film having an aperture, a third and a fourth control gate electrode layer, and a second metallic silicide film; a low voltage transistor including a second floating gate electrode layer formed on the second tunneling insulating film, a third inter-gate insulating film having an aperture, a fifth and a sixth control gate electrode layer, and a third metallic silicide film; and a liner insulating film directly disposed on a first source and drain region of the memory cell transistor, a second source and drain region of the low voltage transistor, and a third source and drain region of the high voltage transistor. | 07-08-2010 |
20100309708 | SEMICONDUCTOR MEMORY - Borderless contacts for word lines or via contacts for bit lines are formed using interconnect patterns, a part of which is removed. A semiconductor memory includes: a plurality of active regions AA | 12-09-2010 |
20120119304 | SEMICONDUCTOR MEMORY - A semiconductor memory includes: a plurality of active regions AA | 05-17-2012 |
20120235218 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a device includes a semiconductor substrate, a first region including a first well which is formed in substrate, a second well which is formed in substrate and on first well, and a memory cell which is formed on second well, and a second region including a third well which is formed in substrate, and a first transistor which is formed on third well. The device includes a third region including a second transistor which is formed on semiconductor substrate, and a fourth region including a fourth well which is formed in semiconductor substrate, a fifth well which is formed in substrate and on fourth well, and a third transistor which is formed on fifth well. Bottoms of first well and fourth well are lower than a bottom of third well, and bottom of third well is lower than bottoms of second well and fifth well. | 09-20-2012 |
20140056048 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - This nonvolatile semiconductor memory device comprises a memory cell array configured having a plurality of memory mats arranged therein, each of the memory mats having a memory cell disposed therein at an intersection of a first line and a second line, the memory cell including a first variable resistance element. A third line extends through a plurality of the memory mats. A second variable resistance element is connected between the third line and the second line of each of the plurality of memory mats. | 02-27-2014 |
20150092468 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - This nonvolatile semiconductor memory device comprises a memory cell array configured having a plurality of memory mats arranged therein, each of the memory mats having a memory cell disposed therein at an intersection of a first line and a second line, the memory cell including a first variable resistance element. A third line extends through a plurality of the memory mats. A second variable resistance element is connected between the third line and the second line of each of the plurality of memory mats. | 04-02-2015 |