Patent application number | Description | Published |
20090290429 | ENHANCED BIT-LINE PRE-CHARGE SCHEME FOR INCREASING CHANNEL BOOSTING IN NON-VOLATILE STORAGE - Channel boosting is improved in non-volatile storage to reduce program disturb. A pre-charge module voltage source is used to pre-charge bit lines during a programming operation. The pre-charge module voltage source is coupled to a substrate channel via the bit lines to boost the channel. An additional source of boosting is provided by electromagnetically coupling a voltage from a conductive element to the bit lines and the channel. To achieve this, the bit lines and the channel are allowed to float together by disconnecting the bit lines from the voltage sources. The conductive element can be a source line, power supply line or substrate body, for instance, which receives an increasing voltage during the pre-charging and is proximate to the bit lines. | 11-26-2009 |
20100070681 | METHOD FOR SCRAMBLING DATA IN WHICH SCRAMBLING DATA AND SCRAMBLED DATA ARE STORED IN CORRESPONDING NON-VOLATILE MEMORY LOCATIONS - A method in which data is randomized before being stored in a non-volatile memory to minimize data pattern-related read failures. Predetermined randomized non-user data is stored in a block or other location of a memory array, and accessed as needed by a memory device controller to randomize user data before it is stored in other blocks of the array. Each portion of the user data which is stored in a block is randomized using a portion of the non-user data which is stored in the same relative location in another block. | 03-18-2010 |
20100070682 | BUILT IN ON-CHIP DATA SCRAMBLER FOR NON-VOLATILE MEMORY - A non-volatile memory in which data is randomized before being stored in the non-volatile memory to minimize data pattern-related read failures. Randomizing is performed using circuitry on the memory die so that the memory die is portable relative to an external, off-chip controller. Circuitry on the memory die scrambles user data based on a key which is generated using a seed which is shifted according to a write address. Corresponding on-chip descrambling is also provided. | 03-18-2010 |
20110188314 | BIT LINE STABILITY DETECTION - A power supply and monitoring apparatus such as in a nonvolatile memory system. A power supply circuit provides power to a large number of sense modules, each of which is associated with a bit line and a string of non-volatile storage elements. During a sensing operation, such as a read or verify operation, a discharge period is set in which a sense node of each sense module discharges into the associated bit line and string of non-volatile storage elements, when the string of non-volatile storage elements, is conductive. This discharge sinks current from the power supply, causing a perturbation. By sampling the power supply, a steady state condition can be detected from a rate of change. The steady state condition signals that the discharge period can be concluded and data can be latched from the sense node. The discharge period automatically adapts to different memory devices and environmental conditions | 08-04-2011 |
20110188317 | NON-VOLATILE MEMORY WITH FAST BINARY PROGRAMMING AND REDUCED POWER CONSUMPTION - In a non-volatile storage system, the time needed to perform a programming operation is reduced by minimizing data transfers between sense modules and a managing circuit. A sense module is associated with each storage element. Based on write data, a data node in the sense module is initialized to “0” for a storage element which is to remain in an erased state, and to “1” for a storage element which is to be programmed to a programmed state, then flipped to “0” when programmed is completed. The managing circuit is relieved of the need to access the write data to determine whether a “0” represents a storage element for which programming is completed. Power consumption can also be reduced by keeping a bit line voltage high between a verify phase of one program-verify iteration and a program phase of a next program-verify iteration. | 08-04-2011 |
20130201760 | Reducing Weak-Erase Type Read Disturb In 3D Non-Volatile Memory - A read process for a 3D stacked memory device provides an optimum level of channel boosting for unselected memory strings, to repress both normal and weak-erase types of read disturbs. The channel is boosted by controlling of voltages of bit lines (Vbl), drain-side select gates (Vsgd_unsel), source-side select gates (Vsgs_unsel), a selected level (word line layer) of the memory device (Vcg_sel), and unselected levels of the memory device (Vcg_unsel). A channel can be boosted by initially making the drain-side and source-side select gates non-conductive, to allow capacitive coupling from an increasing Vcg_unsel. The drain-side and/or source-side select gates are then made non-conductive by raising Vsgd_unsel and/or Vsgs_unsel, interrupting the boosting. Additionally boosting can occur by making the drain-side and/or source-side select gates conductive again while Vcg_unsel is still increasing. Or, the channel can be driven at Vbl. Two-step boosting drives the channel at Vbl, then provides boosting by capacitive coupling. | 08-08-2013 |
20130279256 | Soft Erase Operation For 3D Non-Volatile Memory With Selective Inhibiting Of Passed Bits - An erase operation for a 3D stacked memory device selectively inhibits subsets of memory cells which meet a verify condition as the erase operation progresses. As a result, the faster-erasing memory cells are less likely to be over-erased and degradation is reduced. Each subset of memory cells can be independently erased by controlling a select gate, drain (SGD) transistor line, a bit line or a word line, according to the type of subset. For a SGD line subset or a bit line subset, the SGD line or bit line, respectively, is set at a level which inhibits erase. For a word line subset, the word line voltage is floated to inhibit erase. An inhibit or uninhibit status can be maintained for each subset, and each type of subset can have a different maximum allowable number of fail bits. | 10-24-2013 |
20130279257 | Erase Operation For 3D Non-Volatile Memory With Controllable Gate-Induced Drain Leakage Current - An erase operation for a 3D stacked memory device applies an erase pulse which includes an intermediate level (Vgidl) and a peak level (Verase) to a set of memory cells, and steps up Vgidl in erase iterations of the erase operation. Vgidl can be stepped up when a specified portion of the cells have reached the erase verify level. In this case, a majority of the cells may have reached the erase verify level, such that the remaining cells can benefit from a higher gate-induced drain leakage (GIDL) current to reached the erase verify level. Verase can step up before and, optionally, after Vigdl is stepped up, but remain fixed while Vgidl is stepped. Vgidl can be stepped up until a maximum allowed level, Vgidl_max, is reached. Vgidl may be applied to a drain-side and/or source-side of a NAND string via a bit line or source line, respectively. | 10-24-2013 |
20130322174 | Threshold Voltage Adjustment For A Select Gate Transistor In A Stacked Non-Volatile Memory Device - In a 3D stacked non-volatile memory device, the threshold voltages are evaluated and adjusted for select gate, drain (SGD) transistors at drain ends of strings of series-connected memory cells. To optimize and tighten the threshold voltage distribution, the SGD transistors are read at lower and upper levels of an acceptable range. SGD transistors having a low threshold voltage are subject to programming, and SGD transistors having a high threshold voltage are subject to erasing, to bring the threshold voltage into the acceptable range. The evaluation and adjustment can be repeated such as after a specified number of program-erase cycles of an associated sub-block. The condition for repeating the evaluation and adjustment can be customized for different groups of SGD transistors. Aspects include programming SGD transistors with verify and inhibit, erasing SGD transistors with verify and inhibit, and both of the above. | 12-05-2013 |
20140043916 | Erase For 3D Non-Volatile Memory With Sequential Selection Of Word Lines - An erase operation for a 3D stacked memory device adjusts a start time of an erase period and/or a duration of the erase period for each storage element based on a position of the storage element. A voltage is applied to one or both drive ends of a NAND string to pre-charge a channel to a level which is sufficient to create gate-induced drain leakage at the select gate transistors. With timing based on a storage element's distance from the driven end, the control gate voltage is lowered to encourage tunneling of holes into a charge trapping layer in the erase period. The lowered control gate voltage results in a channel-to-control gate voltage which is sufficiently high to encourage tunneling. The duration of the erase period is also increased when the distance from the driven end is greater. As a result, a narrow erase distribution can be achieved. | 02-13-2014 |
20140056065 | Reducing Weak-Erase Type Read Disturb In 3D Non-Volatile Memory - A read process for a 3D stacked memory device provides an optimum level of channel boosting for unselected memory strings, to repress both normal and weak-erase types of read disturbs. The channel is boosted by controlling of voltages of bit lines (Vb1), drain-side select gates (Vsgd_unsel), source-side select gates (Vsgs_unsel), a selected level (word line layer) of the memory device (Vcg_sel), and unselected levels of the memory device (Vcg_unsel). A channel can be boosted by initially making the drain-side and source-side select gates non-conductive, to allow capacitive coupling from an increasing Vcg_unsel. The drain-side and/or source-side select gates are then made conductive by raising Vsgd_unsel and/or Vsgs_unsel, interrupting the boosting. Additionally boosting can occur by making the drain-side and/or source-side select gates non-conductive again while Vcg_unsel is still increasing. Or, the channel can be driven at Vb1. Two-step boosting drives the channel at Vb1, then provides boosting by capacitive coupling. | 02-27-2014 |
20140119126 | Dynamic Bit Line Bias For Programming Non-Volatile Memory - A program operation for a set of non-volatile storage elements. A count is maintained of a number of program pulses which are applied to an individual storage element in a slow programming mode, and an associated bit line voltage is adjusted based on the count. Different bit line voltages can be used, having a common step size or different steps sizes. As a result, the change in threshold voltage of the storage element within the slow programming mode, with each program pulse can be made uniform, resulting in improved programming accuracy. Latches maintain the count of program pulses experienced by the associated storage element, while in the slow programming mode. The storage element is in a fast programming mode when its threshold voltage is below a lower verify level, and in the slow programming mode when its threshold voltage is between the lower verify level and a higher verify level. | 05-01-2014 |
20140211568 | BIT LINE CURRENT TRIP POINT MODULATION FOR READING NONVOLATILE STORAGE ELEMENTS - Upon selecting non-volatile storage elements to be sensed, the system obtains information about the position of these non-volatile storage elements, determines sensing parameters based at least in part on this information, pre-charges a charge storage device and, while maintaining the voltage level of the bit lines of these memory cells at a constant value, applies a reference signal to these non-volatile storage elements for a certain duration of time, afterwards determining whether, for the certain duration of time, the current conducted by these non-volatile storage elements exceeds a predetermined value. | 07-31-2014 |
20140247659 | REDUCING WEAK-ERASE TYPE READ DISTURB IN 3D NON-VOLATILE MEMORY - A read process for a 3D stacked memory device provides an optimum level of channel boosting for unselected memory strings, to repress both normal and weak-erase types of read disturbs. The channel is boosted by controlling of voltages of bit lines (Vbl), drain-side select gates (Vsgd_unsel), source-side select gates (Vsgs_unsel), a selected level (word line layer) of the memory device (Vcg_sel), and unselected levels of the memory device (Vcg_unsel). A channel can be boosted by initially making the drain-side and source-side select gates non-conductive, to allow capacitive coupling from an increasing Vcg_unsel. The drain-side and/or source-side select gates are then made conductive by raising Vsgd_unsel and/or Vsgs_unsel, interrupting the boosting. Additionally boosting can occur by making the drain-side and/or source-side select gates non-conductive again while Vcg_unsel is still increasing. Or, the channel can be driven at Vbl. Two-step boosting drives the channel at Vbl, then provides boosting by capacitive coupling. | 09-04-2014 |
20140247661 | Erase For 3D Non-Volatile Memory With Sequential Selection Of Word Lines - An erase operation for a 3D stacked memory device adjusts a start time of an erase period and/or a duration of the erase period for each storage element based on a position of the storage element. A voltage is applied to one or both drive ends of a NAND string to pre-charge a channel to a level which is sufficient to create gate-induced drain leakage at the select gate transistors. With timing based on a storage element's distance from the driven end, the control gate voltage is lowered to encourage tunneling of holes into a charge trapping layer in the erase period. The lowered control gate voltage results in a channel-to-control gate voltage which is sufficiently high to encourage tunneling. The duration of the erase period is also increased when the distance from the driven end is greater. As a result, a narrow erase distribution can be achieved. | 09-04-2014 |
20140247662 | Efficient Smart Verify Method For Programming 3D Non-Volatile Memory - In a programming operation of a 3D stacked non-volatile memory device, an initial set of memory cells on a selected word line layer, involving fewer than all memory cells on a selected word line layer, are programmed first as a test case to determine optimal conditions for programming the remaining memory cells on the selected word line layer. For example, a number of program-verify iterations or loops which are needed to program the initial set of memory cells an initial amount is determined. This loop count is then stored, e.g., within the initial set of memory cells, within the remaining memory cells, within memory cells on a remaining word line layer, or in a data register, and programming of the initial set of memory cells continues to completion. Subsequently, the loop count is retrieved and used to determine an optimal starting program voltage for programming the remaining memory cells. | 09-04-2014 |
20140247668 | Group Word Line Erase And Erase-Verify Methods For 3D Non-Volatile Memory - An erase operation for a 3D stacked memory device assigned storage elements to groups according to an expected erase speed. The storage elements are then erased according to their group to provide a more uniform erase depth and a tighter erase distribution. In one approach, the control gate voltages are set differently for the different groups to slow down the storage elements which are expected to have a faster programming speed. An erase or inhibit status can be set for all groups together. In another approach, the control gate voltages are common for the different groups but an erase or inhibit status is set for each group separately. | 09-04-2014 |
20140269070 | Compensation For Temperature Dependence Of Bit Line Resistance - Techniques for sensing the threshold voltage of a memory cell during reading and verify operations by compensating for changes, including temperature-based changes, in the resistance of a bit line or other control line. A memory cell being sensed is in a block in a memory array and the block is in a group of blocks. A portion of the bit line extends between the group of blocks and a sense component and has a resistance which is based on the length/distance and the temperature. Various parameters can be varied with temperature and the group of blocks to provide the compensation, including bit line voltage, selected word line voltage, source line voltage, sense time and/or sense current or voltage. | 09-18-2014 |
20140269081 | SOFT ERASE OPERATION FOR 3D NON-VOLATILE MEMORY WITH SELECTIVE INHIBITING OF PASSED BITS - An erase operation for a 3D stacked memory device selectively inhibits subsets of memory cells which meet a verify condition as the erase operation progresses. As a result, the faster-erasing memory cells are less likely to be over-erased and degradation is reduced. Each subset of memory cells can be independently erased by controlling a select gate, drain (SGD) transistor line, a bit line or a word line, according to the type of subset. For a SGD line subset or a bit line subset, the SGD line or bit line, respectively, is set at a level which inhibits erase. For a word line subset, the word line voltage is floated to inhibit erase. An inhibit or uninhibit status can be maintained for each subset, and each type of subset can have a different maximum allowable number of fail bits. | 09-18-2014 |
20140269083 | BIT LINE CURRENT TRIP POINT MODULATION FOR READING NONVOLATILE STORAGE ELEMENTS - Upon selecting non-volatile storage elements to be sensed, the system obtains information about the position of these non-volatile storage elements, determines sensing parameters based at least in part on this information, pre-charges a charge storage device and, while maintaining the voltage level of the bit lines of these memory cells at a constant value, applies a reference signal to these non-volatile storage elements for a certain duration of time, afterwards determining whether, for the certain duration of time, the current conducted by these non-volatile storage elements exceeds a predetermined value. | 09-18-2014 |
20140362641 | Program And Read Operations For 3D Non-Volatile Memory Based On Memory Hole Diameter - Techniques are provided for programming and reading memory cells in a 3D stacked non-volatile memory device by compensating for variations in a memory hole diameter. The memory hole diameter is smaller at the bottom of the stack, resulting in more severe read disturb. To compensate, programming of memory cells at the lower word line layers is modified. In one approach, threshold voltage (Vth) distributions of one or more data states are narrowed during programming so that a lower read pass voltage can be used in a subsequent sensing operation. A sufficient spacing is maintained between the read pass voltage and the upper tail of the highest data state. The Vth distributions can be downshifted as well. In another approach, the read pass voltage is not lowered, but the lowest programmed state is upshifted to provide spacing from the upper tail of the erased state. | 12-11-2014 |
20140362642 | 3D Non-Volatile Memory With Control Gate Length Based On Memory Hole Diameter - A structure and fabrication process are provided for a 3D stacked non-volatile memory device which compensates for variations in a memory hole diameter. The memory hole diameter is smaller at the bottom of the stack, resulting in more severe read disturb. To compensate, the word line layers are thicker at the bottom of the stack and can increase gradually from the bottom to the top of the stack. As a result, the length of the control gates of the memory cells is greater at the bottom of the stack. The capacitance between the control gate and a charge trapping layer increased in proportion to the length of the control gates. During programming, a narrower threshold voltage (Vth) distribution is achieved for these memory cells. The Vth distributions can be placed closer together and downshifted to allow lowering of a read pass voltage in a subsequent sensing operation, reducing read disturb. | 12-11-2014 |
20140362645 | 3D Non-Volatile Memory With Control Gate Length Based On Memory Hole Diameter - A structure and fabrication process are provided for a 3D stacked non-volatile memory device which compensates for variations in a memory hole diameter. The memory hole diameter is smaller at the bottom of the stack, resulting in more severe read disturb. To compensate, the word line layers are thicker at the bottom of the stack and can increase gradually from the bottom to the top of the stack. As a result, the length of the control gates of the memory cells is greater at the bottom of the stack. The capacitance between the control gate and a charge trapping layer increased in proportion to the length of the control gates. During programming, a narrower threshold voltage (Vth) distribution is achieved for these memory cells. The Vth distributions can be placed closer together and downshifted to allow lowering of a read pass voltage in a subsequent sensing operation, reducing read disturb. | 12-11-2014 |
20150043278 | Group Word Line Erase And Erase-Verify Methods For 3D Non-Volatile Memory - An erase operation for a 3D stacked memory device assigns storage elements to groups according to an expected erase speed. The storage elements are then erased according to their group to provide a more uniform erase depth and a tighter erase distribution. In one approach, the control gate voltages are set differently for the different groups to slow down the storage elements which are expected to have a faster programming speed. An erase or inhibit status can be set for all groups together. In another approach, the control gate voltages are common for the different groups but an erase or inhibit status is set for each group separately. | 02-12-2015 |