Luk-Pat
Gerard Luk-Pat, Sunnyvale, CA US
Patent application number | Description | Published |
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20140245239 | DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS - Mask design techniques for detection and removal of undesirable artifacts in SADP processes using multiple patterns are disclosed. Artifacts or spurs result from lithographic and chemical processing of semiconducting wafers. The spurs are undesirable because they can cause unwanted connections or act as electrical antennas. Spurs are detected using rule-based techniques and reduced by modifying lithographic masks. The severity of the detected spurs is determined, again using rule-based techniques. The effects of detected spurs can be reduced by modifying the decomposition of the drawn patterns into the two masks used for lithography. Mandrel masks are modified by add dummy mandrel material, and trim masks are modified by removing trim material. The resulting multi-pattern arrangement is used to fabricate the critical design elements that make up the semiconductor wafers. | 08-28-2014 |
Gerard Terrence Luk-Pat, Sunnyvale, CA US
Patent application number | Description | Published |
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20100115489 | METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOUBLE-PATTERNING PROCESS - One embodiment of the present invention provides a system that performs lithography verification for a double-patterning process on a mask layout without performing a full contour simulation of the mask layout. During operation, the system starts by receiving a first mask which is used in a first lithography step of the double-patterning process, and a second mask which is used in a second lithography step of the double-patterning process. Note that the first mask and the second mask are obtained by partitioning the mask layout. Next, the system receives an evaluation point on the mask layout. The system then determines whether the evaluation point is exclusively located on a polygon of the first mask, exclusively located on a polygon of the second mask, or located elsewhere. The system next computes a printing indicator at the evaluation point for the mask layout based on whether the evaluation point is exclusively located on a polygon of the first mask or exclusively located on a polygon of the second mask. | 05-06-2010 |
Kenneth Luk-Pat, Sunrise, FL US
Patent application number | Description | Published |
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20150348038 | Method and Apparatus for Money Transfer to an Account - A method includes receiving, by a processor, a request to initiate a money transfer transaction between a sending party and a receiving party. The request may include information identifying an account associated with the receiving party. The method includes initiating, by the processor, validation of the account associated with the receiving party. The method includes initiating, by the processor, the money transfer transaction between the sending party and the receiving party in response to a determination that the account associated with the receiving party is valid. Initiation of the money transfer transaction causes funds to be deposited into the account associated with the receiving party. | 12-03-2015 |