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Lee, DE

Ching-Cherng Lee, Newark, DE US

Patent application numberDescriptionPublished
20080257390Method for Selectively Washing Used Reaction Cuvettes in an Automatic Analyzer - A method for cleansing used reaction cuvettes so that whenever certain assays are to be or have been performed in the reaction cuvette, the cuvette is automatically subjected to an additional cleaning operation by providing a number of washing and drying manifolds, each of which is independently selectively activated to perform or not perform a cleaning operation10-23-2008

Han Il Lee, Wilmington, DE US

Patent application numberDescriptionPublished
20090130355Articles containing bimodal ionomer compositions - Provided are partially or fully neutralized mixtures of carboxylate functionalized ethylene high copolymers or terpolymers (Mw between 80,000 and 500,000 Da) with carboxylate functionalized ethylene low copolymers (Mw between 2,000 and 30,000 Da). The compositions are used in films, multilayer structures and other articles of manufacture. The compositions are preferably used on a surface of the articles.05-21-2009

Hau-Nan Lee, Wilmington, DE US

Patent application numberDescriptionPublished
20150240090FLUORINATED POLYMER ADDITIVES DERIVED USING HYDROPHILIC CHAIN TRANSFER AGENTS FOR ARCHITECTURAL COATINGS - The present invention comprises a composition and method of use for providing cleanability to paint comprising an aqueous emulsion of Formula (I)08-27-2015

Hee Hyun Lee, Wilmington, DE US

Patent application numberDescriptionPublished
20080233280Method to form a pattern of functional material on a substrate by treating a surface of a stamp - The invention provides a method to form a pattern of functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. At least the raised surface of the stamp is treated by exposing the stamp to heat, radiation, electrons, a stream of charged gas, chemical fluids, chemical vapors, and combinations thereof, to enhance wettability of the surface. A composition of the functional material and a liquid is applied to the relief structure and the liquid is removed to form a film on the raised surface. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.09-25-2008
20080248205Method to form a pattern of functional material on a substrate using a mask material - The invention provides a method to form a pattern of functional material on a substrate for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate. The functional material is applied to the substrate in at least the open area. Contact of an adhesive material to an exterior surface opposite the substrate and separation of the adhesive from the substrate forms the pattern of functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.10-09-2008
20090191355Methods for forming a thin layer of particulate on a substrate - The invention is a method for forming a thin layer of particulate on a substrate by applying a layer of a composition comprising the particulate and a dispersing agent on the substrate, treating the layer with charged gas to remove the dispersing agent from the layer; and induction heating to form operative connection of the particulate.07-30-2009
20090191356Method for forming a thin layer of particulate on a substrate - The invention is a method for forming a thin layer of particulate on a substrate by applying a layer of a composition comprising the particulate and a dispersing agent on the substrate, treating the layer with charged gas to remove the dispersing agent from the layer; and induction heating to form operative connection of the particulate.07-30-2009
20090295041PRINTING FORM PRECURSOR AND PROCESS FOR PREPARING A STAMP FROM THE PRECURSOR - The invention pertains to a printing form precursor and a method for preparing a stamp from the precursor for use in soft lithographic applications. The printing form precursor includes a composition layer of a fluorinated compound capable of polymerization upon exposure to actinic radiation and a flexible support transparent to the actinic radiation adjacent the composition layer.12-03-2009
20130225754METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH MONOMERS WHICH HAVE A LOWER CRITICAL SOLUTION TEMPERATURE - Processes for encapsulating pigment dispersions is described and are used in inkjet inks providing stability with regard to heat aging test conditions and solvent challenges. Prints from these inks have better durability than prints made from dispersions that are not encapsulated.08-29-2013
20130231439METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS - A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. An acrylate monomer is added and the resultant mixture is polymerized. Optionally, the acrylate monomer may be emulsified in water with an added surfactant or polymeric dispersant and up to 20% acrylic or other vinyl monomers based on the acrylate may be added to acrylate monomer before polymerization. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging Lest conditions, and solvent challenges. Prints from these inks have better durability.09-05-2013
20140011941METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WHICH INCLUDE POLYURETHANE DISPERSIONS - A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. An acrylate monomer and a polyurethane dispersion are added and the resultant mixture is polymerized. Optionally, the acrylate monomer/polyurethane mixture may be emulsified in water with an added surfactant or polymeric dispersant and up to 20% acrylic or other vinyl monomers based on the acrylate may be added to the acrylate monomer/polyurethane mixture before polymerization. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have better durability.01-09-2014
20140094559INK JET INK COMPRISING ENCAPSULATED PIGMENT DISPERSIONS WITH MINIMAL FREE POLYMER - The present disclosure provides an inkjet ink comprising an aqueous vehicle and an encapsulated pigment dispersion. A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. The free polymer dispersant in the pigment dispersion is limited to less than 0.12 grams per gram of pigment. This dispersed pigment is then encapsulated by adding acrylate monomers and optionally acrylic and vinyl monomers and polymerizing. In the encapsulated pigment dispersion the weight ratio of final free polymer to polymer found to the final encapsulated pigment is less than 0.9. The free polymer dispersant is measured by a centrifugation method and the final free polymer is measured by a density gradient centrifugation method. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have better durability.04-03-2014
20140155535METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH MINIMAL FREE POLYMER - A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. The free polymer dispersant in the pigment dispersion is limited to less than 0.12 grams per gram of pigment. This dispersed pigment is then encapsulated by adding acrylate monomers and optionally acrylic and vinyl monomers and polymerizing. In the encapsulated pigment dispersion the weight ratio of final free polymer to polymer found to the final encapsulated pigment is less than 0.9. The free polymer dispersant is measured by a centrifugation method and the final free polymer is measured by a density gradient centrifugation method. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have better durability.06-05-2014
20140243449METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENCAPSULATION STEPS - A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. The encapsulation process has at least two additions of encapsulating monomers followed by polymerization. To a pigment dispersed with a polymeric dispersant is added an encapsulating monomer(s) and a polymerization initiator is added which forms a stage 1 encapsulated pigment. Then a second encapsulating monomer(s) is added and these monomers are polymerized by a second addition of polymerization initiator, forming a second stage encapsulated pigment. The second encapsulating monomer(s) may be added continuously to the stage 1 encapsulated pigment. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have better durability.08-28-2014
20140249248INKJET INK COMPRISING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENCAPSULATION STEPS - The present disclosure provides an inkjet ink comprising an aqueous vehicle and an encapsulated pigment dispersion. A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. The encapsulation process has at least two additions of encapsulating monomers followed by polymerization. To a pigment dispersed with a polymeric dispersant is added an encapsulating monomer(s) and a polymerization initiator is added which forms a stage 1 encapsulated pigment. Then a second encapsulating monomer(s) is added and these monomers are polymerized by a second addition of polymerization initiator, forming a second stage encapsulated pigment. The second encapsulating monomer(s) may be added continuously to the stage 1 encapsulated pigment. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have better durability.09-04-2014
20140296395METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH CONTINUOUS ADDITON OF ENCAPSULATING MONOMER - A process for encapsulating pigment dispersions is provided where a pigment is dispersed with a polymeric dispersant in an aqueous solvent system. The encapsulation process is done by adding encapsulating monomers continuously or semi-continuously to the aqueous pigment dispersion. The polymerization initiator is added prior to the addition of encapsulating monomers or at the same time as the encapsulating monomers or a combination of prior and simultaneous addition. Such encapsulated pigment dispersions may be used in inkjet inks and are stable to heat, aging test conditions, and solvent challenges. Prints from these inks have excellent durability.10-02-2014

Patent applications by Hee Hyun Lee, Wilmington, DE US

Jaeseok Lee, Wilmington, DE US

Patent application numberDescriptionPublished
20120276742Chemical Mechanical Polishing Composition and Method For Polishing Germanium-Antimony-Tellurium Alloys - A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition consisting essentially of, as initial components: water; an abrasive; a material selected from ethylene diamine tetra acetic acid and salts thereof; and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.11-01-2012
20120276819Chemical Mechanical Polishing Composition and Method For Polishing Phase Change Alloys - A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition comprising, as initial components: water; an abrasive; at least one of a phthalic acid, a phthalic anhydride, a phthalate compound and a phthalic acid derivative; a chelating agent; a poly(acrylic acid-co-maleic acid); and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.11-01-2012

Kelvin H. Lee, Newark, DE US

Patent application numberDescriptionPublished
20090075395MULTIPLEXED BIOMARKERS FOR MONITORING THE ALZHEIMER'S DISEASE STATE OF A SUBJECT - The present invention relates to a method for diagnosing a subject's Alzheimer's disease state. The method involves providing a database containing information relating to protein expression levels associated and not associated with Alzheimer's disease. The database includes information relating to at least a majority of the following proteins: albumin, alpha-1-antitrypsin, apolipoprotin E, apolipoprotein J, complement component 3, contactin, fibrin beta, Ig heavy chain, Ig light chain, neuronal pentraxin receptor, plasminogen, proSAAS, retinol-binding protein, transthyretin, and vitamin D binding protein. Information relating to proteins found in one or more cerebrospinal fluid samples from a subject is also provided and a database is used to analyze the information from the subject to diagnose the subject's Alzheimer's disease state. Also disclosed is a computer readable medium and a system, both useful in carrying out the present invention.03-19-2009
20120129218COFILIN KNOCKDOWN HOST CELLS AND USES THEREOF - The present invention relates to a host cell comprising a cofilin-specific small interfering RNA (siRNA) sequence. The host cell may further comprise a nucleic acid encoding a recombinant protein. The present invention also relates to a method for producing a recombinant protein by the host cell comprising a cofilin-specific small interfering RNA (siRNA) sequence.05-24-2012

Keun-Hyung Lee, Newark, DE US

Patent application numberDescriptionPublished
20100056007METHOD OF SOLUTION PREPARATION OF POLYOLEFIN CLASS POLYMERS FOR ELECTROSPINNING PROCESSING INCLUDING - A process to make a polyolefin fiber which has the following steps: mixing at least one polyolefin into a solution at room temperature or a slightly elevated temperature to form a polymer solution and electrospinning at room temperature said polymer solution to form a fiber.03-04-2010

Seung Joon Lee, Bear, DE US

Patent application numberDescriptionPublished
20130116335METHOD FOR IDENTIFYING THERAPEUTIC AGENTS FOR TREATMENT OF CANCER - The presence of phosphorylated Cdc27 in cancer cells is utilized to identify patients likely to benefit from treatment with a chemotherapeutic agent that binds to, or binds to and crosslinks, phosphorylated Cdc27, e.g., curcumin, or to determine whether patients undergoing such treatment will continue to respond effectively. Candidate compounds are screened for anticancer effect by testing the ability to bind to or crosslink phosphorylated Cdc27.05-09-2013

Shinwoo Lee, Newark, DE US

Patent application numberDescriptionPublished
20150037274METHODS OF FILTERING MULTIPLE CONTAMINANTS, MITIGATING CONTAMINANT FORMATION, AND RECYCLING GREENHOUSE GASES USING A HUMIC AND FULVIC REAGENT - A highy alkalized humic and fulvic filter reagent for the removal of multiple contaminants from a gas is provided. The contaminants removed from the gas stream may include, but are not limited to, Carbon Dioxide, Sulfur Oxide, Nitrogen Oxides, Hydrogen Sulfides, radionuclides, mercaptans, ammonia, toxic metals, particulates, volatile vapors, and organics. The present invention further includes the disposal of the filter reagent by way of using the highly alkalized humic and fulvic filter for soil fertility, releasing the carbon dioxide from the filter reagent , converting the liquid filter reagent into a solid for disposal or for use as a contaminant removal filter for waters, wastes, and chemicals.02-05-2015

Win-Chung Lee, Hockessin, DE US

Patent application numberDescriptionPublished
20080207829Process for conversion of polyvinyl butyral (PVB) scrap into processable pellets - The present invention relates to a polyvinylbutyral (PVB) composition that is useful for blending with other polymers. The PVB composition of the present invention can be stored and used at ambient temperature without the occurrence of blocking by the PVB.08-28-2008
20080286577Toughened polyacetal compositions and blends having low surface gloss - Polyacetal compositions and blends toughened with polyvinylbutyral having enhanced adhesive surface properties, including enhanced surface adhesion and low surface gloss, are disclosed. Also disclosed are articles of manufacture comprising the polyacetal compositions described herein.11-20-2008
20110028769PROCESS FOR MAKING 1,1,1,4,4,4-HEXAFLUORO-2-BUTENE - A process is disclosed for making 1,1,1,4,4,4-hexafluoro-2-butene. The process involves reacting 2,2-dichloro-1,1,1-trifluoroethane with copper in the presence of an amide solvent and 2,2′-bipyridine. A process is also disclosed for making 1,1,1,4,4,4-hexafluoro-2-butene. The process involves reacting 2,2-dichloro-1,1,1-trifluoroethane with copper in the presence of an amide solvent and a Cu(I) salt. A process is further disclosed for making 1,1,1,4,4,4-hexafluoro-2-butene. The process involves reacting 2,2-dichloro-1,1,1-trifluoroethane with copper in the presence of an amide solvent, 2,2′-bipyridine and a Cu(I) salt.02-03-2011
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