Patent application number | Description | Published |
20090051934 | Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus - The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image. | 02-26-2009 |
20100045956 | Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 02-25-2010 |
20100118288 | Lithographic projection system and projection lens polarization sensor - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 05-13-2010 |
20100182582 | Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 07-22-2010 |
20100302521 | Inspection Apparatus for Lithography - An illuminator configured to create a radiation beam for the metrology of a substrate surface includes an arc lamp, a parabolic reflector ( | 12-02-2010 |
20110208342 | Inspection Method and Apparatus, and Lithographic Apparatus - A metrology device for inspecting a substrate is provided. In an embodiment, the metrology device includes a remote radiation source device, an optical system for creating a radiation beam, and an optical fibre for transferring radiation from the optical system to the location where the metrology operations are performed. The optical system includes a control system that includes a deformable mirror, a detector that detects the position of a radiation beam, and a controller that produces a control signal for input into the deformable mirror, the control signal being based on the detected position of the radiation. In this way, the shape of the deformable mirror can be used to control the position of the radiation beam output by the optical system into the optical fibre. | 08-25-2011 |
Patent application number | Description | Published |
20130182028 | METHOD OF CAMOUFLAGING ARTIFACTS IN HIGH COVERAGE AREAS IN IMAGES TO BE PRINTED - A method of printing an image on a receiving medium includes increasing the number of pixels in each row of a part of the image by x pixels, resulting in the part of the image including m by n+x pixels; assigning a printing element to each added pixel; identifying pixels to which a compensating printing element of the defective printing element is assigned; changing the value of at least one identified pixel into an integer value greater than zero; increasing the first printer resolution in the main-scanning direction to a second printer resolution by multiplying the first printer resolution in the main-scanning direction with a factor equal to (n+x)/n; and printing the part of the image according to the second printer resolution in the main-scanning direction and according to the values of the pixels of the part of the image. | 07-18-2013 |
20130188225 | METHOD OF HALFTONING FOR ASYMMETRIC PRINT RESOLUTIONS AND A PRINTER - A method of printing an image by a printer having an asymmetric printer resolution includes multi-level halftoning the image by assigning a level out of a number of levels to each pixel of the image. The method further includes determining the number of levels on the basis of the asymmetric printer resolution, selecting for each level a collection of at least one binary pattern, each binary pattern consisting of a plurality of sub-pixels the number of which is determined by the number of levels, selecting for each pixel of the halftoned image a binary pattern from the collection selected for the level assigned to the pixel, transforming each pixel of the halftoned image into the selected binary pattern, and printing the binary patterns of the transformed pixels using the asymmetric printer resolution. A printer is configured to perform the method. | 07-25-2013 |
20140160191 | METHOD FOR PRINTING CONTIGUOUS SWATHS - A method for printing an image on an image receiving member is provided, in which a print head having an array of print elements moves in a scanning direction to print image lines and the image receiving member is advanced in a transport direction after printing a swath. In order to obtain various contiguous swaths of print lines without a light or dark line between the swaths, the position of a prior swath printed preceding to a current swath is determined during the printing of the current swath. A digital mask is applied to the print data that is associated with the print elements at the to the prior swath adjoining edge of the current swath in dependence on the determination of the position of the prior swath. | 06-12-2014 |
20150070430 | METHOD FOR OPERATING AN INKJET DEVICE - The invention relates to a method for operating an inkjet device, the inkjet device comprising a piezo-electric element. The inkjet device may be configured to operate in a plurality of modes, the plurality of modes comprising a first mode, wherein the inkjet device is in an off state; a second mode, wherein the inkjet device is in a standby state; and a third mode, wherein the inkjet device is in an operative state. Depending on the state of the inkjet device, the BIAS voltage applied to the piezo-electric element is selected. | 03-12-2015 |
Patent application number | Description | Published |
20100014167 | CONTROLLABLE OPTICAL LENS - A controllable optical lens system, comprises a chamber housing first and second fluids, the interface between the fluids defining a lens surface. An electrode arrangement controls the shape of the lens surface and has first and second electrodes. A parameter is determined by the system dependent on the electrical resistance through at least one of the lens fluids between the first and second electrodes. Thus, the series resistance through a lens fluid is used as a measure of meniscus position. | 01-21-2010 |
20100087735 | METHODS AND APPARATUSES OF MICROBEAMFORMING WITH ADJUSTABLE FLUID LENSES - An acoustic probe ( | 04-08-2010 |
20100259832 | ADJUSTABLE LENS SYSTEM FOR REAL-TIME APPLICATIONS - An adjustable fluid type lens system is provided that allows e.g. ultrasound imaging through the lens during adjustment of the lens. The lens includes a container enclosing two immiscible fluids, e.g. water and oil, being in contact with each other at an interface. Incoming waves are then refracted at this interface. The shape of the interface, and thereby the refraction property, is adjustable by adjusting a voltage applied to the lens. The two fluids are selected such that they together exhibit a mechanical damping which is critical or near critical. A control circuit generates the electric voltage for adjusting the refraction from one value to another, the control circuit being arranged to change the electric voltage such that a rate of voltage change is limited to avoid oscillation of the interface, thereby adjusting refraction of incoming waves at the interface in a continuous manner. This makes it possible to use the lens while it is during adjustment from one refraction value to another, since the interface shape will at all time during the adjustment have a controlled shape. The voltage can be either a continuous voltage or a discrete stepwise (digital) voltage which is just controlled with respect to step size and temporal extension of the steps. The lens system has a number of applications e.g. within the medical field, e.g. for ‘on the fly’ high speed ultrasound imaging, or for ultrasound ablation applications where ablation can be performed during adjustment of the lens to follow a pre-defined trajectory. | 10-14-2010 |
20100280390 | CATHETER FOR THREE-DIMENSIONAL INTRACARDIAC ECHOCARDIOGRAPHY AND SYSTEM INCLUDING THE SAME - A catheter apparatus ( | 11-04-2010 |
20110309241 | INTERVENTIONAL INSTRUMENT WITH ILLUMINATION MEANS - The invention relates to an instrument ( | 12-22-2011 |
Patent application number | Description | Published |
20120175527 | LITHOGRAPHY SYSTEM AND METHOD OF PROCESSING SUBSTRATES IN SUCH A LITHOGRAPHY SYSTEM - The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area. | 07-12-2012 |
20130034421 | Method of processing a substrate in a lithography system - A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N−1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit. | 02-07-2013 |
20130037730 | Network architecture for lithography machine cluster - The invention relates to a clustered substrate processing system comprising a plurality of lithography elements. Each lithography element is arranged for independent exposure of substrates according to pattern data, and comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system. | 02-14-2013 |
20130044305 | Apparatus for transferring a substrate in a lithography system - An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers. | 02-21-2013 |
20150109601 | CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR - A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system ( | 04-23-2015 |