Patent application number | Description | Published |
20110300257 | METHOD FOR MANUFACTURING A FERMENTATION PRODUCT CONTAINING PROPIONATE AND ACETATE COMPRISING A STEP OF REMOVING CARBONATE-DERIVED COMPOUNDS - A method for manufacturing a mixed solution comprising propionate and acetate includes adding acid to a fermentation product to obtain an acidified fermentation product comprising propionate and acetate with a pH in the range of 2.5 to 8. The method optionally includes removing carbonate-related compounds from the mixed solution. | 12-08-2011 |
20150079647 | FERMENTATION PROCESS - The present invention pertains to a fermentation process for the production of an organic acid salt including the steps of fermenting a microorganism in a fermentation medium in a fermentation reactor to form a fermentation broth having an organic acid salt, wherein part of the organic acid salt is present in the solid state and part of the organic acid salt is dissolved in the fermentation broth; withdrawing at least part of the fermentation broth from the fermentation reactor, providing the broth to a hydrocyclone, and withdrawing a top effluent and a bottom effluent from the hydrocyclone; providing the bottom effluent from the hydocyclone to a solid/liquid separation step, to form a solid fraction and a liquid fraction, providing at least 30 vol.% of the total of the top effluent from the hydrocyclone and the liquid fraction from the solid-liquid separation step to the fermentation reactor. | 03-19-2015 |
20150094491 | CARBOXYLIC ACID RECOVERY FROM MAGNESIUM CARBOXYLATE MIXTURE - The invention is directed to a method for recovering carboyxlic acid from an magnesium carboxylate containing aqueous mixture, including the steps of: contacting the aqueous mixture with an acidic ion exchanger, thereby forming a carboxylic acid mixture and an ion exchanger loaded with magnesium ions; contacting the ion exchanger loaded with magnesium ions with a hydrochloric acid solution, thereby forming a magnesium chloride solution; and thermally decomposing the magnesium chloride solution at a temperature of at least 300° C., thereby forming magnesium oxide (MgO) and hydrogen chloride (HCl). | 04-02-2015 |
Patent application number | Description | Published |
20110313852 | ORTHOGONAL CORPUS INDEX FOR AD BUYING AND SEARCH ENGINE OPTIMIZATION - Systems and methods for applications of orthogonal corpus indexing (OCI), such as selecting ad words for purchase and improving visibility of web pages in search engines, are described. In one aspect, the systems and methods described herein employ OCI to recommend to an advertiser ad words for purchase. Advertisers pay search engines for placement of their advertising along side results in the search results page, when a given word or phrase appears in a user's search query. The described systems and methods enable automated selection of related and discriminating terms, identifying keywords that increase the ratio of ads clicked-through to money spent on keyword buying. In another aspect, the systems and methods described herein employ OCI to generate content for web pages. OCI may be used to determine content that when added to a web page improves the rank of that page in a search engine. | 12-22-2011 |
20130097021 | METHODS AND SYSTEMS FOR CREATING AN ADVERTISING DATABASE - Systems and methods for applications of orthogonal corpus indexing (OCI), such as selecting ad words for purchase and improving visibility of web pages in search engines, are described. In one aspect, the systems and methods described herein employ OCI for creating an advertising database. The described systems and methods process an information database using orthogonal corpus indexing and a seed topic to derive keywords. The described systems and methods query a search engine with a first keyword of the keywords, and process the provided results page to determine content relating to a classification such as an advertiser, an advertisement, an ad word, and an advertising link page. The described systems and methods insert the determined content with respective classification in the advertising database. | 04-18-2013 |
20130097148 | METHODS AND SYSTEMS FOR MODIFYING SEARCH ENGINE RANKINGS OF WEB PAGES - Systems and methods for applications of orthogonal corpus indexing (OCI) are described. In one aspect, the systems and methods described improve the ranking in a search engine of a web page. The systems and methods process a database using OCI to derive keywords relating to database content. They process a web page to determine a keyword relating to web page content, select content from the database based on the keyword, and add the selected content to the web page to improve its search engine page rank. In another aspect, the systems and methods described generate content for an advertisement. The systems and methods process a database using OCI to derive keywords relating to database content. They receive an ad word related to the advertisement, determine a keyword relating to the received ad word, and select content from the database based on the keyword for addition to the advertisement. | 04-18-2013 |
Patent application number | Description | Published |
20090151752 | METHODS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA - The embodiments of the present invention provide methods for cleaning patterned substrates with fine features. The methods for cleaning patterned substrate have advantages in cleaning patterned substrates with fine features without substantially damaging the features by using the cleaning materials described. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials. | 06-18-2009 |
20090151757 | APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA - The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials. | 06-18-2009 |
20090156452 | MATERIALS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA - The embodiments of the present invention provide improved materials for cleaning patterned substrates with fine features. The cleaning materials have advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials. | 06-18-2009 |
20100108093 | ACOUSTIC ASSISTED SINGLE WAFER WET CLEAN FOR SEMICONDUCTOR WAFER PROCESS - A method for cleaning a substrate is provided that includes applying a liquid medium to a surface of the substrate such that the liquid medium substantially covers a portion of the substrate that is being cleaned. One or more transducers are used to generate acoustic energy. The generated acoustic energy is applied to the substrate and the liquid medium meniscus such that the applied acoustic energy to the liquid medium prevents cavitation within the liquid medium. The acoustic energy applied to the substrate provides maximum acoustic wave displacement to acoustic waves introduced into the liquid medium. The acoustic energy introduced into the substrate and the liquid medium enables dislodging of the particle contaminant from the surface of the substrate. The dislodged particle contaminants become entrapped within the liquid medium and are carried away from the surface of the substrate by the liquid medium. | 05-06-2010 |
20120132234 | APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA - A cleaning system for removing contaminants on a surface of a patterned substrate for defining integrated circuit devices is provided. The system includes a substrate carrier for supporting edges of the patterned substrate, and a cleaning head positioned over the patterned substrate. The cleaning head includes a plurality of dispensing holes to dispense a cleaning material on the surface the patterned substrate for defining integrated circuit devices, wherein the cleaning material includes polymers of a polymeric compound. The cleaning head is coupled to a storage of the cleaning material, which is coupled to the cleaning material preparation system. A support structure holds the cleaning head in proximity to the surface of the patterned substrate. | 05-31-2012 |
20140034096 | Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Process - An apparatus for cleaning a substrate includes a dispense head configured to supply a liquid medium as a meniscus to the surface of the substrate and a rinse head that is equipped with at least an inlet conduit to supply rinse chemical to a top substrate surface as a meniscus. An outlet conduit is disposed on either side of the inlet conduit and is configured to remove the rinse chemical and liquid medium from the substrate surface. The inlet conduit and the outlet conduits are perpendicular to the surface of the rinse head that faces the substrate and parallel to one another. A first and second transducers are disposed in a portion of the rinse head between the inlet conduit and each of the outlet conduits. The transducers are configured to transmit acoustic energy to the meniscus when formed between the surface of the rinse head and the substrate. | 02-06-2014 |