Patent application number | Description | Published |
20080274607 | Semiconductor device and fabrication process thereof - A method of fabricating a semiconductor device includes the steps of modifying a damaged layer containing carbon and formed at a semiconductor surface by exposing the damaged layer to oxygen radicals to form a modified layer, and removing the modified layer by a wet etching process, wherein the modifying step is conducted by adding an active specie of an element that would obstruct formation of double bond between a Si atom and an oxygen atom by causing a chemical bond with Si atoms on the semiconductor surface. | 11-06-2008 |
20080311721 | Semiconductor device manufacture method including process of implanting impurity into gate electrode independently from source/drain and semiconductor device manufactured by the method - A gate electrode made of semiconductor is formed on the partial surface area of a semiconductor substrate. A mask member is formed on the surface of the semiconductor substrate in an area adjacent to the gate electrode. Impurities are implanted into the gate electrode. After impurities are implanted, the mask member is removed. Source and drain regions are formed by implanting impurities into the surface layer of the semiconductor substrate on both sides of the gate electrode. It is possible to reduce variations of cross sectional shape of gate electrodes and set an impurity concentration of the gate electrode independently from an impurity concentration of the source and drain regions. | 12-18-2008 |
20090108326 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device has a semiconductor substrate, a plurality of first conductive patterns, a second conductive pattern having a top surface of which stepwisely or gradually decreases in height in a direction from a side facing the first conductive pattern toward an opposite side, a first insulation film formed over the plurality of first conductive patterns and the second conductive pattern, and a third conductive pattern formed over the first insulation film. | 04-30-2009 |
20090215243 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming an isolation region defining an active region in a semiconductor substrate, forming a first insulating film over the semiconductor substrate, forming a second insulating film having etching properties different from those of the first insulating film over the first insulating film, selectively removing the second insulating film from a first region over the active region and the isolation region by dry etching using a fluorocarbon-based etching gas, removing a residual film formed by the dry etching over the first insulating film by exposure in an atmosphere containing oxygen, and selectively removing the first insulating film from the first region by wet etching. | 08-27-2009 |
20090308536 | METHOD AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING LESS VARIATION IN ELECTRICAL CHARACTERISTICS - A system for manufacturing a semiconductor device that has a gate electrode and a pair of diffusion layers formed in a semiconductor substrate on sides of the gate electrode, the system including structure for forming an insulating film and a gate electrode on a semiconductor substrate, obtaining a thickness of an affected layer formed in a surface of the semiconductor substrate, forming a pair of diffusion layers by injecting an impurity element into the semiconductor substrate in areas flanking the gate electrodes based on a predetermined injection parameter, performing activating heat treatment based on a predetermined heat treatment parameter, and deriving the injection parameter or heat treatment parameter in response to the obtained thickness of the affected layer such that the diffusion layers are set to a predetermined sheet resistance. | 12-17-2009 |
20120208342 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming an isolation region defining an active region in a semiconductor substrate, forming a first insulating film over the semiconductor substrate, forming a second insulating film having etching properties different from those of the first insulating film over the first insulating film, selectively removing the second insulating film from a first region over the active region and the isolation region by dry etching using a fluorocarbon-based etching gas, removing a residual film formed by the dry etching over the first insulating film by exposure in an atmosphere containing oxygen, and selectively removing the first insulating film from the first region by wet etching. | 08-16-2012 |
20120258586 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device has a semiconductor substrate, a plurality of first conductive patterns, a second conductive pattern having a top surface of which stepwisely or gradually decreases in height in a direction from a side facing the first conductive pattern toward an opposite side, a first insulation film formed over the plurality of first conductive patterns and the second conductive pattern, and a third conductive pattern formed over the first insulation film. | 10-11-2012 |
Patent application number | Description | Published |
20090187261 | Control Apparatus for Process input-Output Device - A control apparatus for an input-output device includes a hardware part and a software part, in which a controller in the hardware part carries out a control operation in accordance with a signal from the input-output device, outputs a result of the control operation to a process, and has a timer unit to be excited at a constant period; and the software part has an information process part, a control process part, and an interrupt control unit to switch over the information process part and control process part one another, in which the interrupt control unit suspends an execution of the information process part to execute the control process part in priority and resume the information process part by switching over to the information process part from the control process part, when the execution of the control process part is terminated. | 07-23-2009 |
20090319756 | Duplexed operation processor control system, and duplexed operation processor control method - The present invention provides a duplexed operation processor control system that includes operation processors, an I/O device, and at least one communication path that couples the operation processors to the I/O device, and at least one communication path that couples the operation processors with each other. The duplexed operation processor control system switches over either of the operation processors to be a primary operation processor that executes a control operation for a control target, and the other to be a secondary operation processor that is in a stand-by state, and the secondary operation processor snoops control data synchronously when the primary operation processor acquires the control data from the control target. | 12-24-2009 |
20100050062 | SENDING DEVICE, RECEIVING DEVICE, COMMUNICATION CONTROL DEVICE, COMMUNICATION SYSTEM, AND COMMUNICATION CONTROL METHOD - The system has, provided in a sending device, a generator generating transmission data including data, a data error detection code generated from the data and a safety flag indicating a degree of reliability, and transmission data; has, provided in a receiving device, a plurality of components of extracting transmission data, a safety flag, and a data error detection code from a received frame, and detecting a data error, a comparator comparing the matching of a plurality of received frames, and a selector selecting one received frame, from the frame error detection result, the safety flag, the data error detection result, and the matching comparison result; and determines the validity of transmitted data by the detection corresponding to the degree of reliability set with the safety flag. | 02-25-2010 |
20100174967 | CONTROL APPARATUS AND CONTROL METHOD - A failure is detected immediately and certainly, and continuation of processing in an unstable state is prevented. A first error detection code is generated from first information which is output as a result of execution of a predetermined program conducted by a first processor. A second error detection code is generated from second information which is output as a result of execution of the program conducted by a second processor which is configured so as to output the same computation result as that of the first processor. It is detected whether the first information is the same as the second information, and it is detected whether the first error detection code is the same as the second error detection code. Writing the first information or the second information into a main memory is controlled on the basis of a result of the detection. | 07-08-2010 |
20110022936 | SENDING DEVICE, RECEIVING DEVICE, COMMUNICATION CONTROL DEVICE, COMMUNICATION SYSTEM, AND COMMUNICATION CONTROL METHOD - A receiving device including: a receiver receiving two frames, each including substantially same data attached thereto with a data error detection code, a frame error detection code, and safety flag information indicating a safety function or not, respectively; a first detector connected to the receiver for performing error detection of the frames by use of the frame error detection code, respectively; a second detector connected to the receiver for performing error detection of the data by use of the data error detection code, respectively; and a Direct Memory Access Controller (DMAC) connected to the first and second detectors for outputting one among the data included in the two frames under a condition of the safety function in the two frames when no error is detected in the frame and data error detections. | 01-27-2011 |
20110113277 | PROCESSING UNIT, PROCESS CONTROL SYSTEM AND CONTROL METHOD - A processing unit is connected to another processing unit through a system bus composed of serial signal communication line and synchronization signal communication line to be able to communicate therewith. When an operation unit detects abnormal state in the processing unit, the operation unit supplies notification of detection of the abnormal state to synchronization unit. The synchronization unit transmits the received detection notification of abnormal state to the other processing unit through the synchronization signal communication line. Conversion unit receives parallel communication data from the operation unit through important signal line instead of general signal line and converts the received parallel signal into serial signal to be transmitted to the other processing unit through the serial signal communication line, thereby soundness among processing units connected to the system bus is ensured when the system bus is configured to attain serial communication. | 05-12-2011 |
20110214125 | TASK MANAGEMENT CONTROL APPARATUS AND METHOD HAVING REDUNDANT PROCESSING COMPARISON - An input/output control apparatus including: a unit that controls input/output of data relating to a computation of a plurality of processors in response to an access request from a second input/output unit and an access request from a first input/output unit which requires higher reliability than said second input/output unit, and orders at least one of a plurality of processors to perform a computation relating to the access request from said first input/output unit away from the computation relating to the access request from said second input/output unit in case of that said first input/output unit issued an access request, so that a same computation is made by said plurality of processors; a unit that compares the results of said computations relative to the access request from said first input/output unit provided from said plurality of processors; and a unit that allows the data associated with said computations of said processors to be output on the basis of said compared results. | 09-01-2011 |
20110302393 | CONTROL SYSTEMS AND DATA PROCESSING METHOD - When executing sequential processing such as a ladder logic, converting a program formed of an instruction set of another processor to a program executable by an own processor in software and then conducting processing lowers the real time property. In a control system, a storage unit stores a program for the own processor and a program for another processor. A processor reads data from the storage unit, executes processing described as a program, and gives an instruction to change over a method for acquiring data from the storage unit, to a conversion instruction unit according to data contents. A changeover unit is connected to the storage unit directly or via the conversion unit to change over the data acquiring method according to an instruction from the conversion instruction unit. The conversion unit converts data read from the storage unit to data executable by the processor, according to a conversion scheme. | 12-08-2011 |
20120124268 | CONTROL APPARATUS FOR PROCESS INPUT-OUTPUT DEVICE - A control apparatus for an input-output device includes a hardware part and a software part, in which a controller in the hardware part carries out a control operation in accordance with a signal from the input-output device, outputs a result of the control operation to a process, and has a timer unit to be excited at a constant period; and the software part has an information process part, a control process part, and an interrupt control unit to switch over the information process part and control process part one another, in which the interrupt control unit suspends an execution of the information process part to execute the control process part in priority and resume the information process part by switching over to the information process part from the control process part, when the execution of the control process part is terminated. | 05-17-2012 |
Patent application number | Description | Published |
20110026280 | POWER CONVERSION APPARATUS - The invention relates to a power conversion apparatus including a converter circuit and an inverter circuit. The invention allows more precise output control of the inverter circuit than a power conversion apparatus in which the output control is performed based on a current value only, thereby improving operation efficiency. A current sensor detects input current of the inverter circuit, and a voltage sensor detects input voltage of the inverter circuit. A power value calculator section in an inverter microcomputer obtains a power value based on the input current and the input voltage. The inverter microcomputer and the control microcomputer perform droop control of reducing the output of the inverter circuit to make the power value smaller than a predetermined power value. | 02-03-2011 |
20120068597 | PLASMA DISPLAY PANEL - A plasma display panel has a front plate and a rear plate disposed so as to face the front plate. The front plate includes display electrodes, a dielectric layer formed to coat the display electrodes, and a protective layer formed to coat the dielectric layer. The protective layer includes a base layer formed on the dielectric layer, and a plurality of particles dispersed in the base layer. The base layer has nanocrystalline particles made of magnesium oxide and having an average particle diameter in the range of at least 10 nm to at most 100 nm. The particles are aggregated particles in which a plurality of metal oxide crystal particles are aggregated. The aggregated particles have an average particle diameter at least twice to at most four times as large as a film thickness of the base layer. | 03-22-2012 |
20120068598 | PLASMA DISPLAY PANEL - A plasma display panel is provided with a front plate, and a rear plate disposed so as to face the front plate. The front plate has a display electrode, a dielectric layer to cover the display electrode, and a protective layer to cover the dielectric layer. The protective layer includes a base layer formed on the dielectric layer, and a plurality of aggregated particles dispersed on an entire surface of the base layer. Each of the aggregated particle includes a plurality of crystal particles made of metallic oxide and aggregating to one another. The base film contains MgO, Ce and Ge. In the base layer, a concentration of Ce is at least 200 ppm to at most 500 ppm, and a concentration of Ge is at least 100 ppm to at most 5000 ppm. | 03-22-2012 |
Patent application number | Description | Published |
20090008852 | IMAGE FORMING SYSTEM, POST PROCESSING APPARATUS, SHEET FEED CONTROL METHOD AND SHEET FEED CONTROL PROGRAM - An image forming system comprises: an image forming apparatus and a post processing apparatus that performs a post process on sheets each carrying thereon an image printed by the image forming apparatus. In the image forming system, a sheet feeder feeds sheets of a job to be post-processed to a post processing position; a timing judger judges which is before/after, the first timing to finish feeding the last sheet of the job to the post processing position, or the second timing to finish making preparation for a post process; a delaying time calculator calculates a post process execution delaying time that is a time difference between the first timing and the second timing; and a sheet feed controller controls sheet feed timing of the top sheet of a following job by using the calculated post process execution delaying time, if the second timing is after the first timing. | 01-08-2009 |
20090122365 | DOUBLE-SIDE IMAGE READING DEVICE AND IMAGE FORMING APPARATUS CAPABLE OF EXECUTING READING OF ORIGINAL WITH HIGH THROUGHPUT WHILE TAKING IMAGE QUALITY OF READ ORIGINAL INTO ACCOUNT - Whether it is a double-side original mode is determined. When it is the double-side original mode, whether it is two-in-one printing mode is determined. When it is two-in-one printing mode, sequential reading mode is set. When it is not two-in-one printing mode, whether it is double-side printing and two-point stapling mode is determined. When it is double-side printing and two-point stapling mode, sequential reading mode is set. When it is not double-side printing and two-point stapling mode, whether it is booklet mode is determined. When it is booklet mode, alternate reading mode is set. When it is not booklet mode, concurrent reading mode is set. | 05-14-2009 |
20140319195 | POST-PROCESSING APPARATUS AND IMAGE FORMING SYSTEM - A post-processing apparatus configured to collect printed sheets ejected from an image forming apparatus and to handle the printed sheets. The post-processing apparatus has: a stacker configured to collect and stack a plurality of printed sheets with one end of each of the printed sheets placed down; a movable stopper configured to stop each of the printed sheets sliding down in the stacker at a specified position; a motor configured to move the stopper along the stacker and stops the stopper; and a control unit configured to control the motor. The control unit increases a current supplied to the motor in preparation for a collision between each of the printed sheets and the stopper. | 10-30-2014 |
20150266320 | IMAGE FORMING APPARATUS - An image forming system superposes a plurality of recording sheets on top of another by a predetermined number of sheets and discharges the recording sheets. The image forming system includes a recording sheet conveyor, a recording sheet superposition unit, and a controller. The recording sheet conveyor conveys the recording sheets. The recording sheet superposition unit superposes a preceding recording sheet and a succeeding recording sheet sent from the recording sheet conveyor. The controller controls the recording sheet superposition unit not to superpose the preceding recording sheet and the succeeding recording sheet when the controller refers to recording sheet information of the preceding recording sheet and determines that the preceding recording sheet is a recording sheet of a specified kind. | 09-24-2015 |