Koitabashi, JP
Hiroyoshi Koitabashi, Osaka JP
Patent application number | Description | Published |
---|---|---|
20080199050 | DETECTION DEVICE, METHOD AND PROGRAM THEREOF - A rotational movement component of a camera provided on a mobile object is to be detected in a precise and simple manner. Three motion vectors extracted from the forward images captured by a camera mounted on a vehicle are extracted on a random basis. A temporary rotation angle is calculated using the extracted motion vectors based on a relational expression that represents the relationship between a background vector and the rotation angle of the camera, the relational expression being a linear expression of the yaw angle, pitch angle, and roll angle of the rotational movement of the camera. An error when using the temporary rotation angle is calculated for other motion vectors, and the number of motion vectors for which the error is within a predetermined threshold value is counted. After repeating such a process for a predetermined number of times, the temporary rotation angle with the largest number of motion vectors for which the error is within the predetermined threshold value is selected as the rotation angle of the camera. The present invention can be applied to an in-vehicle obstacle detecting device. | 08-21-2008 |
Hiroyoshi Koitabashi, Nagoya-Shi JP
Patent application number | Description | Published |
---|---|---|
20100232658 | VEHICLE OPERATION CONTROL DEVICE AND METHOD, AS WELL AS, PROGRAM - A similarity degree calculating unit calculates a similarity degree of a feature quantity of a face image of an imaged checking target, and a feature quantity of a face image of a registrant or a non-registrant registered in a registrant information DB or a non-registrant information DB. A check determination unit notifies a service determination unit when the similarity degree is higher than a threshold value. A related information acquiring unit acquires related information including inter-registrant information, and provides to a time-series information DB generation unit and the service determination unit. The time-series information DB generation unit updates the time-series information DB. A statistical information DB generation unit generates the statistical information DB from the time-series information DB. The service determination unit provides services based on the related information, the time-series information DB, and the statistical information DB. | 09-16-2010 |
Hiroyoshi Koitabashi, Kasugai-Shi JP
Patent application number | Description | Published |
---|---|---|
20090189783 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND PROGRAM - An image processing device for performing a process of measuring a distance to a predetermined object using an image imaged by an imaging device attached to a vehicle which moves has a movement detection unit for detecting that the vehicle moved a constant amount from a position where the imaging device imaged a first image, an image acquiring unit for acquiring the first image, and a second image serving as an image at the time of being detected that the vehicle moved a constant amount by the movement detection unit, and a measurement unit for measuring the distance to the object by a movement stereo method using the first image and second image acquired by the image acquiring unit. | 07-30-2009 |
Hiroyuki Koitabashi, Komaki-Shi JP
Patent application number | Description | Published |
---|---|---|
20150222362 | Non-contact connector - A non-contact connector is the solving means that a plurality of new light sources discretely distributed over a circumferential direction are generated from one light source on a rotator, and the lining is performed as the new light source with the characteristic which are not in an original light source. At the time of rotation of the light source, at least one in two or more new light sources maintain connection with an external output terminal and switch the remaining new light sources, so an always-on connection state is secured and the hit of the time-axis of the line signal at the time of an optical path change is avoided. | 08-06-2015 |
Hiroyuki Koitabashi, Komaki JP
Patent application number | Description | Published |
---|---|---|
20090067074 | NON-CONTACT CONNECTOR - A non-contact connector ( | 03-12-2009 |
20090136175 | NON-CONTACT CONNECTOR - A non-contact connector, which has a rotation-side optical element positioned on a rotating body which rotates about a rotation axis, and a fixed-side optical element positioned on a fixed body, and which performs data transmission and reception without contact between the rotation-side optical element and the fixed-side optical element, the non-contact connector further having a reflecting body, which reflects light emitted from the rotation-side optical element or from the fixed-side optical element on the rotation axis; and the reflecting body being a cubic mirror, the outer shape of which is a rectangular parallelepiped, and which is formed by evaporation depositing a thin metal film on one face of one of two rectangular parallelepiped members that are transparent from the visible wavelength range to the infrared wavelength range, and then bonding to the same to the other one of the rectangular parallelepiped members, with the evaporation-deposited film face intervening therebetween. | 05-28-2009 |
20100040378 | NON-CONTACT CONNECTOR - With the light-emitting side focal point F | 02-18-2010 |
Keisuke Koitabashi, Wako-Shi JP
Patent application number | Description | Published |
---|---|---|
20140129087 | MOBILE VEHICLE - In a mobile vehicle | 05-08-2014 |
Keisuke Koitabashi, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20120256590 | BATTERY PACK, ELECTRIC TOOL AND BATTERY CHARGER - A battery pack includes a casing having an opening, an engaging member having a stopper, and a regulating member configured to regulate a movement of the engaging member. The engaging member is supported in a slidable and rotatable manner relative to the casing, and is applied with a biasing force such that the stopper projects from the opening. The regulating member includes a contact portion configured to block a rotation of the engaging member and an operating portion configured to displace the contact portion to release a blocking of the rotation of the engaging member. When the operating portion is a non-operated state, the engaging member is slidable against the biasing force to retract the stopper. When the operating portion is in an operated state, the engaging member is rotatable against the biasing force to retract the stopper. | 10-11-2012 |
Keisuke Koitabashi, Saitama JP
Patent application number | Description | Published |
---|---|---|
20080236914 | SADDLE RIDE, FUEL CELL POWERED VEHICLE - A saddle ride vehicle includes a fuel cell formed in a rectangular, parallelepiped shape disposed below a vehicle seat. The fuel cell is inclined toward a vehicle rear. A pivot shaft is disposed in a range X defined forwardly of a vertex P of a side-view rectangle of the fuel cell, and defined rearwardly of a vertex Q of the side-view rectangle, and is disposed in a range Y defined below the vertex P and defined above the vertex Q. Foot rest parts are disposed between a steering handle and the seat. The fuel cell is disposed on the side of the foot rest parts, so that the center of gravity G | 10-02-2008 |
Kumi Koitabashi, Funabashi JP
Patent application number | Description | Published |
---|---|---|
20110110248 | APPARATUS HAVING PACKET ALLOCATION FUNCTION AND PACKET ALLOCATION METHOD - An allocation execution determiner finds a bias in flow bandwidths allocated to each of physical ports on the basis of a maximum flow bandwidth and an average flow bandwidth reflecting actual traffics, determines high and low in the flow bandwidths, and allocates traffics in such a manner that the traffics become averaged. | 05-12-2011 |
Ryuji Koitabashi, Joetsu-Shi JP
Patent application number | Description | Published |
---|---|---|
20080241751 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized. | 10-02-2008 |
20080274422 | PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION - Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent. | 11-06-2008 |
20100248493 | PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD - A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank. | 09-30-2010 |
20110177464 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized. | 07-21-2011 |
20110294047 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS - A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity. | 12-01-2011 |
20120064438 | PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSURE METHOD, AND DESIGN METHOD OF TRANSITION METAL/SILICON BASE MATERIAL FILM - A photomask blank has a film of a transition metal/silicon base material comprising a transition metal, silicon, oxygen and nitrogen, having an oxygen content of at least 3 atom %, and satisfying the formula: 4×C | 03-15-2012 |
20120251930 | PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK - According to one embodiment, a photomask blank wherein a second film is stacked on a first film, the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing no chromium and which is etchable by dry etching using fluorine and dry etching using oxygen-containing chlorine. | 10-04-2012 |
20130130159 | LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFTONE PHASE SHIFT MASK BLANK - A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a halftone phase shift mask. The mask includes a transparent substrate and a pattern of halftone phase shift film of a material comprising a transition metal, silicon, nitrogen and oxygen and having an atomic ratio (Met/Si) of 0.18-0.25, a nitrogen content of 25-50 atom %, and an oxygen content of 5-20 atom %. The mask may be irradiated with ArF excimer laser light in a cumulative dose of at least 10 kJ/cm | 05-23-2013 |
20130130160 | LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK - A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a photomask. The photomask includes a transparent substrate and a pattern of optical film of a material comprising a transition metal, silicon, nitrogen and oxygen, with contents thereof falling in a specific range. The photomask may be irradiated with ArF excimer laser light in a cumulative dose of at least 10 kJ/cm | 05-23-2013 |
Ryuji Koitabashi, Jyoetsu JP
Patent application number | Description | Published |
---|---|---|
20100009271 | Resist patterning process and manufacturing photo mask - There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the currently existing problems to be solved is the line edge roughness. To solve this problem by an acid-generator and a basic compound, there is a problem of the trade-off relationship with a resolution power. There can be provided a resist composition having a high resolution containing a base polymer such as hydroxystyrene that is protected by an acid labile group, a resist patterning process with a pattern rule of 65 nanometers or less having a reduced line edge roughness. | 01-14-2010 |
Ryuji Koitabashi, Joetsu-Shi, Niigata-Ken JP
Patent application number | Description | Published |
---|---|---|
20080305411 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS - A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity. | 12-11-2008 |
Takatoshi Koitabashi, Gunma JP
Patent application number | Description | Published |
---|---|---|
20090321128 | SHIELD STRUCTURAL BODY, CONNECTOR ASSEMBLY AND CONNECTOR STRUCTURAL BODY HAVING SHIELD STRUCTURAL BODY, CASING ASSEMBLY, AND ELECTRIC COMPRESSOR - Disclosed are a shield structural body, a connector assembly and connector structural body using the shield structural body, a casing assembly having the connector assembly, and an electric compressor having the casing assembly. The shield structural body is formed of an electrically conductive material and has a tube section, a ground electrode terminal formed electrically integrally with the tube section, claw sections integrally formed with the tube section, projected at least either radially outward or inward from the tube section, and engageable with a shield structural body holding member. The shield structural body can be produced at low cost, the connector assembly can provide high productivity and can be produced at low cost, the connector structural body is highly reliable, the casing assembly using the connector assembly is highly versatile, and the electric compressor having the casing assembly can easily cope with model changes. | 12-31-2009 |
Yoshitaka Koitabashi, Saitama JP
Patent application number | Description | Published |
---|---|---|
20090068047 | Closed Type Fluid Machine - An electric scroll compressor ( | 03-12-2009 |
20090148314 | Scroll Fluid Machine - An electric motor-driven scroll compressor as a fluid machine includes a housing ( | 06-11-2009 |
Yusuke Koitabashi, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100105429 | MOBILE TERMINAL APPARATUS, FUNCTION STARTING METHOD AND PROGRAM THEREOF - The mobile terminal apparatus that includes a first housing and a second housing includes a function setting unit that associates a predetermined function with each inclination of a body of the mobile terminal apparatus and previously sets the predetermined function; an opening/closing state detecting unit that detects that any one of the first housing and the second housing is operated and enters in an opened state or a closed state; an inclination detecting unit that detects the inclination of the body of the mobile terminal apparatus, when the opened state is detected by the opening/closing state detecting unit; and a function starting unit that starts the predetermined function previously set by the function setting unit, based on the inclination that is detected by the inclination detecting unit. | 04-29-2010 |