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Kenji Yamamoto, Kobe-Shi JP

Kenji Yamamoto, Kobe-Shi JP

Patent application numberDescriptionPublished
20080220109MOLDING TOOL - A molding tool has a base surface hard to be roughened by an etching process for removing a worn DLC film. The molding tool is provided with an intermediate film coating a base surface of the molding tool, and a diamondlike carbon film coating the intermediate film. The intermediate film is formed of a material having a composition represented by (Cr09-11-2008
20080318013HARD FILMS, MULTILAYER HARD FILMS, AND PRODUCTION METHODS THEREOF - A hard film contains [(Nb12-25-2008
20090014066Thin-Film Photoelectric Converter - The present invention provides a three-junction thin-film photoelectric converter having high conversion efficiency at low cost by improving the film quality of the crystalline silicon photoelectric conversion layer and improving the light trapping effect.01-15-2009
20090068478HARD COATING FILM, MATERIAL COATED WITH HARD COATING FILM, AND DIE FOR COLD PLASTIC WORKING - Disclosed herein are a hard coating film, a material coated with the hard coating film, and a die for cold plastic working, the coating film excelling conventional surface coating layers in wear resistance as well as slidability with a low frictional coefficient.03-12-2009
20090130460WEAR-RESISTANT MEMBER WITH HARD COATING - A member with alumina-based hard coating formed there-on wherein said hard coating contains nitrogen and has a composition represented by the formula (1) below:05-21-2009
20090136727HARD COATING EXCELLENT IN WEAR RESISTANCE AND IN OXIDATION RESISTANCE AND TARGET FOR FORMING THE SAME - A hard coating superior in wear resistance and in oxidation resistance and also a hard coating superior in high-temperature anti-friction performance and oxidation resistance over the conventional coating film are provided.05-28-2009
20090142509HARD COATING EXCELLENT IN SLIDING PROPERTY AND METHOD FOR FORMING SAME - Disclosed is a hard coating excellent in wear resistance, insusceptible to seizure, and excellent sliding property even after use over the long term, and a method capable of forming the hard coating excellent in sliding property in a short time. The hard coating is a hard coating expressed by chemical formula M06-04-2009
20090169847HARD FILMS AND SPUTTERING TARGETS FOR THE DEPOSITION THEREOF - For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr07-02-2009
20090186206DIAMOND-LIKE CARBON FILM FOR SLIDING PARTS AND METHOD FOR PRODUCTION THEREOF - A diamond-like carbon film for sliding parts which is applied to the sliding surface of sliding parts, the diamond-like carbon film including at least two layers, one being a lower layer of diamond-like carbon (referred to as DLC hereinafter) and the other being an upper layer of DLC placed thereon, wherein the lower layer has a hardness no lower than 20 GPa and no higher than 45 GPa, a Young's modulus no lower than 250 GPa and no higher than 450 GPa, and a thickness no smaller than 0.2 μm and no larger than 4.0 μm, and the upper layer has a hardness no lower than 5 GPa and lower than 20 GPa, a Young's modulus no lower than 60 GPa and no higher than 240 GPa, and a thickness no smaller than 1.0 μm and no larger than 10 μm. The diamond-like carbon film has both good durability and low frictional coefficient.07-23-2009
20090246497HARD COATING FILM - Disclosed herein is a hard coating film of laminate type which comprises more than one layer of a first kind, which has a composition represented by the formula (1a) below and a thickness of 1 to 80 nm, and more than one layer of a second kind, which has a composition represented by the formula (2a) below and a thickness of 1 to 80 nm, the layers being placed alternately one over another.10-01-2009
20090269614HARD COATING FILM AND TARGET FOR FORMATION THEREOF - A hard coating film having oxidation resistance and wear resistance superior to those of conventional coating films formed of TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, NbCrAlSiBN, or the like. The hard coating film of the present invention has a component composition represented by the formula:10-29-2009
20090317659HARD FILM-COATED MEMBER AND JIG FOR MOLDING - There are provided a hard film-coated member excellent in wear resistance and adhesion, and a jig for molding. The hard film-coated member includes: a base material including an iron base alloy containing Cr; a first film layer formed with a film thickness of 1 to 10 μm on the surface of the base material; and a second film layer formed with a film thickness of 2 to 10 μm on the surface of the first film layer. The first film layer includes Cr12-24-2009
20100038232HARD COATING, TARGET FOR FORMING HARD COATING, AND METHOD FOR FORMING HARD COATING - The present invention attempts to provide a hard coating which has excellent hardness and lubricity. Such attempt has been completed by providing a hard coating comprising02-18-2010
20100047545MATERIAL WITH HARD COATING FILM FORMED ON SUBSTRATE SURFACE THEREOF - There is provided a hard-coated material in which a substrate thereof is coated with a hard coating film that is excellent in wear resistance and also excellent in film removability to allow easy removal thereof once damaged or worn for the purpose of recycled use of the substrate. The hard coating film formed on the substrate comprises a layer-A and a layer-B; wherein the layer-A has a component composition represented by the formula Ti02-25-2010
20100089615TRANSPARENT ELECTROCONDUCTIVE FILM AND PROCESS FOR PRODUCING THE SAME - In a transparent electroconductive film including a transparent substrate and a transparent electroconductive oxide layer disposed on the transparent substrate, when the transparent electroconductive oxide layer is composed of zinc oxide, the surface resistivity of the transparent electroconductive oxide layer increases with time and thus it has been difficult to obtain a transparent electroconductive film stable against an environmental variation. Consequently, hard carbon films are provided on the surfaces of a transparent electroconductive oxide layer including at least one layer and containing zinc oxide as a main component in “the order of transparent substrate-hard carbon film-transparent electroconductive oxide layer-hard carbon film” or “the order of hard carbon film-transparent substrate-transparent electroconductive oxide layer-hard carbon film”. Alternatively, an organosilicon compound covering layer is provided on a surface of the transparent electroconductive oxide layer. Thereby, the water contact angle can be 75 degrees or more, and an increase in the resistivity of the transparent electroconductive oxide layer can be suppressed.04-15-2010
20100215975HARD COATING FILM, METHOD OF FORMATION THEREOF, AND MATERIAL COATED WITH HARD COATING FILM - A hard coating film having wear resistance superior to conventional TiAlN coating films, oxide coating films, and the like. The hard coating film of the present invention has a component composition represented by one of the following two formulas:08-26-2010
20100247885LAMINATED FILM AND LAMINATED FILM-COATED MEMBER - A laminated film is provided which exhibits excellent durability even when formed over a surface of a member (in particular, sliding member) to be used under a high pressure of contacted surface of 2.0 GPa or more. The laminated film includes an intermediate layer which contains one or more compounds selected from the group consisting of a carbide, a boride, and a boron carbide compound of a metal element, and which has a hardness measured by a nanoindentation method (hereinafter referred to as a “nanoindentation hardness”) of not less than 20 GPa nor more than 35 GPa and a thickness of not less than 5 μm nor more than 10 μm, and a diamond-like carbon film which is formed over the intermediate layer, and which has a nanoindentation hardness of not less than 25 GPa nor more than 35 GPa and a thickness of not less than 0.3 μm nor more than 1.0 μm.09-30-2010
20110067151CONTACT PROBE PIN FOR SEMICONDUCTOR TEST APPARATUS - It is an object to provide a contact probe pin for a semiconductor test apparatus, including an amorphous carbon type conductive film formed on the probe pin base material surface. The conductive film is excellent in tin adhesion resistance of preventing tin which is the main component of solder from adhering to the contact part of the probe pin during contact between the probe pin and solder. The contact probe pin for a semiconductor test apparatus, includes an amorphous carbon type conductive film formed on the conductive base material surface. The amorphous carbon type conductive film has an outer surface with a surface roughness (Ra) of 6.0 nm or less, a root square slope (RΔq) of 0.28 or less, and a mean value (R) of curvature radii of concave part tips of the surface form of 180 nm or more, in a 4-μm03-17-2011
20110079069HARD FILM, PLASTIC WORKING DIE, PLASTIC WORKING METHOD, AND TARGET FOR HARD FILM - There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (Ti04-07-2011
20110163448SUBSTRATE HAVING A TRANSPARENT ELECTRODE AND METHOD FOR PRODUCING THE SAME - A zinc oxide transparent electroconductive oxide has been difficult to use as a substrate having a transparent electrode because the oxide, when configured as a thin film, because of increased resistivity due to air and/or moisture exposure. Though doping can inhibit increase of resistance to some extent, there has been difficulty in selecting a type and an amount of a doping substance and because doping causes high initial resistance. A substrate having a transparent electrode with stable resistivity against various environments is produced by a magnetron sputtering method using a target composed of a zinc oxide transparent electroconductive oxide containing 0.50 to 2.75% silicon dioxide by weight relative to the oxide.07-07-2011
20110197786HARD-COATING-COATED MEMBER, TOOL, AND TARGET - A member covered with a hard coating having good wear resistance, a tool using the member, and a target for forming the hard coating are provided. A hard-coating-coated member has a hard coating on a substrate, in which the hard coating has a composition of (Ti08-18-2011
20120115760HARD COATING FILM, MATERIAL COATED WITH HARD COATING FILM, AND DIE FOR COLD PLASTIC WORKING - Disclosed herein are a hard coating film, a material coated with the hard coating film, and a die for cold plastic working, the coating film excelling conventional surface coating layers in wear resistance as well as slidability with a low frictional coefficient.05-10-2012
20120131980MOLD FOR PLASTIC FORMING AND A METHOD FOR PRODUCING THE SAME, AND METHOD FOR FORGING ALUMINUM MATERIAL - A mold for plastic forming having excellent seizure resistance controlled by adjusting its surface properties. In addition, a process producing the mold, that includes: roughening a surface of a base material by a shot blast method to adjust its arithmetic averaged roughness Ra: higher than 1 μm but 2 μm or lower; polishing the surface of the base material to adjust its skewness Rsk to 0 or lower while retaining Ra: 0.3 μm or higher; and forming a hard film on the surface of the base material where the surface of the hard film has an arithmetic averaged roughness Ra: 0.3 μm or higher but 2 μm or lower and skewness Rsk: 0 or lower. Adjusting the surface of the mold to have a non-concave-biased configuration, limits the capacity for concaves to accumulate lubricant, such that the lubricant is sufficiently deposited on the surfaces of the convexes.05-31-2012
20130020195VACUUM DEPOSITION APPARATUS - Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.01-24-2013
20130098881ARC EVAPORATION SOURCE HAVING FAST FILM-FORMING SPEED, COATING FILM MANUFACTURING METHOD AND FILM FORMATION APPARATUS USING THE ARC EVAPORATION SOURCE - An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.04-25-2013
20130105310FILM FORMATION APPARATUS AND FILM FORMATION METHOD05-02-2013
20130256130HARD FILM, PLASTIC WORKING DIE, PLASTIC WORKING METHOD, AND TARGET FOR HARD FILM - There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (Ti10-03-2013
20130309522SLIDING MEMBER AND METHOD FOR MANUFACTURING THE SAME - Provided is a sliding member having slidability and abrasion resistance both at satisfactory levels. This sliding member has a sliding surface including a base and a filling part. The base includes a first material and bears regularly arranged concavities. The filling part includes a second material and is arranged in the sliding surface to fill the concavities. The first material includes one selected from the group consisting of a metallic material, a ceramic material, and a carbonaceous material. The second material includes at least one selected from the group consisting of a metallic material, a ceramic material, and a carbonaceous material. The first and second materials differ from each other in at least one of frictional coefficient and hardness. The base and the filling part are substantially flush with each other in the sliding surface.11-21-2013
20130327642ARC EVAPORATION SOURCE - An arc evaporation source (12-12-2013
20140004362HARD COATING FILM, MATERIAL COATED WITH HARD COATING FILM AND DIE FOR COLD PLASTIC WORKING AND METHOD FOR FORMING HARD COATING FILM01-02-2014
20140023740PRESS-FORMING MOLD AND METHOD FOR MANUFACTURING PROTECTIVE FILM FOR PRESS-FORMING MOLD - A press-forming mold has a protective film for preventing seizing during press-forming formed on at least a forming surface that comes into contact with a formed body. The protective film is formed by PVD. An arbitrary selection section extracted from the surface of the protective film is divided into a plurality of individual sections; and, when the gradient of the surface at the n01-23-2014
20140200132MEMBER COVERED WITH HARD COATING - A member covered with a hard coating according to the present invention has a hard coating which has excellent erosion resistance, a hardness (H) of 20 GPa or more as measured using a nano indenter and a ratio of the hardness (H) to a Young's modulus (E) (i.e., H/E) of 0.06 or more, and comprises Ti and/or Cr, Al and N, wherein the total amount of Ti and Cr relative to the total amount of elements other than non-metal elements in the coating is 0.1 to 0.6 inclusive in terms of atomic ratio and the amount of Al relative to the total amount of the elements other than the non-metal elements in the coating is 0.4 to 0.7 inclusive in terms of atomic ratio.07-17-2014

Patent applications by Kenji Yamamoto, Kobe-Shi JP

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