Keihl
John Keihl, Versailles, OH US
Patent application number | Description | Published |
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20100038033 | ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS - A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots. | 02-18-2010 |
20120193449 | Anchoring Inserts, Electrode Assemblies, and Plasma Processing Chambers - A showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque-receiving slots. | 08-02-2012 |
Jon Keihl, Versailles, OH US
Patent application number | Description | Published |
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20090095424 | SHOWERHEAD ELECTRODE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME - The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement. | 04-16-2009 |
20100308018 | EDM ELECTRODE GUIDE - In accordance with one embodiment of the present disclosure, an electrical discharge machine is provided comprising an EDM electrode, an electrode holder, and an electrode guide. The electrode guide comprises an internal passage profile that transitions along the machining axis from a substantially circular cross section comprising a diameter d2 to an apexed cross section. The EDM electrode extends from the electrode holder through the electrode entrance aperture of the electrode guide and out of the electrode exit aperture of the electrode guide. The apexed cross section of the electrode guide is aligned relative to the circular cross section of the electrode guide such that apexes of the electrode exit aperture lie outside of a circumferential portion of the circular cross section. A restricted circumferential portion defined by the apexed cross section comprises a diameter that is greater than the effective electrode diameter. Additional embodiments are disclosed and claimed. | 12-09-2010 |
20120160941 | SHOWERHEAD ELECTRODES - A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode. | 06-28-2012 |
Jon Keihl, Versailes, OH US
Patent application number | Description | Published |
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20090126633 | ELECTRODE/PROBE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME - The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body. | 05-21-2009 |
Jonathan J. Keihl, Versailles, OH US
Patent application number | Description | Published |
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20100089876 | EDM SPINDLE ASSEMBLY WITH FLUID SEAL - An EDM spindle assembly is provided comprising a pull stud, an electrode holder, a fluid seal, and a seal holder. The electrode holder comprises a tail end, a nose end, and an electrode accommodating passage. A counter bore comprising a threaded inside diameter is formed in the tail end of the electrode holder. The seal holder comprises a threaded outside diameter, a tail end, a nose end, and an electrode accommodating passage. The seal accommodating space is formed in the tail end of the seal holder. The threaded outside diameter of the seal holder is suitable for threaded engagement with the threaded inside diameter of the counter bore. The pull stud comprises a threaded outside diameter, a tail end, a nose end, and an electrode accommodating passage. The threaded outside diameter of the pull stud is suitable for threaded engagement with the threaded inside diameter of the counter bore. The threaded inside diameter of the counter bore in the electrode holder comprises a longitudinal threading dimension that is sufficient to accommodate the entire longitudinal threaded outside diameter of the seal holder and a significant portion of the longitudinal threaded outside diameter of the pull stud, with the fluid seal positioned in the seal accommodating space. | 04-15-2010 |