Patent application number | Description | Published |
20100031833 | IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - There is provided an imprint apparatus configured to perform an imprint in which a resin on a substrate is molded using a mold and a pattern is formed on the substrate. The apparatus includes a press unit configured to press the resin on the substrate and the mold to each other, a cure unit configured to irradiate light to the resin molded by the mold to cure the resin, and a movement unit configured to move the mold and the substrate, from a position at which the press is performed by the press unit to a position at which the light is irradiated by the cure unit, and from the position at which the light is irradiated by the cure unit to a position at which the mold is released. | 02-11-2010 |
20100052217 | IMPRINTING APPARATUS AND ARTICLE MANUFACTURING METHOD - The imprint apparatus presses resin disposed on a substrate and a mold to each other to form a resin pattern on the substrate. The apparatus includes a driving device configured to move the mold and the substrate relatively to apply a pressing force between the mold and the resin, a measuring device configured to measure a position of at least one of the mold and the substrate, a detector configured to detect the pressing force, and a controller configured to control the driving device. The controller is configured to control the driving device using the position as a controlled variable in a first period, and to control the driving device using the pressing force as a controlled variable in a second period after the first period. | 03-04-2010 |
20100059904 | IMPRINT APPARATUS - An imprint apparatus is configured to mold a resin on a substrate by using a mold and to form a pattern of the resin on the substrate. The imprint apparatus includes a holder configured to hold the substrate, the holder having a groove, an exhaust device configured to exhaust a gas in the groove so that the hold can hold the substrate by setting a pressure in the groove to a negative pressure, a supply device configured to supply the gas to the groove, and a controller configured to control the supply device so as to set the pressure in the groove to a positive pressure during molding. | 03-11-2010 |
20100072649 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus molds resin dispensed on a shot region of a substrate with a mold and forms a pattern of resin on the shot region. The apparatus includes a mold stage configured to hold the mold, a substrate stage configured to hold the substrate, a drive mechanism configured to change a relative positional relationship between the mold stage and the substrate stage in an X-Y plane that defines a coordinate of the shot region and a Z-axis direction perpendicular to the X-Y plane, and a controller. The controller is configured to control the drive mechanism so that the mold and the shot region perform relative vibration, in the X-Y plane, with respect to a relative position where the mold and the shot region align, and a distance between the mold and the shot region decreases in the Z-axis direction in parallel with the vibration, and the resin is molded by the mold. | 03-25-2010 |
20100148397 | IMPRINTING MACHINE AND DEVICE MANUFACTURING METHOD - An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object. | 06-17-2010 |
20100270705 | IMPRINT METHOD AND IMPRINT APPARATUS - An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step. | 10-28-2010 |
20100289190 | PROCESSING APPARATUS AND METHOD - A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist. | 11-18-2010 |
20110261448 | HOLDING APPARATUS, OPTICAL APPARATUS, AND TELESCOPE - The present invention provides a holding apparatus for holding an optical element with an edge whose thickness increases or decreases inwardly, the apparatus including a barrel having an internal diameter larger than an external diameter of the optical element, a support configured to support and position the optical element relative to the barrel via a first surface of the edge in a direction of an axis of the barrel, and a restriction device including a regulation member which faces a second surface of the edge opposite to the first surface in the direction of the axis, is apart from the second surface if an amount of decentering of the optical element is less than a predetermined amount within a tolerance, and contacts with the second surface if the amount of decentering reaches the predetermined amount, and configured to restrict decentering of the optical element. | 10-27-2011 |
20130196016 | IMPRINT APPARATUS IN WHICH ALIGNMENT CONTROL OF A MOLD AND A SUBSTRATE IS EFFECTED - An imprint apparatus performs alignment control of a mold and a substrate. A pattern formed on the mold is transferred onto a pattern forming layer on the substrate. A mold holding portion holds the mold, a substrate holding portion holds the substrate, and a control portion effects control so that the mold and the substrate are brought near to each other during the alignment control. The mold and the pattern forming layer are brought into contact with each other and then the pattern forming layer is cured. The control portion changes a driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the pattern forming layer. The driving profile used to move at least one of the mold holding portion and the substrate holding portion to a target position, and includes at least one of acceleration, speed, driving voltage, and driving current. | 08-01-2013 |
20140151936 | PATTERN TRANSFERRING APPARATUS AND PATTERN TRANSFERRING METHOD - A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area. | 06-05-2014 |