Patent application number | Description | Published |
20090083771 | Loading mechanism and disc player using the loading mechanism - A loading mechanism ( | 03-26-2009 |
20110244131 | METHOD AND APPARATUS FOR TEMPLATE SURFACE TREATMENT, AND PATTERN FORMING METHOD - According to an embodiment, a template surface treatment method includes hydroxylating the surface of a template having an uneven pattern surface or absorbing water onto the surface to distribute OH radicals on the surface, and coupling a coupling agent onto the template surface on which the OH radicals are distributed. These processes are performed in an environment in which amines are controlled to be in a predetermined concentration or less. | 10-06-2011 |
20120007276 | IMPRINT TEMPLATE, METHOD FOR MANUFACTURING IMPRINT TEMPLATE, AND PATTERN FORMATION METHOD - According to one embodiment, an imprint template includes a base substrate and a resin-based pattern transfer portion. The pattern transfer portion is formed on a major surface of the base substrate and includes a protrusion-depression pattern. A shape of the protrusion-depression pattern is transferred to a transfer target. The protrusion-depression portion is provided at the major surface of the base substrate. A major surface side of the pattern transfer portion is provided so as to fit into a depression of the protrusion-depression portion. In another embodiment, a pattern formation method is disclosed. The method can include providing the transfer target on the substrate, and using the imprint template to bring the pattern into contact with the transfer target. In addition, the method can include curing the transfer target and then releasing the imprint template from the transfer target to transfer the shape of the pattern to the transfer target. | 01-12-2012 |
20120241409 | PATTERN FORMATION METHOD - In accordance with an embodiment, a pattern formation method includes: forming, on a first substrate, a fabrication target film having first and second regions; selectively applying, onto the first region a self-assembly material of a plurality of components that are phase-separable by a thermal treatment; baking the self-assembly material to phase-separate the self-assembly material into the components; removing any one of the components to form a first pattern; applying a curable resin onto the second region of the fabrication target film; bringing a dented second substrate corresponding to an arbitrary pattern closer to and into contact with the curable resin so that the second substrate faces the curable resin; curing the curable resin; detaching the second substrate from the curable resin to form a second pattern in the curable resin; and using the first and the second patterns as masks to fabricate the fabrication target film. | 09-27-2012 |
20120244286 | PATTERN FORMING METHOD - A pattern forming method includes the steps of: forming a pattern transfer layer on a process target film; bringing a mold into contact with the pattern transfer layer, the mold having a predetermined relief pattern on a surface thereof and including a porous layer formed on the surface and impregnated with a release agent; curing the pattern transfer layer in a state where the mold is in contact with the patter transfer layer; and releasing the mold from the pattern transfer layer. A low dielectric constant insulating film or amorphous carbon, for example, is used as the porous layer. | 09-27-2012 |
20140057443 | PATTERN FORMING METHOD - According to one embodiment, a pattern forming method includes forming a physical guide including a first predetermined pattern in a first region on a to-be-processed film, and a second predetermined pattern in a second region on the to-be-processed film, forming a block copolymer in the physical guide, forming a self-assembled phase including a first polymer portion and a second polymer portion by causing microphase separation of the block copolymer, removing the second polymer portion, and processing the to-be-processed film, with the physical guide and the first polymer portion serving as a mask. A pattern height of the first predetermined pattern is greater than a pattern height of the second predetermined pattern. | 02-27-2014 |
20140248439 | PATTERN FORMATION METHOD - According to one embodiment, a pattern formation method includes coating a polymer material on a film to be processed, the polymer material having a first segment and a second segment, the second segment containing a functional group that causes a cross-linking reaction, performing microphase separation of the polymer material to form a self-assembly pattern having a first polymer portion that contains the first segment and a second polymer portion that contains the second segment, performing irradiation with energy rays toward the self-assembly pattern in a cooling state; and selectively removing the first polymer portion. | 09-04-2014 |
20150132964 | Method of Patterning - In a patterning method according to the present embodiment, a guide pattern is formed on a processing target film. The guide pattern is configured by concave portions and convex portions extending in a predetermined direction. A block copolymer layer is formed on the guide pattern. The block copolymer layer contains at least two block chains. A layer of microphase-separated structures is formed on the concave portions and the convex portions, respectively, by microphase-separating the block copolymer layer. The processing target film is formed into predetermined patterns by selectively removing the processing target film. At least a part of the block copolymer layer is used as a mask. | 05-14-2015 |