Katsuhiro Kobayashi
Katsuhiro Kobayashi, Kodaira-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100121528 | DUMPER - In order to further improve driving stability, a dumper | 05-13-2010 |
Katsuhiro Kobayashi, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20100110223 | HEAD SEPARATED CAMERA AND CAMERA HEAD - A camera head ( | 05-06-2010 |
| 20130281428 | Pyridone Derivatives - Novel compounds or salts thereof, or crystals thereof, which inhibit Axl and are useful for treating diseases caused by Axl hyperfunction, diseases associated with Axl hyperfunction and/or diseases accompanied by Axl hyperfunction are provided. Pyridone derivatives represented by the formula (1) having various substituents or salts thereof, or crystals thereof (where R | 10-24-2013 |
Katsuhiro Kobayashi, Shizuoka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090270846 | CATHETER, EXAMINATION SYSTEM AND THROMBUS REMOVING DEVICE - The position of a metal marker | 10-29-2009 |
Katsuhiro Kobayashi, Joetsu-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080254386 | Positive resist composition and patterning process - A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.1 | 10-16-2008 |
| 20080318160 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process - Sulfonate salts have the formula: | 12-25-2008 |
| 20090035699 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS - Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R | 02-05-2009 |
| 20090053657 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION - A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern surface coating composition comprising a hydroxyl-containing crosslinkable polymer onto the first resist pattern and crosslinking, thereby covering the first resist pattern with a crosslinked polymer film, applying a second positive resist composition thereon, heat treating, exposing, heat treating, and developing to form a second resist pattern. | 02-26-2009 |
| 20090233242 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - Lactone-containing compounds having formula (1) are novel wherein R | 09-17-2009 |
| 20110160481 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS - Sulfonate salts have the formula: HOCH | 06-30-2011 |
Katsuhiro Kobayashi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090170826 | Acid Addition Salt of Optically Active Dihydropyridine Derivative - There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of (R)-2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenyl-methylazetidin-3-yl) ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like. | 07-02-2009 |
| 20090170827 | Acid Addition Salt of Dihydropyridine Derivative - There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of 2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenylmethylazetidin-3-yl)ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like. | 07-02-2009 |
Katsuhiro Kobayashi, Jyoetsu JP
| Patent application number | Description | Published |
|---|---|---|
| 20130045444 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a positive resist composition comprising (A) a resin having repeating units shown by the following general formulae (1) and (2) as repeating units that contain acid labile groups and being capable of increasing its alkaline solubility by an acid, (B) a photoacid generator, (C) a compound shown by the following general formula (3), and (D) a solvent. There can be a positive resist composition having high resolution, and at the same time giving an excellent pattern profile; and a patterning process in which an immersion lithography is carried out using a formed top coat. | 02-21-2013 |