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Katsuhiro Kobayashi

Katsuhiro Kobayashi, Kodaira-Shi JP

Patent application numberDescriptionPublished
20100121528DUMPER - In order to further improve driving stability, a dumper 05-13-2010

Katsuhiro Kobayashi, Kanagawa JP

Patent application numberDescriptionPublished
20100110223HEAD SEPARATED CAMERA AND CAMERA HEAD - A camera head (05-06-2010
20130281428Pyridone Derivatives - Novel compounds or salts thereof, or crystals thereof, which inhibit Axl and are useful for treating diseases caused by Axl hyperfunction, diseases associated with Axl hyperfunction and/or diseases accompanied by Axl hyperfunction are provided. Pyridone derivatives represented by the formula (1) having various substituents or salts thereof, or crystals thereof (where R10-24-2013

Katsuhiro Kobayashi, Shizuoka JP

Patent application numberDescriptionPublished
20090270846CATHETER, EXAMINATION SYSTEM AND THROMBUS REMOVING DEVICE - The position of a metal marker 10-29-2009

Katsuhiro Kobayashi, Joetsu-Shi JP

Patent application numberDescriptionPublished
20080254386Positive resist composition and patterning process - A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.110-16-2008
20080318160Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process - Sulfonate salts have the formula:12-25-2008
20090035699FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS - Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R02-05-2009
20090053657PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION - A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern surface coating composition comprising a hydroxyl-containing crosslinkable polymer onto the first resist pattern and crosslinking, thereby covering the first resist pattern with a crosslinked polymer film, applying a second positive resist composition thereon, heat treating, exposing, heat treating, and developing to form a second resist pattern.02-26-2009
20090233242LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - Lactone-containing compounds having formula (1) are novel wherein R09-17-2009
20110160481NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS - Sulfonate salts have the formula: HOCH06-30-2011

Patent applications by Katsuhiro Kobayashi, Joetsu-Shi JP

Katsuhiro Kobayashi, Tokyo JP

Patent application numberDescriptionPublished
20090170826Acid Addition Salt of Optically Active Dihydropyridine Derivative - There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of (R)-2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenyl-methylazetidin-3-yl) ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like.07-02-2009
20090170827Acid Addition Salt of Dihydropyridine Derivative - There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of 2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenylmethylazetidin-3-yl)ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like.07-02-2009

Patent applications by Katsuhiro Kobayashi, Tokyo JP

Katsuhiro Kobayashi, Jyoetsu JP

Patent application numberDescriptionPublished
20130045444POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a positive resist composition comprising (A) a resin having repeating units shown by the following general formulae (1) and (2) as repeating units that contain acid labile groups and being capable of increasing its alkaline solubility by an acid, (B) a photoacid generator, (C) a compound shown by the following general formula (3), and (D) a solvent. There can be a positive resist composition having high resolution, and at the same time giving an excellent pattern profile; and a patterning process in which an immersion lithography is carried out using a formed top coat.02-21-2013
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