Patent application number | Description | Published |
20090171507 | GASKET TYPE ORIFICE AND PRESSURE TYPE FLOW RATE CONTROL APPARATUS FOR WHICH THE ORIFICE IS EMPLOYED - An orifice changeable pressure type flow rate control apparatus comprises a valve body of a control valve for a pressure type flow rate control apparatus installed between an inlet side fitting block provided with a coupling part of a fluid supply pipe and an outlet side fitting block provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body and the inlet side fitting block, and a fluid outlet side of the valve body and the outlet side fitting block are detachably and hermitically connected respectively so a flow passage for gases through the control valve is formed; and, a gasket type orifice for a pressure type flow rate control apparatus is removably inserted between a gasket type orifice insertion hole provided on the outlet side of the valve body and a gasket type orifice insertion hole of the outlet side fitting block. | 07-02-2009 |
20090292399 | METHOD FOR DETECTING MALFUNCTION OF VALVE ON THE DOWNSTREAM SIDE OF THROTTLE MECHANISM OF PRESSURE TYPE FLOW CONTROL APPARATUS - With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value. | 11-26-2009 |
20100012026 | EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH - An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G | 01-21-2010 |
20100127196 | PIEZOELECTRIC DRIVEN CONTROL VALVE - Stable flow control is made possible even under high-temperature environments by relieving tensional force applied to a piezoelectric element when a piezoelectric actuator is retracted. Thus, a piezoelectric driven control valve includes: a body having a valve seat; a metal diaphragm to contact with and separate from the valve seat; an actuator box supported ascendably and descendably on the body; a split base fixed to the body; a disc spring pressing and urging the actuator box downward to bring the metal diaphragm into contact with the valve seat; and a piezoelectric actuator housed inside the actuator box and that extends upward with application of voltage to press the actuator box upward against the elastic force of the disc spring, and a precompression mechanism, for applying a compression force constantly to piezoelectric elements in the piezoelectric actuator, provided between the split base and the piezoelectric actuator. | 05-27-2010 |
20100139775 | FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow control device enabling a reduction in size and an installation cost by accurately controlling the flow of a fluid in a wide flow range. Specifically, the flow of the fluid flowing in an orifice ( | 06-10-2010 |
20100192854 | GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES - A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero. | 08-05-2010 |
20100229976 | FLOW RATE RATIO VARIABLE TYPE FLUID SUPPLY APPARATUS - A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q | 09-16-2010 |
20100294964 | NORMALLY OPEN TYPE PIEZOELECTRIC ELEMENT DRIVEN METAL DIAPHRAGM CONTROL VALVE - A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable. | 11-25-2010 |
20110042595 | PIEZOELECTRIC ELEMENT DRIVEN METAL DIAPHRAGM CONTROL VALVE - A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable. | 02-24-2011 |
20110100483 | GAS SUPPLY APPARATUS EQUIPPED WITH VAPORIZER - An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device. | 05-05-2011 |
20110108138 | PRESSURE CONTROL VALVE DRIVING CIRCUIT FOR PRESSURE TYPE FLOW RATE CONTROL DEVICE WITH FLOW RATE SELF-DIAGNOSIS FUNCTION - A pressure control valve piezoelectric element driving circuit is provided for a pressure type flow rate control device provided with a flow rate self-diagnosis function for comparing initial pressure drop characteristics data measured and with pressure drop characteristics data in a flow rate diagnosis which are measured under conditions that are the same for both measurements to detect malfunction in flow rate control from a difference between both characteristics data, wherein a first discharge circuit slowly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a step-down command signal from a CPU, through a step-down command circuit to step down the voltage, and a second discharge circuit that rapidly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a high-speed step-down command signal from the CPU, through a high-speed step-down command circuit to step down the voltage. | 05-12-2011 |
20110120566 | DISCONTINUOUS SWITCHING FLUID FLOW RATE CONTROL METHOD USING PRESSURE TYPE FLOW RATE CONTROL DEVICE - A fluid flow rate control method is provided that uses a flow rate range variable type pressure type flow rate control device provided with at least two or more parallel fluid passages disposed between the downstream side of a control valve of the control device and a fluid supply pipe passage, and orifices having different fluid flow rate characteristics are respectively interposed in parallel fluid passages to pass fluid in a first flow rate region through one orifice for flow rate control, and to pass fluid in a second flow rate region through at least another orifice for flow rate control. Flow rate characteristics of the respective orifices are selected so that a maximum controllable flow rate of fluid in the first flow rate region at low flow rate is smaller than 10% of a maximum controllable flow rate in the second flow rate region at high flow rate. | 05-26-2011 |
20110139271 | AUTOMATIC PRESSURE REGULATOR FOR FLOW RATE REGULATOR - The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P | 06-16-2011 |
20120273061 | Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device - A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer. | 11-01-2012 |
20130220451 | FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP | 08-29-2013 |
20140124064 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS - A raw material vaporizing and supplying apparatus includes a carrier gas supply source, a source tank storing raw material, a flow passage supplying carrier gas to an internal upper space portion of the source tank, an automatic pressure regulating device installed on the flow passage, controlling pressure in the internal upper space portion to a set pressure, another flow passage supplying mixed gas (a mixture of raw material steam and carrier gas) from the internal upper space portion to a process chamber, a flow control system installed on this other flow passage, and automatically regulates a flow rate of the mixed gas supplied to the process chamber to a set flow rate, and a constant temperature heating unit that heats the source tank, a portion of the automatic pressure regulating device, a portion of the flow control system, the pipe passage, and the other pipe passage, to a set temperature. | 05-08-2014 |
20140182692 | PRESSURE TYPE FLOW CONTROL SYSTEM WITH FLOW MONITORING - A pressure type flow control system with flow monitoring includes an inlet side passage, a control valve comprising a pressure-type flow control unit connected downstream of the inlet side passage, a thermal-type flow sensor connected downstream of the control valve, an orifice installed on a fluid passage connected downstream of the thermal-type flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet side passage connected to the orifice, and a control unit comprising a pressure-type flow rate arithmetic and control unit to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, and which computes a flow rate value of fluid flowing through the orifice, and outputs a control signal to a valve drive unit of the control valve. | 07-03-2014 |
20140190581 | RAW MATERIAL GAS SUPPLY APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT - A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature. | 07-10-2014 |
20140216339 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS - A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control. | 08-07-2014 |
20140230911 | PRESSURE TYPE FLOW CONTROL SYSTEM WITH FLOW MONITORING, AND METHOD FOR DETECTING ANOMALY IN FLUID SUPPLY SYSTEM AND HANDLING METHOD AT ABNORMAL MONITORING FLOW RATE USING THE SAME - A pressure type flow control system with flow monitoring includes an inlet, a control valve including a pressure flow control unit connected downstream of the inlet, a thermal flow sensor connected downstream of the control valve, an orifice installed on a fluid passage communicatively connected downstream of the thermal flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet communicatively connected to the orifice, and a control unit including a pressure type flow rate arithmetic and control unit receiving a pressure signal from the pressure sensor and a temperature signal from the temperature sensor, and a flow sensor control unit to which a flow rate signal from the thermal flow sensor is input. | 08-21-2014 |
20140299206 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS EQUIPPED WITH RAW MATERIAL CONCENTRATION - An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mixed gas easily and highly accurately and displaying the concentration in real time without using an expensive concentration meter, etc. | 10-09-2014 |
20140373935 | GAS BRANCHED FLOW SUPPLYING APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT - A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit | 12-25-2014 |