Patent application number | Description | Published |
20100062547 | TECHNIQUE FOR MONITORING AND CONTROLLING A PLASMA PROCESS WITH AN ION MOBILITY SPECTROMETER - A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method including generating a plasma in a process chamber of a plasma processing apparatus, supporting a workpiece on a platen in the process chamber, and monitoring a condition of the plasma with an ion mobility spectrometer is also provided. | 03-11-2010 |
20110000896 | SYSTEM AND METHOD FOR SELECTIVELY CONTROLLING ION COMPOSITION OF ION SOURCES - A method is disclosed for adjusting the composition of plasmas used in plasma doping, plasma deposition and plasma etching techniques. The disclosed method enables the plasma composition to be controlled by modifying the energy distribution of the electrons present in the plasma. Energetic electrons are produced in the plasma by accelerating electrons in the plasma using very fast voltage pulses. The pulses are long enough to influence the electrons, but too fast to affect the ions significantly. Collisions between the energetic electrons and the constituents of the plasma result in changes in the plasma composition. The plasma composition can then be optimized to meet the requirements of the specific process being used. This can entail changing the ratio of ion species in the plasma, changing the ratio of ionization to dissociation, or changing the excited state population of the plasma. | 01-06-2011 |
20110309049 | TECHNIQUES FOR PLASMA PROCESSING A SUBSTRATE - Techniques for plasma processing a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a method comprising introducing a feed gas proximate to a plasma source, where the feed gas may comprise a first and second species, where the first and second species have different ionization energies; providing a multi-level RF power waveform to the plasma source, where the multi-level RF power waveform has at least a first power level during a first pulse duration and a second power level during a second pulse duration, where the second power level may be different from the first power level; ionizing the first species of the feed gas during the first pulse duration; ionizing the second species during the second pulse duration; and providing a bias to the substrate during the first pulse duration. | 12-22-2011 |
20120000606 | PLASMA UNIFORMITY SYSTEM AND METHOD - A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configured to create a rapidly-rising-electric-field pulse in a portion of the plasma contained in the chamber. Each of said rapidly-rising-electric-field pulses having a rise time substantially equal to or less than the inverse of the electron plasma frequency and a duration of less than the inverse of the ion plasma frequency. In this manner, the electron energy distribution in the generated plasma may be spatially and locally modified thereby affecting the density, composition and temperature of the species in the plasma and consequently the uniformity of the density and composition of ions and neutrals directed at a target substrate. | 01-05-2012 |
20120255491 | SYSTEM AND METHOD FOR PLASMA MONITORING USING MICROWAVES - A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber. | 10-11-2012 |
20130075253 | TITANIUM DIBORIDE COATING FOR PLASMA PROCESSING APPARATUS - An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant to fluoride and chlorine ions. Finally, titanium diborane is electrically conductive, and therefore the plasma remains more uniform over time, as charge does not build on the surfaces of the titanium diborane components. This results in improved workpiece processing, with less contaminants and greater uniformity. In other embodiments, titanium diborane may be used to line components within a beam line implanter. | 03-28-2013 |
20130082599 | TRANSFORMER-COUPLED RF SOURCE FOR PLASMA PROCESSING TOOL - A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the legs of the ferrite. This magnetic field, which flows between the legs of the ferrite can then be used to create and maintain a plasma. In one embodiment, these legs rest on a dielectric window, such that the magnetic field passes into the chamber. In another embodiment, the legs of the ferrite extend into the processing chamber, thereby further extending the magnetic field into the chamber. This ferrite can be used in conjunction with a PLAD chamber, or an ion source for a traditional beam line ion implantation system. | 04-04-2013 |
20130270261 | Microwave plasma torch generating laminar flow for materials processing - A microwave plasma torch providing two laminar flows is described. Two laminar flows are created using a set of at least three concentric, staggered dielectric tubes connected to a pressurized gas source. An inner laminar flow entrains injected particles entering the plasma. An outer laminar flow creates a sheath around the plasma and prevents it from attaching to the walls of the plasma torch. The entry point of the gas source is designed to ensure laminar flow for both the entrainment of the particles and for the shielding of the plasma plume. The uniform processing conditions results in uniform particles and a homogenous materials distribution. This enables a final product with improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. The microwave plasma torch can be used for producing nanomaterial powder and for spray coating materials onto various substrates. | 10-17-2013 |
20140091155 | HIGH FREQUENCY UNIFORM DROPLET MAKER AND METHOD - There is disclosed a piezoelectric droplet maker that is driven at high frequency and energized with high power and high frequency Operational Amplifier (OP-AMP) electronics. The droplet maker implements a method of producing jets of uniform droplets of solution precursors (or any other homogeneous liquids). The formation of droplets results from stream break up due to the disturbance of liquid jets by the piezo actuator as they leave an orifice. This disturbance can be electronically tuned to produce uniform droplets with high repeatability. In another aspect, the droplet maker can be used to inject axially uniform diameter solution precursor droplets into process gas flow of a microwave plasma apparatus. | 04-03-2014 |
20140131906 | METHOD FOR THE DENSIFICATION AND SPHEROIDIZATION OF SOLID AND SOLUTION PRECURSOR DROPLETS OF MATERIALS USING MICROWAVE GENERATED PLASMA PROCESSING - A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. | 05-15-2014 |
20140155249 | METHOD FOR MAKING AMORPHOUS PARTICLES USING A UNIFORM MELT-STATE IN A MICROWAVE GENERATED PLASMA TORCH - Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products. Products of this process include spherical, highly porous and amorphous oxide ceramic particles such as magnesia-yttria (MgO—Y | 06-05-2014 |
20140217630 | METHOD FOR THE PRODUCTION OF MULTIPHASE COMPOSITE MATERIALS USING MICROWAVE PLASMA PROCESS - Disclosed herein is a method to produce multiphase composite materials directly from solution precursor droplets by a fast pyrolysis process using a microwave plasma embodiment containing a microwave generating source, a dielectric plasma torch, and a droplet maker. Here, using homogenous solution precursors, droplets are generated with a narrow size distribution, and are injected and introduced into the microwave plasma torch with generally uniform thermal path. The generally uniform thermal path in the torch is achieved by axial injection of droplets into an axisymmetric hot zone with laminar flows. Upon exposing to high temperature within the plasma with controlled residence time, the droplets are pyrolyzed and converted into particles by quenching with a controlled rate of the exhaust gas in a gas chamber. The particles generated have generally uniform sizes and uniform thermal history, and can be used for a variety of applications. | 08-07-2014 |
20140287162 | MICROWAVE PLASMA APPARATUS AND METHOD FOR MATERIALS PROCESSING - A microwave plasma apparatus for processing a material includes a plasma chamber, a microwave radiation source, and a waveguide guiding microwave radiation from the microwave radiation source to the plasma chamber. A process gas flows through the plasma chamber and the microwave radiation couples to the process gas to produce a plasma jet. A process material is introduced to the plasma chamber, becomes entrained in the plasma jet, and is thereby transformed to a stream of product material droplets or particles. The product material droplets or particles are substantially more uniform in size, velocity, temperature, and melt state than are droplets or particles produced by prior devices. | 09-25-2014 |
20140342093 | METHOD FOR DENSIFICATION AND SPHEROIDIZATION OF SOLID AND SOLUTION PRECURSOR DROPLETS OF MATERIALS USING MICROWAVE GENERATED PLASMA PROCESSING - A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. | 11-20-2014 |