Patent application number | Description | Published |
20100207059 | LITHIUM MANGANATE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention aims at providing lithium manganate having a high output and an excellent high-temperature stability. The above aim can be achieved by lithium manganate particles having a primary particle diameter of not less than 1 μm and an average particle diameter (D | 08-19-2010 |
20100288969 | LITHIUM MANGANATE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to lithium manganate particles having a primary particle diameter of not less than 1 μm and an average particle diameter (D | 11-18-2010 |
20100316910 | Li-Ni-BASED COMPOSITE OXIDE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to Li—Ni-based composite oxide particles comprising Mn, and Co and/or Al, wherein Co and Al are uniformly dispersed within the particles, and Mn is present with a gradient of its concentration in a radial direction of the respective particles such that a concentration of Mn on a surface of the respective particles is higher than that at a central portion thereof. The Li—Ni-based composite oxide particles can be produced by allowing an oxide and a hydroxide comprising Mn to mechanically adhere to Li—Ni-based oxide comprising Co and/or Al; and then heat-treating the obtained material at a temperature of not lower than 400° C. and not higher than 1,000° C. The Li—Ni-based composite oxide particles of the present invention are improved in thermal stability and alkalinity. | 12-16-2010 |
20120196185 | POSITIVE ELECTRODE ACTIVE SUBSTANCE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERIES, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to a positive electrode active substance for non-aqueous electrolyte secondary batteries which comprises particles comprising a polyanionic compound and carbon, and a lipophilic treatment agent with which the respective particles are coated, wherein the positive electrode active substance has an average particle diameter of 1 to 50 μm. The positive electrode active substance preferably has an oil absorption of not more than 20 mL/100 g. The positive electrode active substance according to the present invention exhibits a good compatibility with a resin and is excellent in packing property and dispersibility in the resin, and therefore can provide an electrode sheet in which the positive electrode active substance is filled with a high packing density. | 08-02-2012 |
20130045421 | NICKEL-COBALT-MAGANESE-BASED COMPOUND PARTICLES AND PROCESS FOR PRODUCING THE NICKEL-COBALT-MANGANESE-BASED COMPOUND PARTICLES, LITHIUM COMPOSITE OXIDE PARTICLES AND PROCESS FOR PRODUCING THE LITHIUM COMPOSITE OXIDE PARTICLES, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to nickel-cobalt-manganese-based compound particles which have a volume-based average secondary particle diameter (D50) of 3.0 to 25.0 μm, wherein the volume-based average secondary particle diameter (D50) and a half value width (W) of the peak in volume-based particle size distribution of secondary particles thereof satisfy the relational formula: W≦0.4×D50, and can be produced by dropping a metal salt-containing solution and an alkali solution to an alkali solution at the same time, followed by subjecting the obtained reaction solution to neutralization and precipitation reaction. The nickel-cobalt-manganese-based compound particles according to the present invention have a uniform particle size, a less content of very fine particles, a high crystallinity and a large primary particle diameter, and therefore are useful as a precursor of a positive electrode active substance used in a non-aqueous electrolyte secondary battery. | 02-21-2013 |
20130183587 | LITHIUM MANGANATE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention aims at providing lithium manganate having a high output and an excellent high-temperature stability. The above aim can be achieved by lithium manganate particles having a primary particle diameter of not less than 1 μm and an average particle diameter (D | 07-18-2013 |
20130330626 | LI-NI-BASED COMPOSITE OXIDE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to Li—Ni-based composite oxide particles comprising Mn, and Co and/or Al, wherein Co and Al are uniformly dispersed within the particles, and Mn is present with a gradient of its concentration in a radial direction of the respective particles such that a concentration of Mn on a surface of the respective particles is higher than that at a central portion thereof. The Li—Ni-based composite oxide particles can be produced by allowing an oxide and a hydroxide comprising Mn to mechanically adhere to Li—Ni-based oxide comprising Co and/or Al; and then heat-treating the obtained material at a temperature of not lower than 400° C. and not higher than 1,000° C. The Li—Ni-based composite oxide particles of the present invention are improved in thermal stability and alkalinity. | 12-12-2013 |
20140034872 | MANGANESE/NICKEL COMPOSITE OXIDE PARTICLES AND PROCESS FOR PRODUCING THE MANGANESE NICKEL COMPOSITE OXIDE PARTICLES, POSITIVE ELECTRODE ACTIVE SUBSTANCE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERIES AND PROCESS FOR PRODUCING THE POSITIVE ELECTRODE ACTIVE SUBSTANCE PARTICLES, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention provides a precursor of positive electrode active substance particles for non-aqueous electrolyte secondary batteries which have a high discharge voltage and a high discharge capacity, hardly suffer from side reactions with an electrolyte solution, and are excellent in cycle characteristics, positive electrode active substance particles for non-aqueous electrolyte secondary batteries, and processes for producing these particles, and a non-aqueous electrolyte secondary battery. The present invention relates to positive electrode active substance particles for non-aqueous electrolyte secondary batteries having a spinel structure with a composition represented by the following chemical formula (1), in which the positive electrode active substance particles satisfy the following characteristic (A) and/or characteristic (B) when indexed with Fd−3m in X-ray diffraction thereof: (A) when indexed with Fd−3m in X-ray diffraction of the positive electrode active substance particles, a ratio of I(311) to I(111) [I(311)/I(111)] is in the range of 35 to 43%, and/or (B) when indexed with Fd−3m in X-ray diffraction of the positive electrode active substance particles, a gradient of a straight line determined by a least square method in a graph prepared by plotting sine in an abscissa thereof and B cos θ in an ordinate thereof wherein B is a full-width at half maximum with respect to each peak position 2θ (10 to 90°) is in the range of 3.0×10 | 02-06-2014 |
20150037677 | POSITIVE ELECTRODE ACTIVE SUBSTANCE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERIES AND PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to positive electrode active substance particles for non-aqueous electrolyte secondary batteries, comprising an oxide having a spinel structure and comprising at least Li and Mn as main components and an oxide comprising at least Li and Zr, in which the oxide comprising at least Li and Zr forms a mixed phase comprising two or more phases, and a content of the oxide comprising at least Li and Zr in the positive electrode active substance particles is 0.1 to 4% by weight. The present invention provides positive electrode active substance particles for non-aqueous electrolyte secondary batteries which are excellent in high-temperature characteristics and a process for producing the positive electrode active substance particles, and a non-aqueous electrolyte secondary battery. | 02-05-2015 |
Patent application number | Description | Published |
20120064791 | NEEDLE-PUNCHED NONWOVEN FABRIC - The invention relates to a needle-punched nonwoven fabric wherein short fibers of polylactic acid containing an epoxy compound account for 20 to 40 mass % while short fibers of polyethylene terephthalate account for 80 to 60 mass %, the metsuke (weight per unit surface area) being 100 to 200 g/m | 03-15-2012 |
20140041171 | NEEDLE-PUNCHED NONWOVEN FABRIC - The invention relates to a needle-punched nonwoven fabric wherein short fibers of polylactic acid containing an epoxy compound account for 20 to 40 mass % while short fibers of polyethylene terephthalate account for 80 to 60 mass %, the metsuke (weight per unit surface area) being 100 to 200 g/m | 02-13-2014 |
20140300024 | NONWOVEN FABRIC FOR PRESS MOLDING, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING MOLDED PRODUCT - Provided is a nonwoven fabric for press molding and a molded product. With use of the nonwoven fabric, a fiberboard can be molded in a shorter time and even by 3D press molding a molded product with an excellent appearance quality can be obtained. The nonwoven fabric for press molding is formed of polylactic acid fibers and natural fibers, the polylactic acid fibers having a crystallization temperature on cooling of 120° C. or higher, the nonwoven fabric having a tensile strength of 20 N/cm | 10-09-2014 |
20150038035 | FIBER STRUCTURE - Provided is a fabric having a ground weave to which a hygroscopic polymer is fixed, and the fabric generates heat under moisture absorbing conditions and provides a more comfortable feeling to a person by temperature drop in moisture desorption conditions. A fiber structure is prepared by fixing a hygroscopic polymer to fibers of the fabric, and the front layer on the front surface side and the back layer on the back surface side have different fiber densities where the boundary between the front layer and the back layer is on the center line of a cross section of the fiber structure. | 02-05-2015 |
Patent application number | Description | Published |
20090027641 | ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS INCLUDING THE SAME - An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane. | 01-29-2009 |
20090213355 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD - An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator. | 08-27-2009 |
20100053584 | ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS - An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed. | 03-04-2010 |
20120314052 | CATADIOPTRIC OPTICAL SYSTEM AND IMAGE-PICKUP APPARATUS HAVING THE SAME - A catadioptric optical system of the present invention includes a catadioptric unit configured to condense light fluxes from an object and to form an intermediate image of the object, a field lens disposed at a position where the intermediate image are formed, and a dioptric unit configured to form the intermediate image on an image surface, and when νcat denotes a smallest Abbe number in Abbe numbers of materials of the first and second optical elements configuring the catadioptric unit and νdio denotes a smallest Abbe number in Abbe numbers of materials of a plurality of dioptric optical elements configuring the dioptric unit, νdio<νcat is satisfied. | 12-13-2012 |
20120320187 | CATADIOPTRIC SYSTEM AND IMAGE PICKUP APPARATUS - The catadioptric system includes a first optical imaging system (catadioptric part) causing a light flux from an object to form an intermediate image and a second optical imaging system (dioptric part) causing the light flux from the intermediate image to form an image. In the first optical imaging system, the light flux sequentially passes a first transmissive portion, a second reflective portion, a first reflective portion and a second transmissive portion. In the second optical imaging system, consecutive four lens surfaces among plural lens surfaces placed between an aperture stop and an image surface have a negative combined refractive power, and a condition of −0.52<φ | 12-20-2012 |
20130063650 | CATADIOPTRIC SYSTEM AND IMAGE PICKUP APPARATUS EQUIPPED WITH SAME - A catadioptric unit includes, in order from an object side to an image side, a first optical element including a first transmissive unit having positive refractive power disposed in the vicinity of an optical axis and, on the object side thereof, a first reflective unit disposed at an outer circumference relative to the first transmissive unit and having a reflective surface; and a second optical element including a second transmissive unit having negative refractive power in the vicinity of the optical axis and, on the image side thereof, a second reflective unit disposed at an outer circumference relative to the second transmissive unit and having a reflective surface. Radii of curvature of object-side and image-side surfaces of the second optical element, a thickness along the optical axis and a refractive index of a material of the second optical element are set to satisfy predetermined conditions. | 03-14-2013 |
20130162801 | MICROSCOPE - Provided is a microscope which includes an image pickup element, a light source, an optical system, a control unit and a sensor. The control unit controls for the acquisition of, in parallel with the first image pickup event by the image pickup element, necessary information when the second image pickup event by the image pickup element is performed, by using the sensor. A pair of sensors for a microscope includes a pair of sensors. A first sensor of the pair of sensors provides a signal that represents an environmental variable of a first area at a first period in time. A second sensor of the pair of sensors provides a signal that represents a quality of the first sensor's ability to represent the environmental variable of a second area at the first period in time, wherein the second sensor is adjacent to the first sensor. | 06-27-2013 |
20140036143 | IMAGE ACQUISITION APPARATUS AND IMAGE ACQUISITION SYSTEM - An image acquisition apparatus includes an imaging optical system configured to image an object, a reimaging optical system configured to reimage the object imaged by the imaging optical system, a reflecting member disposed in an optical path between the imaging optical system and the reimaging optical system, an image sensor configured to capture an image of the object reimaged by the reimaging optical system, and to output the image, a first driving unit configured to change a tilt of the reflecting member relative to an optical axis of the imaging optical system, and a correction unit configured to correct a positional deviation of the image in a rotational direction, wherein the positional deviation of the image is generated according to a change in the tilt of the reflecting member. | 02-06-2014 |
20140160267 | Image Pickup Apparatus - An image pickup apparatus includes a measuring section configured to measure a surface shape of an object, an image pickup section configured to obtain images of different areas of the object on an image plane of an image pickup optical system by image pickup elements, a focal-position detecting unit configured to detect a focal position of the object where a focal-position detecting point is focused on the image plane, and a focal-position determining unit configured to determine a focal position of the object at a point different from the focal-position detecting point on the basis of detection of the focal-position detecting unit and measurement of the measuring section. The image pickup section takes the images of the different areas on the basis of determination of the focal-position determining unit while the images are focused on the image pickup elements. | 06-12-2014 |
20140204195 | MICROSCOPE, OBJECTIVE OPTICAL SYSTEM, AND IMAGE ACQUISITION APPARATUS - A microscope includes an objective optical system including an imaging optical system configured to form an image of an object, a re-imaging optical system configured to re-form an image of the object image formed by the imaging optical system, and a reflection unit arranged on an optical path between the imaging optical system and the re-imaging optical system and configured to be locally changeable in at least one of a position thereof in an optical axis direction and an inclination thereof relative to an optical axis, and an image sensor configured to capture the image re-formed by the objective optical system. | 07-24-2014 |
20150043063 | CATADIOPTRIC SYSTEM AND IMAGE PICKUP APPARATUS INCLUDING THE SYSTEM - A catadioptric system includes: a catadioptric unit configured to form an intermediate image of an object; a refracting portion configured to form an image of the intermediate image; a first field lens configured to guide optical flux from the catadioptric unit to the refracting portion; and a second field lens configured to guide the optical flux from the refracting portion toward an image side. The first and the second field lenses each include a positive lens and a negative lens adjacent to each other, and wherein where νIFLp1 and νIFLn1 are respectively Abbe numbers of materials of the positive lens and the negative lens of the first field lens, and νFLp1 and νFLn1 are respectively Abbe numbers of materials of the positive lens and the negative lens of the second field lens, conditions | 02-12-2015 |
20150207972 | IMAGE ACQUISITION APPARATUS - The image acquisition apparatus includes an imaging optical system configured to form an image of an object, multiple image sensors each configured to capture an image of the object through the imaging optical system, multiple variable angle prisms disposed between the imaging optical system and the image sensors, and the variable angle prisms each being paired with one of the image sensors. A controller is configured to control each variable angle prism to correct defocus of the imaging optical system on the image sensor paired with that variable angle prism. | 07-23-2015 |
20150268457 | IMAGE PICKUP APPARATUS - An image-pickup apparatus includes an illumination optical system, an imaging optical system, and an image sensor. The illumination optical system includes an adjustable diaphragm configured to adjust a light quantity of the excited light. The imaging optical system includes a light shield arranged at a position conjugate with a position of the adjustable diaphragm, and configured to shield light on and around an optical axis. A·M | 09-24-2015 |
20160109691 | ZOOM LENS AND IMAGE PICKUP APPARATUS INCLUDING THE SAME - Provided is a zoom lens, including, in order from an object side to an image side, first, second, and third lens units having positive, negative, and positive refractive powers, respectively. The second lens unit moves toward image side during zooming from a wide angle end to a telephoto end, and an interval between adjacent lens units is changed during zooming. The first lens unit includes a lens pair of a positive lens (LP | 04-21-2016 |
Patent application number | Description | Published |
20090017623 | WAFER PROCESSING METHOD - A wafer processing method having a step of reducing the thickness of a wafer in only a device forming area where semiconductor chips are formed by grinding and etching the back side of the wafer to thereby form a recess on the back side of the wafer. At the same time, an annular projection is formed around the recess to thereby ensure the rigidity of the wafer. Accordingly, handling in shifting the wafer from the back side recess forming step to a subsequent step of forming a back side rewiring layer can be performed safely and easily. | 01-15-2009 |
20090098808 | GRINDING METHOD FOR WAFER - A grinding method for a wafer having a plurality of devices on the front side, wherein the back side of the wafer is ground by a grinding wheel to suppress the motion of heavy metal in the wafer by a gettering effect and also to maintain the die strength of each device at about 1,000 MPa or more. The grinding wheel is composed of a frame and an abrasive member fixed to the free end of the frame. The abrasive member is produced by fixing diamond abrasive grains having a grain size of less than or equal to 1 μm with a vitrified bond. A protective member is attached to the front side of the wafer and the wafer is held on a chuck table in the condition where the protective member is in contact with the chuck table. The grinding wheel is rotated as rotating the chuck table to thereby grind the back side of the wafer by means of the abrasive member so that the average surface roughness of the back side of the wafer becomes less than or equal to 0.003 μm and the thickness of a strain layer remaining on the back side of the wafer becomes 0.05 μm. | 04-16-2009 |
20090186562 | METHOD OF GRINDING WAFER - A method of grinding a wafer, including: a wafer holding step for holding a wafer on a conical holding surface of a chuck table having the holding surface; a rough grinding step for performing rough grinding of the wafer held on the holding surface of the chuck table by positioning a grinding surface of a rough grinding wheel at a predetermined inclination angle relative to the holding surface of said chuck table, and rotating the rough grinding wheel; and a finish grinding step for performing finish grinding of the wafer by positioning a grinding surface of a finish grinding wheel in parallel to the holding surface of the chuck table, and rotating the finish grinding wheel in a grinding region of the grinding wheel in a direction toward the vertex of the contact angle between the grinding surface of the finish grinding wheel and the surface to be ground of the wafer. | 07-23-2009 |
20100055877 | WAFER PROCESSING METHOD - Disclosed herein is a wafer processing method for dividing a wafer along a plurality of streets. The wafer processing method includes a back grinding step of grinding the back side of the wafer in an area corresponding to a device area to thereby reduce the thickness of the device area to a predetermined finished thickness and to simultaneously form an annular reinforcing portion on the back side of the wafer in an area corresponding to a peripheral marginal area, a wafer supporting step of attaching the back side of the wafer to a dicing tape, a kerf forming step of cutting the front side of the wafer along each street to thereby form a kerf having a depth corresponding to the thickness of the device area along each street, thereby dividing the device area into individual devices, and a peripheral marginal area removing step of peeling off the peripheral marginal area from the dicing tape. | 03-04-2010 |
20100267219 | OPTICAL DEVICE WAFER PROCESSING METHOD - An optical device wafer processing method including a protective plate attaching step of attaching a transparent protective plate through a double-sided adhesive tape to the front side of a sapphire substrate constituting an optical device wafer, the double-sided adhesive tape being composed of a sheet capable of blocking ultraviolet radiation and adhesive layers formed on both sides of the sheet, wherein the adhesive force of each adhesive layer can be reduced by applying ultraviolet radiation; a sapphire substrate grinding step of grinding the back side of the sapphire substrate; a modified layer forming step of applying a laser beam to the sapphire substrate from the back side thereof to thereby form a modified layer in the sapphire substrate along each street; a protective plate removing step of removing the protective plate in the condition where the double-sided adhesive tape is left on the sapphire substrate; and a wafer dividing step of breaking the sapphire substrate along each street where the modified layer is formed, thus dividing the optical device wafer into individual optical devices in the condition where the double-sided adhesive tape is left on the sapphire substrate. | 10-21-2010 |
20110097875 | WAFER PROCESSING METHOD - A wafer processing method for dividing a wafer into individual devices along a plurality of crossing streets formed on the front side of the wafer, the individual devices being respectively formed in a plurality of regions partitioned by the streets. The wafer processing method includes the steps of attaching the front side of the wafer to a dicing tape supported to an annular dicing frame, grinding the back side of the wafer to reduce the thickness of the wafer to a predetermined thickness, forming a break start point along each street from the back side of the wafer, applying an external force to the wafer to break the wafer along each street where the break start point is formed, thereby dividing the wafer into the individual devices, attaching the back side of the wafer to a front side of an adhesive tape supported to an annular frame and next removing the adhesive tape from the front side of the adhesive tape, and peeling off and picking up each device from the adhesive tape. | 04-28-2011 |
20120100694 | DIVIDING METHOD FOR WAFER HAVING DIE BONDING FILM ATTACHED TO THE BACK SIDE THEREOF - A wafer is divided into individual devices along division lines formed on the front side of the wafer. The devices are respectively formed in a plurality of regions partitioned by the division lines. A protective member is provided on the front of the wafer, and the back of the wafer is ground to a predetermined thickness. A laser beam is applied to the wafer from the back side of the wafer along the division lines with the focal point of the laser beam set inside the wafer at a position corresponding to each division line, thereby forming a plurality of modified layers inside the wafer along the division lines. The wafer is divided along the modified layers into the individual devices, and the back side of the wafer is ground to remove the modified layers and reduce the thickness of each device to the finished thickness. | 04-26-2012 |
Patent application number | Description | Published |
20110221791 | IMAGE DISPLAY DEVICE - An image display device includes pixel circuits, a power supply line, and a data line for supplying a data signal to the pixel circuits. The pixel circuits each include a light emitting element, a drive transistor for controlling light emission of the light emitting element, a storage capacitor provided between the data line and a gate electrode of the drive transistor, a both-end connection switch for connecting both ends of the storage capacitor to each other, and a current interruption switch for interrupting a path of a current flowing from the power supply line through the both-end connection switch. Before the data signal is supplied to each of the pixel circuits, the both-end connection switch connects the both ends of the storage capacitor to each other, and the current interruption switch is disconnected. | 09-15-2011 |
20110234568 | DISPLAY DEVICE - A display device includes: scanning lines for selecting a group of pixels out of pixels; control lines to which a pulse signal is supplied to control selection of at least one of the plurality of scanning lines to which a scanning signal is input; a scanning circuit which includes transistors controlled with the pulse signal, the scanning circuit being connected to the plurality of scanning lines and being disposed outside a display area; and a conductive mesh including conductive wires running in intersecting directions. The conductive mesh is placed above the transistors and the plurality of scanning lines except the display area. Above the plurality of scanning lines, the plurality of conductive wires constituting the conductive mesh intersect each other three-dimensionally in a manner that does not make the plurality of conductive wires parallel to the plurality of scanning lines. | 09-29-2011 |
20110310137 | Image Display Device - The present invention provides an image display device comprising data lines each supplying a data signal, and a plurality of pixel circuits. Each of the pixel circuits includes a light-emitting element, a capacitor which stores a difference in potential caused by the data signal therein, a drive transistor which has a gate electrode connected to the data line via the capacitor and controls light emission of the light-emitting element based on a difference in potential between the gate electrode and a source electrode thereof, which is generated by a potential supplied by the data line and the potential difference stored in the capacitor, and a variation control switch which causes the difference in potential between the gate and source electrodes of the drive transistor to vary based on the data signal at the turning on thereof and prevents the difference in potential from varying at the turning off thereof. | 12-22-2011 |
20120105501 | IMAGE DISPLAY DEVICE AND METHOD FOR DRIVING IMAGE DISPLAY DEVICE - An image display device includes: a light-emitting element that emits light corresponding to an amount of current in an emission period; a storage capacitor to which a display potential is supplied to one end thereof before the emission period and which stores a voltage corresponding to the display potential; a driving transistor that adjusts an amount of current flowing in a drain electrode thereof in accordance with the voltage stored by the storage capacitor; a lighting control switch which is connected in series with the light-emitting element from the drain electrode of the driving transistor and which is turned on in the emission period; and a discharge switch that connects a node in a current path from the driving transistor to the light-emitting element, through which a current flows when the lighting control switch is turned on, to a wiring that supplies a discharge potential before the emission period. | 05-03-2012 |
20120293563 | DISPLAY DEVICE - A display device which includes a light source which independently emits light of three colors of RGB, and an emission control unit which controls the light source to continuously emit one of principal wavelength light beams of three RGB light beams in each of the sub-frames, in which the emission control unit controls a Green light as one of the plural principal wavelengths among light beams of three RGB colors to be emitted in the sub-frame which is arranged at the same position in the one frame period of both an odd frame as the odd numbered single frame period and an even frame as the even numbered single frame period, and controls light of the R color and the B color to be emitted in different sub-frames between the odd frames and the even frames. | 11-22-2012 |
20120293564 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - Provided are a display device that can suppress occurrence of a color breakup as well as occurrence of a false contour, and a control method therefor. In the display device, a plurality of sub-frame periods forming one frame period are divided into: a first group to which sub-frame periods with the same length of light transmission periods belong; and a second group to which sub-frame periods with lengths of light transmission periods shorter than those of the sub-frame periods in the first group and different from each other belong. Further, among the sub-frame periods that belong to the first group, sub-frame periods having the light transmission period increase in number from a middle of the one frame period toward a start point and an end point of the one frame period in accordance with an increase of the gray level. | 11-22-2012 |
20120293572 | DISPLAY DEVICE - A display device includes: a light emission control part which allows a light source to emit the light having one of the plural different main wavelengths in each of plural sub frames; a display panel which controls the transmission of light in each pixel; and a display control part which controls the display panel corresponding to a gray level value with respect to the each pixel, wherein the light emitting control part performs the light emission of light having a first main wavelength in a first sub frame in accordance with a light emission amount weighted based on a time for calculation including a first interval which is a interval between the first sub frame where the first main wavelength is emitted and a second sub frame where the first main wavelength is emitted after the first sub frame. | 11-22-2012 |
20130076805 | DISPLAY DEVICE AND CONTROL METHOD OF THE SAME - Provided is a display device and a control method of the same which suppress the occurrence of color separation. The display device includes: a light source of plural kinds of colors; a plurality of elements which are provided to a plurality of pixels respectively, and change over transmission/non-transmission of light emitted from the light source; and a control part which expresses gray levels of the respective pixels by color sequential driving in which the presence/non-presence of lighting of the light source and the transmission/non-transmission of light by the elements are sequentially controlled. The control part fetches image data amounting to 1 screen and performs a display based on the image data for every image data use period, and performs a display of an image amounting to 1 screen for every frame display period. The frame display period differs from the image data use period in length. | 03-28-2013 |
20140204132 | DISPLAY DEVICE - A display device includes: a light emission control part which allows a light source to emit the light having one of the plural different main wavelengths in each of plural sub frames; a display panel which controls the transmission of light in each pixel; and a display control part which controls the display panel corresponding to a gray level value with respect to the each pixel, wherein the light emitting control part performs the light emission of light having a first main wavelength in a first sub frame in accordance with a light emission amount weighted based on a time for calculation including a first interval which is a interval between the first sub frame where the first main wavelength is emitted and a second sub frame where the first main wavelength is emitted after the first sub frame. | 07-24-2014 |
20140247293 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - Provided are a display device that can suppress occurrence of a color breakup as well as occurrence of a false contour, and a control method therefor. In the display device, a plurality of sub-frame periods forming one frame period are divided into a first group to which sub-frame periods with the same length of light transmission periods belong; and a second group to which sub-frame periods with lengths of light transmission periods shorter than those of the sub-frame periods in the first group and different from each other belong. Further, among the sub-frame periods that belong to the first group, sub-frame periods having the light transmission period increase in number from a middle of the one frame period toward a start point and an endpoint of the one frame period in accordance with an increase of the gray level. | 09-04-2014 |
20160005361 | DISPLAY DEVICE - [PROBLEM] To provide substantially the same voltage to a shutter electrode and a pair of control electrodes, and to prevent degradation of the mechanical shutter, during a discharge period in a movable shutter system in an image display device. [RESOLUTION MEANS] A plurality of pixels are provided each having a mechanical shutter, wherein the mechanical shutter comprises a shutter electrode and first and second control electrodes provided in a pair with respect to the shutter electrode; and the display device displays images by electrically controlling a position of the shutter electrode; wherein the display device comprises a discharge period and a display period, and in the display period, a low voltage drive voltage of VL, or a high voltage drive voltage of VH with a voltage higher than the low voltage drive voltage of VL, is supplied to the shutter electrode, the first control electrode, and the second control electrode, and |Vs−Vp | 01-07-2016 |
Patent application number | Description | Published |
20110085126 | METHOD OF AND APPARATUS FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE - One aspect of the invention provides a liquid crystal display device producing method for irradiating a liquid crystal display substrate, in which plural pixels are formed in a matrix state and liquid crystal is sealed between a TFT substrate and a counter electrode substrate, with light having a predetermined wavelength to orient liquid crystal molecules toward a predetermined direction in a state in which an electric field is applied to each pixel of the liquid crystal display substrate. The method includes the steps of: dipping the liquid crystal display substrate and a lamp in a transparent liquid having resistivity of a predetermined value or more and sufficiently high transmittance to the light in a state in which the liquid crystal display substrate and the lamp face each other; and lighting the lamp to irradiate the liquid crystal display substrate with the light having a predetermined light quantity in a state in which the electric field is applied to each pixel. | 04-14-2011 |
20110244379 | METHOD FOR FORMING CONVEX PATTERN, EXPOSURE APPARATUS AND PHOTOMASK - The present invention is a photomask | 10-06-2011 |
20120075612 | EXPOSURE METHOD AND EXPOSURE APPARATUS - In the present invention, while conveying a subject to be exposed, when exposure on a first exposure area of the subject to be exposed is completed, the exposure being performed by using a first mask pattern group of a photomask in which a plurality of types of mask pattern groups corresponding to each exposure pattern is arranged and formed in a conveying direction of the exposure to be exposed at a predetermined interval, the photomask is moved in synchronization with a conveying speed of the exposure to be exposed and the mask pattern group is switched from the first mask pattern group to a second mask pattern group. When the switching of the mask pattern group of the photomask 11 is completed, the movement of the photomask is stopped, exposure on a second exposure area of the subject to be exposed 8 is performed by the mask pattern group. | 03-29-2012 |
20120077351 | LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS - In the present invention, At least one row of lens arrays, in which a plurality of lenses are arranged in a direction intersecting with the conveying direction of a substrate to correspond to the plurality of TFT forming areas set in a matrix on the substrate, is shifted in the direction intersecting with the conveying direction of the substrate, to thereby align the lenses in the lens array with the TFT forming areas on the substrate based on the alignment reference position. The laser beams are irradiated onto the lens array when the substrate moves and the TFT forming areas reach the underneath of the corresponding lenses of the lens array, and the laser beams are focused by the plurality of lenses to anneal the amorphous silicon film in each TFT forming area. | 03-29-2012 |
20120113403 | EXPOSURE METHOD AND EXPOSURE APPARATUS - In the present invention, when exposure on a first exposure area of the subject to be exposed by using a first mask pattern group of a photomask, is completed, the shutter is moved in synchronization with a conveying speed of the subject to be exposed to shut off source light, the subject to be exposed is returned by a distance in which the subject to be exposed moves while the shutter moves, and the mask pattern group is switched to a second mask pattern group by moving the photomask. When the switching of the mask pattern group of the photomask is completed, the conveying of the subject to be exposed is restarted. At the same time, the shutter is moved in synchronization with the conveying speed of the subject to be exposed to release the shut off of the source light, and exposure on a second exposure area is performed. | 05-10-2012 |
20120249993 | EXPOSURE METHOD AND EXPOSURE APPARATUS - An exposure method includes a step of moving a photomask by a predetermined distance and switching a first mask pattern group to a second mask pattern group when an exposure to a first exposure area on an object to be exposed by the first mask pattern group of the photomask formed by arranging the first and the second mask pattern groups corresponding to an exposure patterns at predetermined intervals in a conveying direction of the object to be exposed is completed, and a step of performing an exposure on the second exposure area on the object to be exposed by the second mask pattern group, in which a moving speed of the photomask is controlled so that a moving distance of the object to be exposed is longer than a moving distance of the photomask in a period of time when switching the first and the second mask pattern groups. | 10-04-2012 |
20130100431 | Method and apparatus for alignment processing - A method for alignment processing including making a substrate | 04-25-2013 |
20130188161 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure. | 07-25-2013 |
20130342820 | LIGHT-EXPOSURE DEVICE - A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time. | 12-26-2013 |
20140063808 | LASER LIGHTING DEVICE - In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced. | 03-06-2014 |
20140126591 | PULSED LASER OSCILLATOR AND METHOD FOR CONTROLLING PULSED LASER OSCILLATION - A pulsed laser oscillator includes at least one first electrooptical element that polarizes light according to an applied voltage and a voltage control unit that applies a voltage to the first electrooptical element and controls the voltage. The voltage control unit changes over time a voltage value applied to the first electrooptical element, to control a pulse width of laser light. | 05-08-2014 |
20140199808 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 07-17-2014 |
20150017321 | METHOD FOR FORMING THIN FILM PATTERN - To provide a method for forming a thin film pattern | 01-15-2015 |
20150063410 | NONDESTRUCTIVE INSPECTION APPARATUS AND INSPECTION SYSTEM OF STRUCTURE - A nondestructive inspection apparatus of a structure includes: an inspection apparatus body | 03-05-2015 |
20150258630 | Laser annealing method and laser annealing apparatus - In the present invention, At least one row of lens arrays, in which a plurality of lenses are arranged in a direction intersecting with the conveying direction of a substrate to correspond to the plurality of TFT forming areas set in a matrix on the substrate, is shifted in the direction intersecting with the conveying direction of the substrate, to thereby align the lenses in the lens array with the TFT forming areas on the substrate based on the alignment reference position. The laser beams are irradiated onto the lens array when the substrate moves and the TFT forming areas reach the underneath of the corresponding lenses of the lens array, and the laser beams are focused by the plurality of lenses to anneal the amorphous silicon film in each TFT forming area. | 09-17-2015 |
20150284839 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 10-08-2015 |
Patent application number | Description | Published |
20120058627 | COMPOUND SEMICONDUCTOR DEPOSITION METHOD AND APPARATUS - Provided is a compound semiconductor deposition method of adjusting the luminous wavelength of a compound semiconductor of a ternary or higher system in a nanometer order in depositing the compound semiconductor on a substrate. In the compound semiconductor deposition method of depositing a compound semiconductor of a ternary or higher system on a substrate, propagation light of a smaller energy than a desired ideal excitation energy for the compound semiconductor is irradiated onto the substrate | 03-08-2012 |
20120220140 | DEVICE AND METHOD FOR FORMING LOW-TEMPERATURE POLYSILICON FILM - Provided is a forming device and method making it possible to obtain a low-temperature polysilicon film in which the size of crystal grains fluctuates minimally, and is uniform. A mask has laser-light-blocking areas and laser-light-transmission areas arranged in the form of a grid such that the light-blocking areas and transmission areas are not adjacent to one another. Laser light is directed by the microlenses through the masks to planned channel-area-formation areas. The laser light transmitted by the transmission areas is directed onto an a-Si:H film, annealing and polycrystallzing the irradiated parts thereof. The mask is then removed, and when the entire planned channel-area-formation area is irradiated with laser light, the already-polycrystallized area, having a higher melting point, does not melt, while the area in an amorphous state melts and solidifies, leading to polycrystallization. The grain size of the polysilicon film obtained is regulated by the light-blocking areas and transmission areas and is thus controlled to a predetermined range. | 08-30-2012 |
20150177568 | PHOTO-ALIGNMENT EXPOSURE DEVICE AND PHOTO-ALIGNMENT EXPOSURE METHOD - A photo-alignment exposure device that includes a first mask and a first exposure device that independently proximity-exposes a first divided area, a second mask and a second exposure device that independently proximity-exposes a second divided area adjacent to the first divided area, and a third mask and a third exposure device that exposes an area on a side of the first divided area near a boundary between the first divided area and the second divided area. The third exposure device is provided with a photo-irradiation angle same as that of the first exposure device or the second exposure device with respect to an exposed surface. A condensing element that condenses the mask transmitted light on the area on a side of the first divided area near the boundary is provided between the mask opening of the third mask and the exposed surface. | 06-25-2015 |
20150192830 | PHOTO-ALIGNMENT EXPOSURE METHOD AND PHOTO-ALIGNMENT EXPOSURE DEVICE - A photo-alignment exposure method divides each unit image area of a liquid crystal display into a plurality of divided areas and photo-aligns an alignment material film of each of the divided areas in mutually different directions. The method includes a first exposure process that radiates light at an inclined photo-irradiation angle onto an exposed surface of entire the unit image area; and a second exposure process that radiates light onto one area of the divided areas at an inclined photo-irradiation angle different from the photo-irradiation angle in the first exposure process. In the second exposure process, the light is radiated through a mask pattern corresponding to one area of the divided areas, and transmitted light of the mask pattern is condensed by condensing element and radiated onto the area. | 07-09-2015 |
20150244146 | SEMICONDUCTOR RING LASER APPARATUS - Provided is a semiconductor ring laser apparatus including an Si semiconductor substrate, a ring resonator configured by an optical waveguide formed in the Si semiconductor substrate, a semiconductor laser part that is provided with a light emitting amplification part at least in a part of the optical waveguide and that generates two beams of laser light traveling around in opposite directions in the ring resonator, and a light detection part formed in the Si semiconductor substrate to extract the two beams of laser light from the ring resonator and detect a frequency difference between the two beams of laser light. The light emitting amplification part includes a pn junction obtained by annealing on a second semiconductor layer, which is obtained by doping a first semiconductor layer in the Si semiconductor substrate with boron at high concentration, the annealing being performed while radiating light onto the second semiconductor layer. | 08-27-2015 |
20150280835 | OPTICAL INTERCONNECTION DEVICE - An optical interconnection device for transmitting and receiving an optical signal between a plurality of laminated semiconductor substrates. The optical interconnection device has a plurality of light emitting elements or a plurality of light receiving elements arranged in one of the semiconductor substrates that have pn junction parts using the semiconductor substrate as a common semiconductor layer. The light emitting element and the light receiving element, which form a pair and which transmit and receive an optical signal between the different semiconductor substrates, emit and receive light at a common wavelength. | 10-01-2015 |
20150301279 | OPTICAL INTERCONNECTION DEVICE - An optical interconnection device for transmitting and receiving an optical signal between a plurality of laminated semiconductor substrates. The optical interconnection device has a plurality of light emitting elements or a plurality of light receiving elements that are arranged in one of the semiconductor substrates and have pn junction parts using the semiconductor substrate as a common semiconductor layer. The light emitting element and the light receiving element, which form a pair and which transmit and receive an optical signal between the different semiconductor substrates, emit and receive light at a common wavelength. | 10-22-2015 |
20150357361 | IMAGING DEVICE - When a visible light image and an image of a long-wavelength region with a near-infrared wavelength or longer are acquired using one imaging sensor, a clear image of the long-wavelength region with the near-infrared wavelength or longer is obtained. In an imaging sensor | 12-10-2015 |
20160006518 | OPTICAL INTERCONNECTION DEVICE - Signal transmission crosstalk between substrates is suppressed even when light emitting elements or light receiving elements are densely arranged. Provided is an optical interconnection device | 01-07-2016 |
Patent application number | Description | Published |
20130240239 | PHOSPHORUS-FREE BASED HALOGEN-FREE FLAME-RETARDANT RESIN COMPOSITION, PHOSPHORUS-FREE BASED HALOGEN-FREE FLAME-RETARDANT INSULATED ELECTRIC WIRE AND PHOSPHORUS-FREE BASED HALOGEN-FREE FLAME-RETARDANT CABLE - A phosphorus-free based halogen-free flame-retardant resin composition includes a base polymer including a copolymer of ethylene and α-olefin having carbon number of 3 to 8 polymerized by a metallocene catalyst as a main component, and 5 to 30 weight % of an ethylene-vinyl acetate copolymer that has a melt flow rate of not less than 50 g/min and a vinyl acetate content of not less than 40%, a metal hydroxide blended with the base polymer in a ratio of 100 to 250 parts by weight relative to 100 parts by weight of the base polymer, and a mineral oil blended with the base polymer in a ratio of 1 to 20 parts by weight relative to 100 parts by weight of the base polymer. | 09-19-2013 |
20140030520 | HALOGEN-FREE FLAME-RETARDANT POLYMER COMPOSITION, INSULATED ELECTRIC WIRE, AND CABLE - A halogen free flame-retardant polymer composition includes flame retardancy and excellent oil resistance/fuel resistance, low-temperature characteristics, and injury resistance, and an insulated electric wire and a cable include the composition. The halogen-free flame-retardant polymer composition includes a base polymer including 60 to 70% by mass of LLDPE, 10% by mass or more of EVA having a melt flow rate (MFR) of 100 or more, and 10 to 20% by mass of maleic acid-modified polyolefin, a metal hydroxide added at a ratio of 150 to 220 parts by mass relative to 100 parts by mass of the base polymer, and carbon black. The addition ratio (metal hydroxide/carbon black) between the metal hydroxide and the carbon black is 15:1 to 100:1. | 01-30-2014 |
20140083738 | NON-HALOGEN FLAME-RETARDANT INSULATED WIRE - A non-halogen flame-retardant insulated wire includes a conductor and an insulating coating layer including an inner layer and an outer layer. The inner layer includes an inner layer resin composition in which 50 to 95 parts by weight of a polyethylene with a density of 0.930 g/cm | 03-27-2014 |
20140290976 | HALOGEN-FREE EXTRA-HIGH-VOLTAGE CABLE FOR RAILWAY ROLLING STOCK - A halogen-free extra-high-voltage cable for railway rolling stock includes a stranded conductor, an inner semi-conducting layer covering the stranded conductor, an outer semi-conducting layer provided on an outer periphery of the inner semi-conducting layer via an insulation layer, and a sheath layer on an outer periphery of the outer semi-conducting layer, the sheath layer containing 80 to 200 parts by weight of metal hydroxide and 0.5 to 10 parts by weight of cross-linking agent with respect to 100 parts by weight of olefin-based polymer containing ethylene-vinyl acetate copolymer as a main component, the ethylene-vinyl acetate copolymer having a vinyl acetate content of not less than 40 wt % and less than 50 wt % and a melt flow rate of not more than 2.5 g/10 min and a resin composition is cross-linked. | 10-02-2014 |
20160125973 | CABLE - A cable includes a conductor, an insulation coating layer on the conductor, and an outer coating layer on the insulation coating layer. The insulation coating layer is made of a composition containing 100 parts by mass of a base polymer (A) and 100 to 250 parts by mass of a non-halogen flame retardant. The polymer (A) contains 70% to 99% by mass of an ethylene-vinyl acetate copolymer (a1) containing an ethylene-vinyl acetate copolymer having a melting point of 70° C. or higher, and 1% to 30% by mass of an acid-modified polyolefin resin (a2) having a glass transition point of −55° C. or lower. The polymer (A) contains 25% to 50% by mass of a vinyl acetate component derived from the copolymer (a1). The outer coating layer is made of a composition containing 100 parts by mass of a base polymer (B) and 150 to 220 parts by mass of a non-halogen flame retardant. The polymer (B) contains 60% to 70% by mass of a linear low-density polyethylene (b1), 10% by mass or more of an ethylene-vinyl acetate copolymer (b2) having a melt flow rate of 100 g/10 min or more, and 10% to 20% by mass of a maleic acid-modified polyolefin (b3). | 05-05-2016 |
Patent application number | Description | Published |
20120228154 | GAS SENSOR ELEMENT AND METHOD OF DETECTING CONCENTRATION OF TARGET DETECTION GAS - A gas sensor element has a first cell, a second cell, and a solid electrolyte layer having proton conductivity commonly used by the first cell and the second cell. The first cell has a first cathode and a first anode exposed to the target detection gas containing hydrogen atoms. The second cell has a second anode, a second cathode, and a shield layer with which the second anode is covered. A voltage is supplied to the first and second cells. A gas concentration of the target detection gas is calculated on the basis of a difference between a current of the first cell and a current of the second cell because the current in the first cell is a sum of proton conductivity current and an electron conductivity current. The current in the second cell is an electron conductive current only. | 09-13-2012 |
20130075256 | GAS SENSOR ELEMENT, GAS SENSOR, AND PRODUCTION METHOD THEREOF - A gas sensor element includes an insulating ceramic base, a solid electrolyte body, and a heating element. The solid electrolyte body is disposed in an opening of the insulating ceramic base and has a measuring electrode affixed to one of major surfaces thereof and a reference electrode affixed to the other major surface. The measuring electrode is exposed to gas to be measured. The reference electrode is exposed to a reference gas. The heating element works to activate the solid electrolyte body and is mounted on one of opposed surfaces of the insulating ceramic base on the same side as the major surface of the solid electrolyte body on which the reference electrode is disposed. Specifically, the insulating ceramic base is located between the solid electrolyte body and the heating element, thereby ensuring a desired degree of electric insulation between the heating element and the reference electrode. | 03-28-2013 |
20130092537 | GAS SENSOR ELEMENT AND GAS SENSOR - The gas sensor element includes an inner space into which a measurement gas is introduce through a diffusion resistor, a first oxygen pump cell, a second oxygen pump cell and a sensor cell. One of the electrodes formed on the opposite surfaces of the solid electrolyte body of the first oxygen pump cell and one of the electrodes formed on the opposite surfaces of the second oxygen pump cell are disposed opposite to each other across from the inner space. The other electrode of the first oxygen pump cell and the other electrode of the second oxygen pump cell are exposed to a common reference oxygen concentration gas. | 04-18-2013 |
20130152350 | GAS SENSOR ELEMENT, GAS SENSOR, AND PRODUCTION METHOD THEREOF - A gas sensor element includes an insulating ceramic base, a solid electrolyte body, and a heating element. The solid electrolyte body is disposed in an opening of the insulating ceramic base and has a measuring electrode affixed to one of major surfaces thereof and a reference electrode affixed to the other major surface. The measuring electrode is exposed to gas to be measured. The reference electrode is exposed to a reference gas. The heating element works to activate the solid electrolyte body and is mounted on one of opposed surfaces of the insulating ceramic base on the same side as the major surface of the solid electrolyte body on which the reference electrode is disposed. Specifically, the insulating ceramic base is located between the solid electrolyte body and the heating element, thereby ensuring a desired degree of electric insulation between the heating element and the reference electrode. | 06-20-2013 |
20130240354 | GAS SENSOR ELEMENT AND ITS MANUFACTURING METHOD - A gas sensor element includes a basal body, at least one solid electrolyte portion and a pair of electrodes. The basal body has a bottomed tubular shape and is made of an electrically insulative ceramic material. The basal body has a side wall and a bottom wall. The at least one solid electrolyte portion is formed in the bottom wall or the side wall of the basal body. The pair of electrodes are opposed to each other with the at least one solid electrolyte portion interposed therebetween. The difference in surface level between the basal body and the at least one solid electrolyte portion at a boundary therebetween is less than or equal to 30 μm. | 09-19-2013 |
20140305797 | LAMBDA SENSOR ELEMENT AND METHOD OF MANUFACTURING THE SAME - A lambda sensor element includes a substrate made of an insulating ceramic having a bottomed cylindrical shape, an electrolyte part made of a solid electrolyte, and a pair of electrode portions. The electrolyte part is embedded in at least a portion of the side wall of the substrate. The lambda sensor element is used by inserting a rod-like heater in the substrate having the bottomed cylindrical shape. The substrate is formed of the insulating ceramic at a contact position to the heater within the substrate. In a manufacturing of the substrate, a molded body having a space for a forming position of the electrolyte part is formed by using substrate-forming clay, and then the molded body is molded by filling electrolyte-forming clay into the space. | 10-16-2014 |
20140305798 | A/F SENSOR ELEMENT AND METHOD OF MANUFACTURING THE SAME - An A/F sensor element includes a substrate made of an insulating ceramic having a bottomed cylindrical shape, an electrolyte part made of a solid electrolyte, and a pair of electrode portions. The electrolyte part is embedded in at least a portion of the side wall of the substrate. The A/F sensor element is used by inserting a rod-like heater in the substrate having the bottomed cylindrical shape. The substrate is formed of the insulating ceramic at a contact position to the heater within the substrate. In a manufacturing of the substrate, a molded body having a space for a forming position of the electrolyte part is formed by using substrate-forming clay, and then the molded body is molded by filling electrolyte-forming clay into the space. | 10-16-2014 |
Patent application number | Description | Published |
20090024810 | Memory area management method - In a storage device, a method is provided for preventing the risk of data loss and a significant decrease of writing speed due to area shrinkage when erased erase blocks have become fewer. A process of allocating a new page includes determining whether the length of a deallocated pages list is longer than n pages. If the list length is longer, one page is allocated from the deallocated pages list. If the list length is shorter, a capacity shortage error returns. Deleting a file using an erased pages list includes determining whether a page to be processed is emptied by deleting the file. If not so, the file is deleted from the page. If so, the contents of the last page-a in occupied pages are copied to the page, the page-a is written with data for erasure, and any erase block included in the page-a is made erasable. | 01-22-2009 |
20090129173 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - The semiconductor integrated circuit device includes: a first latch which can hold an output signal of the X decoder and transfer the signal to the word driver in a post stage subsequent to the X decoder; a second latch which can hold an output signal of the Y decoder and transfer the signal to the column multiplexer in the post stage subsequent to the Y decoder; and a third latch which can hold an output signal of the sense amplifier and transfer the signal to the output buffer in the post stage subsequent to the sense amplifier. The structure makes it possible to pipeline-control a series of processes for reading data stored in the non-volatile semiconductor memory, and enables low-latency access even with access requests from CPUs conflicting. | 05-21-2009 |
20110267016 | SWITCHING REGULATION CONTROLLER, SWITCHING REGULATOR AND CONTROLLING METHOD FOR SWITCHING REGULATION - A switching regulation controller for driving a switch circuit included in a switching regulator which converts an input voltage to a target voltage, and outputs the target voltage. The switching regulation controller detects an error between the output voltage and the target voltage, and uses the detected error and a control amount generated before to generate a control amount for controlling the switch circuit so that the output voltage is coincident with the target voltage according to a given transfer function. When the detected error reaches below a given value, the switching regulation controller generates the control amount using a candidate value smaller than the control amount instead of the control amount generated before. With switching regulation controller, the switching regulator, and the controlling method for switching generation, the overshoot at the rise of an output voltage is reduced without sacrificing the rising time of the output voltage. | 11-03-2011 |
Patent application number | Description | Published |
20080260577 | CHEMILUMINESCENT DETECTION SYSTEM - Throughput is improved by increasing the number of micro-reaction chambers. There is provided a chemiluminescent detection system that has a so-called plate on which many reaction chambers are one-dimensionally or two-dimensionally arranged, characterized in that optical detection is performed using a line or area sensor having many detection pixels, the spacing of the optical detection pixels substantially matches the spacing of the reaction chambers on the plate, and the micro-reaction chambers and the pixels are made to correspond one-to-one with each other so that light from the reaction chambers on the plate enters the detection pixels most efficiently and does not scatter to other pixels. To make the micro-reaction chambers arrayed on the plate and the pixels of the image pickup element plate correspond one-to-one with each other, light-emitting substances or reflectors or photoabsorption substances are placed so as to serve as alignment marks. | 10-23-2008 |
20080317627 | CHEMILUMINESCENCE ANALYZER - The present invention aims to achieve both rapid supply of reagent substances to micro-chambers and inhibition of contamination from adjacent chambers. For achieving the above objects, the shape of a flow channel in a flow cell including a plate having micro-chambers is varied between the time of substance supply and the time of luminescence reaction. | 12-25-2008 |
20080318244 | Large-scale parallel nucleic acid analysis method - It is intended to provide a technique for amplifying, individually and in parallel, nucleic acids contained in a mixture of plural kinds of nucleic acid samples. The present invention provides a nucleic acid analysis method comprising amplification means, whereby amplification reaction is performed in a reaction solution comprising a homogeneous solvent and comprising at least plural template nucleic acids and solid phase carriers comprising one or more kinds of amplification probes immobilized on the surface, to prevent amplified products attributed to two or more template nucleic acids from being replicated in one solid phase carrier. According to the present invention, plural kinds of analyte nucleic acid samples in a mixed state can be amplified individually and in parallel. This method achieves one solid phase carrier-one nucleic acid. Therefore, a higher density of solid phase carriers with obtained amplified products is easily achieved, leading to improved throughput of amplified product analysis. Reactions in all the amplification reaction steps are performed under homogeneous solvent conditions. Therefore, the method of the present invention is performed by convenient procedures and as such, is suitable to automation. | 12-25-2008 |
20090087344 | Small size gene analysis apparatus - By the conventional technique for dispensing more than one reagents accurately, the system is complicated and thus a compact and inexpensive system is difficult to realize. In the present invention, the pressurized dispensing system utilizing a capillary is realized, and in addition, in order to reduce the leakage of reagents different from the reagent dispensed, by forming air layers at the tips of the capillaries after dispensing, a compact, simple, inexpensive analysis apparatus is realized. | 04-02-2009 |
20090215162 | Nucleic acid amplification device - This invention provides a nucleic acid amplification device whereby the abundance of a target molecule can be maintained before and after a step of separately amplifying a sample such that highly accurate analysis results that can be applied to gene expression analysis can be obtained. Also, a nucleic acid amplification device having a structure in which a plurality of minute reaction cells each comprising a set of a bead-retaining space capable of retaining a single analysis bead and a reagent reaction space retaining no bead but having a volume that is large enough to cause a reagent reaction therein are positioned so as to form a planar face is provided. | 08-27-2009 |
20110244448 | DNA DETECTING APPARATUS, DNA DETECTING DEVICE AND DNA DETECTING METHOD - A chemiluminescence detecting apparatus includes a thing called a plate where many reaction chambers are one-dimensionally or two-dimensionally arranged, and enzymes packed in a gel and DNA-immobilized beads are simultaneously charged into the reaction chambers, thereby trapping a large amount of enzymes in the reaction chambers, improving enzyme activity and achieving high sensitive pyrosequencing. | 10-06-2011 |
20120270210 | METHOD AND REAGENT FOR GENE SEQUENCE ANALYSIS - Provided is a nucleic acid substrate which has nucleic acid substrate characteristics equivalent to those of dATP, has a low substrate specificity for luciferase, exerts no negative effect on enzymatic reactions such as a complementary-strand synthesis, and therefore is particularly suitable for the pyrosequencing method. As a nucleic acid substrate complementary to nucleotide T, a 7-substituted deoxyribonucleotide triphosphate whose 7-position of a purine group is modified by a substituent is used as a substitute for a nucleotide α-thiotriphosphate analog. | 10-25-2012 |
20150159202 | METHODS FOR QUANTITATIVE cDNA ANALYSIS IN SINGLE-CELL - A method of synthesizing cDNA, in sequence, includes picking up a whole single-cell from a sample containing at least a single-cell having a cell membrane, lysing the cell membrane and extracting nucleic acids from the cell, degrading DNA of the extracted nucleic acids with DNase, hybridizing mRNA of the total RNA contained in the whole single-cell with oligo (dT) fixed onto a carrier, performing reverse transcription of the mRNA hybridized with the oligo (dT) to fix cDNA derived from the single-cell onto the carrier, thereby preparing a single-cell derived cDNA library fixed onto a carrier, and amplifying cDNA fixed onto the carrier. | 06-11-2015 |