Patent application number | Description | Published |
20080210883 | Liquid metal ion gun - An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture. | 09-04-2008 |
20080290291 | Charged Particle Beam Processing Apparatus - In view of the fact that in line processing, when processing is performed to a certain depth, the processing does not advance with the passage of a further processing time, a processing apparatus is provided which can appropriately control the depth of grooves in linear groove processing and perform the processing at high speed. A line width and line depth are calculated so as to minimize a processing time of processing on a line to a required depth and processing is performed using the width and line depth as set values of processing. Furthermore, processing is performed with the area in which the beam is actually irradiated superimposed on the scanned image of a focused ion beam and displayed on a screen. In the case of an ion beam inclined with respect to the sample surface, processing is also performed by displaying the area where the beam is actually irradiated by taking the inclination of the sample with respect to the beam into consideration. | 11-27-2008 |
20090256081 | FOCUSED ION BEAM APPARATUS - An object of the present invention is to provide a focused ion beam apparatus that is capable of obtaining a much larger beam current and forming a focused ion beam with smaller aberration than a conventional focused ion beam apparatus no matter whether the level of acceleration is high or low. The focused ion beam apparatus according to the present invention includes a liquid metal ion source, an extraction electrode for extracting an ion beam from the liquid metal ion source, an acceleration (ground) electrode for accelerating an ion beam, and an electrostatic lens for converging an ion beam. When the acceleration voltage applied to the liquid metal ion source is lower than an emission threshold voltage of the liquid metal ion source, the voltage of the extraction electrode is at a lower potential than the voltage of the acceleration (ground) electrode. The polarity of a voltage applied to the electrostatic lens changes in accordance with the polarity of a voltage applied to the extraction electrode. The present invention makes it possible to exercise a deceleration mode focusing method at a high acceleration voltage from the dielectric strength voltage of an electrostatic lens and exercise an acceleration mode focusing method at a low acceleration voltage with an electrostatic lens having the same focal length as for the deceleration mode focusing method. | 10-15-2009 |
20120126684 | LIQUID METAL ION GUN - A liquid metal ion gun | 05-24-2012 |
20130119252 | GAS FIELD ION SOURCE AND METHOD FOR USING SAME, ION BEAM DEVICE, AND EMITTER TIP AND METHOD FOR MANUFACTURING SAME - To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more. | 05-16-2013 |
Patent application number | Description | Published |
20090027405 | IMAGE PROCESSING DEVICE AND IMAGE PROCESSING METHOD - According to one embodiment, an image processing device of the invention includes a storage portion which stores EDID information, a communication portion which executes communication based on HDMI standard with another image processing device through a communication passage, supplies the EDID information stored in the storage portion and receives an image/sound signal from the another image processing device, a reproducing portion which reproduces the image/sound signal received by the communication portion, and a changing portion which changes the EDID information stored in the storage portion when the reproducing portion cannot reproduce the image/sound signal properly. | 01-29-2009 |
20090044223 | BROADCAST/VOD RECEIVER AND VIEWING MANAGEMENT METHOD - According to one embodiment, a broadcast/VOD receiver comprises a broadcast reception processing unit which selectively receives broadcast signals and reproduces content of broadcast programs, a VOD communication processing unit which communicates with a server providing VOD content to acquire the VOD content, an EPG information acquisition unit which acquires EPG information, a viewing reservation unit which makes reservations for viewing the VOD content to the server, a display data generation unit which creates a schedule table of the broadcast programs on the basis of the EPG information, adds list information columns displaying list information of the VOD content on the schedule table, and inserts viewing schedules corresponding to viewing reservations for the VOD content to the list information columns to generate display data, and a display processing unit which reproduces to output the display data and display the schedule table on a display screen of a display unit. | 02-12-2009 |
20100100902 | Device Name Editing Apparatus and Device Name Display Method - According to an aspect of the invention, a device name editing apparatus includes: a connector to which a device is connected; a display unit configured to display a device name of the device; and a device name editor configured to allow a user to input character information so as to edit the device name to be displayed on the display unit. | 04-22-2010 |
20110058791 | RECORDING CONTROLLER AND RECORDING CONTROL METHOD - A recording controller includes: a presentation module configured to perform a presentation for simultaneously presenting a first item for selecting each broadcast channel to be recorded from a plurality of broadcast channels and a second item for setting each recording time range in accordance with the selected broadcast channel; a table configured to store each broadcast channel selected and each recording time range set based on the presentation; and a recording control module configured to control recording of signals of the selected broadcast channels on a recording medium in accordance with the table. | 03-10-2011 |
Patent application number | Description | Published |
20130038668 | PRINT PREPARATION METHOD - Provided is a print preparation method possessing an ejection step in which liquid drops of actinic energy radiation curable type ink-jet ink each containing a polymerizable compound, a photo-polymerizable initiator and a gelling agent are injected from an ink-jet recording head to supply the actinic energy radiation curable type ink-jet ink onto a recording medium, and an actinic energy radiation exposure step, wherein the print preparation method further comprises step (A) in which the recording medium is exposed to electromagnetic waves having a longer wavelength than a wavelength of an absorption wavelength of the photo-polymerization initiator contained in the actinic energy radiation curable type ink-jet ink from a side of a surface on which the image is formed, before conducting the actinic energy radiation exposure step, the print preparation method by which a print having images exhibiting excellent image wear resistance, gloss evenness and image density evenness is provided. | 02-14-2013 |
20130044168 | INK-JET IMAGE FORMING METHOD AND INK-JET INK SET - In the present invention, provided are an ink jet image forming method employing actinic energy radiation curable ink-jet ink exhibiting no offset resistance during storage by superposing printed portions after printing in addition to excellent properties of printing durability, gloss evenness of coated paper and paper-feeding suitability, and an ink jet ink set thereof. It is a feature that the ink jet image forming method possessing the steps of providing colorless ink on a substrate, followed by heating the colorless ink provided on the substrate, and subsequently exposing the colorless ink provided on the substrate, to actinic energy radiation, wherein the colorless ink contains no colorant but an actinic energy radiation curable composition and a gelling agent with which a thermoreversible gel is formed. | 02-21-2013 |
Patent application number | Description | Published |
20110143111 | Insert molding method and insert molded product - An insert molding method includes holding a plurality of insert members in a molding die to be separated from one another, and subsequently filling a resin into the molding die to fill a gap between the insert members and a periphery thereof with the resin to form an insert molded product such that the insert members are separated at a preset interval from one another. The molding die includes a space-maintaining projection for maintaining a separation interval between the insert members at the preset interval or more, the projection being formed on an inner wall surface of the molding die opposite to a longitudinal end of the insert members, and a gate for filling the resin therethrough into the molding die, the gate being formed on an inner wall surface of the molding die opposite to a side of the insert members in a width direction thereof. | 06-16-2011 |
20130087361 | FOAMED RESIN COMPOSITION, WIRE AND CABLE - A foamed resin composition includes syndiotactic polystyrene, and a polyolefin resin of not less than 5.3 parts by weight and not more than 54 parts by weight relative to 100 parts by weight of the syndiotactic polystyrene. Alternatively, a foamed resin composition includes syndiotactic polystyrene, and fluorine-resin-containing powder of not less than 0.5 parts by weight and not more than 10 parts by weight relative to 100 parts by weight of the syndiotactic polystyrene. | 04-11-2013 |
20130175081 | DIFFERENTIAL SIGNAL TRANSMISSION CABLE - A differential signal transmission cable includes a pair of differential signal lines arranged in parallel to each other, an insulation for bundle-covering the pair of differential signal lines, and a shield conductor wound around an outer periphery of the insulation The insulation is configured such that an outer circumference thereof in a cross section perpendicular to a longitudinal direction thereof has an oval shape formed with a continuous convex arc-curve The oval shape has a width in a first direction along the arrangement direction of the pair of differential signal lines being larger than a width in a second direction orthogonal to the first direction | 07-11-2013 |
20130180752 | PARALLEL FOAMED COAXIAL CABLE - A parallel foamed coaxial cable includes one or more pairs of inner conductors aligned in parallel, a foamed insulation covering together the inner conductors and having a cross sectional shape including an elliptical shape, a rounded-rectangular shape or a quasi-elliptical shape formed by combining a plurality of curved lines, a non-foamed skin layer covering the foamed insulation and having a maximum thickness in a major axis direction of the cross sectional shape of the foamed insulation and a minimum thickness in a minor axis direction of the cross sectional shape of the foamed insulation, an outer conductor covering the non-foamed skin layer, and an insulation jacket covering the outer conductor. The maximum thickness of the non-foamed skin layer is not less than 1% of a major axis of the cross sectional shape of the foamed insulation. | 07-18-2013 |
20130233589 | DIFFERENTIAL TRANSMISSION CABLE AND METHOD OF MANUFACTURING THE SAME - A differential transmission cable includes at least one pair of inner conductors arranged in parallel and extending parallel to each other, and a foamed insulating material formed on the inner conductors by a collective extrusion coating and molding of a resin material by using a chemical foaming method and have a variation of foaming degree of not more than 1%. The variation of foaming degree is defined as a difference between a maximum value and a minimum value among foaming degrees (%) of the foamed insulating material at 20 positions at intervals of 50 cm in a longitudinal direction in an arbitrary part of 10 m cut out from the differential transmission cable. | 09-12-2013 |
20130319724 | DIFFERENTIAL SIGNAL TRANSMISSION CABLE - A differential signal transmission cable includes a pair of differential signal lines arranged in parallel to each other, an insulation for bundle-covering the pair of differential signal lines, and a shield conductor wound around an outer periphery of the insulation. The insulation is configured such that an outer circumference thereof in a cross section perpendicular to a longitudinal direction thereof has an oval shape formed with a continuous convex arc-curve. The outer circumference of the insulation includes a first curved portion with a pair of symmetrical elliptical arcs located at both ends in a first direction along the arrangement direction of the pair of differential signal lines and a second curved portion with a pair of symmetrical elliptical arcs located at both ends in a second direction orthogonal to the first direction. | 12-05-2013 |
20140090869 | DIFFERENTIAL SIGNAL TRANSMISSION CABLE AND METHOD OF MAKING SAME - A differential signal transmission cable includes two core wires, and a foamed insulation that collectively covers the two core wires by foaming extrusion molding. The foamed insulation is not more than 5% in a dispersion of foaming degree defined below in a cut surface when the cable is cut orthogonally to a longitudinal direction of the cable. In the cut surface, five regions are determined according to a predetermined procedures and a foaming degree (%) of the respective regions is measured. The dispersion of the foaming degree is defined by a difference between a foaming degree (%) in the region with a maximum foaming degree and a foaming degree (%) in the region with a minimum foaming degree. | 04-03-2014 |
20150162113 | DIFFERENTIAL SIGNAL CABLE AND PRODUCTION METHOD THEREFOR - A differential signal cable is composed of two inner conductors, an insulator, which covers the two inner conductors separately or together, and an outer conductor, which covers a circumference of the insulator. When measured in a cable length of 1 m, an effective capacitance difference ΔX represented by Formula (1) below is not greater than 0.2 percent of an average value C of capacitances of the two inner conductors, | 06-11-2015 |
Patent application number | Description | Published |
20120135278 | REDOX FLOW BATTERY - A redox flow battery comprising an electrode cell including a negative electrode cell, a positive electrode cell and a separator for separating them, in which at least one of the negative electrode cell and the positive electrode cell includes a slurry type electrode solution, a porous current collector and a casing; a tank for storing the slurry type electrode solution; and a pipe for circulating the slurry type electrode solution between the tank and the electrode cell. | 05-31-2012 |
20130015076 | HYDROGEN PRODUCTION DEVICE AND METHOD FOR PRODUCING HYDROGENAANM Yoshida; AkihitoAACI Osaka-shiAACO JPAAGP Yoshida; Akihito Osaka-shi JPAANM Sata; ShunsukeAACI Osaka-shiAACO JPAAGP Sata; Shunsuke Osaka-shi JPAANM Kaga; MasakiAACI Osaka-shiAACO JPAAGP Kaga; Masaki Osaka-shi JP - There is provided a hydrogen production device which is high in the light use efficiency and can produce hydrogen with high efficiency without decreasing the hydrogen generation rate. | 01-17-2013 |
20130068296 | SOLAR-CELL-INTEGRATED GAS PRODUCTION DEVICE - The present invention provides a solar-cell-integrated gas production device that can generate a first gas and a second gas by utilizing an electromotive force of a solar cell, and that can supply power to an external circuit by utilizing the same solar cell. | 03-21-2013 |
20130180862 | HYDROGEN PRODUCTION DEVICE AND METHOD FOR PRODUCING HYDROGEN - A hydrogen production device of the present invention includes a photoelectric conversion portion having a light-receiving surface and a back surface, a first electrolysis electrode provided on the back surface, and a second electrolysis electrode provided on the back surface. As a result of reception of light by the photoelectric conversion portion, a potential difference is generated between a first area on the back surface and a second area on the back surface, the first area becomes electrically connected to the first electrolysis electrode, and the second area becomes electrically connected to the second electrolysis electrode. When the first electrolysis electrode and the second electrolysis electrode contact an electrolyte solution, the first electrolysis electrode forms a hydrogen generation portion that generates H | 07-18-2013 |
20130280623 | METAL-AIR BATTERY AND ENERGY SYSTEM - The present invention has been achieved to provide a metal-air battery that allows removal of a metallic compound without suspending power supply. The metal-air battery of the present invention includes: first and second electrolytic tanks for storing an electrolytic solution; a metallic electrode to serve as an anode provided in the first electrolytic tank; and an air electrode to serve as a cathode, wherein the metallic electrode is formed of a metal which becomes a metallic ion or composes a metallic compound in the electrolytic solution with progress of a battery reaction, the first and second electrolytic tanks are communicated with each other for allowing the electrolytic solution in the first electrolytic tank to move into the second electrolytic tank, and the metallic ion or the metallic compound in the electrolytic solution is precipitated as a metallic compound precipitate in the second electrolytic tank. | 10-24-2013 |
20150295291 | ELECTRODE BODY FOR BATTERIES, ANODE, AND METAL AIR BATTERY - An electrode body for batteries of the invention includes a first metal portion configured to include metal as an electrode active material as a main component, a first structural member configured to cover a part of a surface of the first metal portion, and a coating member configured to cover the other part of the surface of the first metal portion. The first metal portion, the first structural member, and the coating member are provided such that the first metal portion is divided between the first structural member and the coating member or the coating member is separated from the first metal portion to expose the metal included in the first metal portion. | 10-15-2015 |
Patent application number | Description | Published |
20130020530 | LIQUID COOLING COMPOSITION - Disclosed is a cooling liquid composition, which has an excellent ability to prevent the corrosion of mainly a metal constituting a cooling system for an internal combustion engine or the like, particularly an iron-based metal, or alumninum or an aluminum alloy, and also can effectively inhibit cavitation damage. The composition contains a glycol as a base material, wherein the composition does not contain p-tert butyl benzoate or an alkali metal salt thereof, but contains (a) 0.05-0.5% by mass of silicic acid or an alkali metal salt thereof, (b) 0.1-8% by mass of sebacic acid or an alkali metal salt thereof, (c) 0.1-10% by mass of toluic acid or an alkali metal salt thereof, and (d) 0.001-0.5% by mass of at least one compound selected from a strontium compound, a magnesium compound, and a calcium compound. | 01-24-2013 |
20140323371 | WORKING FLUID - A working fluid whose base material is a glycol, characterized in that such working fluid contains a modified silicone oil. | 10-30-2014 |
20150152312 | LIQUID COOLANT COMPOSITION - Provide a liquid coolant composition whose base material is a glycol, wherein such liquid coolant composition contains: (a) 0.1 to 8 percent by weight of an aliphatic dicarboxylic acid having 8 to 18 carbon atoms or alkali metal salt thereof; (b) 0.1 to 10 percent by weight of an alkyl benzoic acid having 7 to 18 carbon atoms or alkali metal salt thereof; and (c) 0.1 to 5 percent by weight of an aliphatic monocarboxylic acid having 6 to 18 carbon atoms or salt thereof. | 06-04-2015 |
Patent application number | Description | Published |
20100245983 | DISPLAY MEDIA PARTICLES AND INFORMATION DISPLAY PANEL USING THE SAME - A display media particle used for an information display panel having display media constituted of particles sealed between two substrates, at least one of which is transparent, for displaying information by moving the display media, is formed of a mother particle | 09-30-2010 |
20110228377 | PARTICLES FOR DISPLAY MEDIA AND INFORMATION DISPLAY PANEL USING THE SAME - The present invention provides an information display panel capable of maintaining an excellent image property even after repeated rewrite, and particles for display media used therefor. The information display panel, in which at least one kind of display media including a charged particle for display media are sealed in a space between substrates at least one of which is transparent, for displaying an image by application of electrostatic force to the display media by means of an electronic field forming means, uses the particle for display media comprised of a mother particle, child particles and fine particles. The child particles, having a molecular structure of three-dimensional crosslinked structure and a particle diameter smaller than that of the mother particle which has no molecular structure of three-dimensional crosslinked structure, are embedded in a surface of the mother particle. It thereby hardens the surface of the mother particle. Then, the fine particles having the particle diameter smaller than that of the child particles are attached to the mother particle having the child particles embedded therein, it is thus possible to prevent the fine particles from being buried in the mother particles. | 09-22-2011 |
20150303339 | PAIR OF SEALING FILMS FOR SOLAR CELL AND METHOD FOR PRODUCING SOLAR CELL MODULE USING SAME - To provide a sealing film for a solar cell, which can be effectively formed and is capable of preventing wraparound even if heating is performed in a wide temperature range when members of the solar cell module are integrated. | 10-22-2015 |
Patent application number | Description | Published |
20140366945 | SOLAR CELL SEALING FILM AND SOLAR CELL USING THE SAME - The present invention provides a solar cell sealing film whereby generation of gas is decreased. The solar cell sealing film comprises a resin mixture of an ethylene-vinyl acetate copolymer and a polyethylene, and an organic peroxide. The mass ratio (EVA:PE) of the ethylene-vinyl acetate copolymer (EVA) to the polyethylene (PE) is 8:2 to 3:7, the content of the organic peroxide is 0.1 to 1.0 parts by mass based on 100 parts by mass of the resin mixture, and the gel rate after crosslinking is 20 to 80% by mass. | 12-18-2014 |
20150038646 | COMPOSITION FOR PRODUCING SHEET FOR FORMING LAMINATE, PROCESS FOR PRODUCING THE SAME, AND SHEET FOR FORMING LAMINATE - To provide a composition for producing a sheet for forming a laminate, which contains an ethylene-vinyl acetate copolymer and a polyethylene resin, by which the above-described problems in the width of the temperature range in which a processable viscosity range is obtained and the like are improved and which excels in processing properties such as a film-forming property when producing a sheet, and a sheet for forming a laminate using this. A composition for producing a sheet for forming a laminate, which contains an ethylene-vinyl acetate copolymer and polyethylene, wherein the composition has a sea-island structure in which the ethylene-vinyl acetate copolymer is a sea phase and the polyethylene is an island phase, and a sheet for forming a laminate using this. | 02-05-2015 |
20150267012 | CURED SHEET, LAMINATE HAVING THE SAME AND PROCESS FOR MANUFACTURING THE LAMINATE - There is provided a cured sheet and a laminate having the same, wherein the cured sheet is prepared by curing a laminate forming sheet containing an ethylene-vinyl acetate copolymer and a polyethylene, excellent in adhesion durability and has a sufficient flexibility even in the case of a high content of the polyethylene. A cured sheet constituting a laminate and a laminate having the same, wherein the cured sheet is prepared by curing through cross-linking a laminate forming sheet comprising a composition containing an ethylene-vinyl acetate copolymer, a polyethylene and an organic peroxide; a weight ratio of the ethylene-vinyl acetate copolymer (EVA) to the polyethylene (PE) (EVA:PE) is in a range of 3:7 to 8:2; and the cured sheet has a sea-island structure wherein the ethylene-vinyl acetate copolymer constitutes a sea phase and the polyethylene constitutes an island phase. | 09-24-2015 |
Patent application number | Description | Published |
20100134755 | PROGRESSIVE-POWER LENS - An eye-side refractive surface | 06-03-2010 |
20100290001 | PROGRESSIVE-POWER LENS - An eye-side refractive surface | 11-18-2010 |
20110317127 | Progressive Power Eyeglass Lens and Design Method Thereof - A progressive power eyeglass lens includes an object side surface that includes a first progressive surface, an eyeball side surface that includes a second progressive surface, and a pair of points that is passed by a light beam passing through a rotation center of an eyeball of an eyeglasses wearer, the pair of points including a first point that exists on a principal meridian on the eyeball side surface between a progressive start point to a progressive end point, and a second point that exists on a principal meridian on the object side surface. | 12-29-2011 |
20120062837 | Progressive-Power Spectacle Lens Design Method - A progressive-power spectacle lens design method, the progressive-power spectacle lens including a distance portion, a near portion, and a progressive portion provided between the distance portion and the near portion, the method comprising: decreasing a distance along a principal meridian from a fitting point to a progression start point and increasing a length of a progressive corridor defined by the progression start point and a progression end point when addition power is large, whereas increasing the distance along the principal meridian from the fitting point to the progression start point and decreasing the length of the progressive corridor when the addition power is small, wherein the distance from the fitting point to the progression end point is fixed irrespective of the addition power. | 03-15-2012 |
20120200822 | PROGRESSIVE-POWER LENS - An eye-side refractive surface | 08-09-2012 |
20120274893 | Spectacle Lens, Spectacle Lens Design Method, and Design Apparatus - A spectacle lens includes a first region which is located in at least part of a portion of a lens where a pivotal angle of an eyeball of a wearer ranges from 20 to 60 degrees and in which correcting astigmatism has priority over correcting average power based on prescribed power, and a second region which is formed inside the first region and in which correcting the average power has priority over correcting the astigmatism. | 11-01-2012 |
20130083288 | Optical Lens, Method for Designing Optical Lens, and Apparatus for Manufacturing Optical Lens - optical lens including, an object-side surface including an atoric surface element and an eyeball-side surface including an element that cancels a surface power shift produced by the atoric surface element, wherein the atoric surface element causes horizontal surface power at a fitting point to be greater than vertical surface power at the fitting point and causes a difference between the horizontal surface power and the vertical surface power to decrease along a horizontal reference line passing through the fitting point in a direction from the fitting point toward a periphery of the optical lens or causes a sign of the difference between the horizontal surface power and the vertical surface power to change along the horizontal reference line. | 04-04-2013 |
Patent application number | Description | Published |
20080284978 | SPECTACLE LENS DESIGN METHOD - A spectacle lens design method for designing a spectacle lens attached to a spectacle frame having a bend angle of 200 degrees or larger includes: setting a distance portion, a near portion having power different from power of the distance portion, and a progressive portion which is disposed between the distance portion and the near portion and has power progressively varying on at least either an object side refractive surface or an eyeball side refractive surface included in the spectacle lens; adding astigmatic power for canceling aberration produced by the bend angle of the spectacle frame at a design reference point of the distance portion to the entire distance portion and astigmatic power for canceling aberration produced by the bend angle of the spectacle frame at a design reference point of the near portion to the entire near portion on either the object side refractive surface or the eyeball side refractive surface of the spectacle lens; determining an aspherical surface addition quantity which provides the optimum optical properties throughout the object side refractive surface or the eyeball side refractive surface of the spectacle lens; and adding prismatic power for canceling prismatic power produced by the bend angle of the spectacle frame at the design reference point of the distance portion to the entire distance portion and prismatic power for canceling prismatic produced by the bend angle of the spectacle frame at the design reference point of the near portion to the entire near portion on either the object side refractive surface or the eyeball side refractive surface of the spectacle lens. | 11-20-2008 |
20090086162 | Method for Designing Spectacle Lens, and Spectacles - A method for designing a spectacle lens that includes an optical convex surface on an object side of the spectacle lens and an optical concave surface on an eye side of the spectacle lens and is mounted in a spectacle frame in a manner tilting with respect to a forward sight line, the optical convex surface being spherical, the optical concave surface being optically curved according to a prescription, the method including: defining a design reference point at an intersection of the optical concave surface and the forward sight line; and determining an angle formed by a tangent line at the design reference point and a perpendicular plane perpendicular to the forward sight line as a lens tilt angle θ with which the spectacle lens is mounted in the spectacle frame. | 04-02-2009 |
20090248377 | Simulation Apparatus, Simulation Program, and Recording Medium Recorded with Simulation Program - A simulation apparatus includes: a design data acquiring unit that acquires lens design data; a lens design unit that designs a lens on the basis of the lens design data; an image data acquiring unit that acquires image data corresponding to a lens user's visual sense; a visual motion characteristic data acquiring unit that acquires visual motion characteristic data regarding the motion of head and eyes when the lens user moves the eyes to various observation objects; an image processing unit that creates processing image data which is the image data seen through the design lens designed by the lens design unit; an image moving unit that moves the processing image data created by the image processing unit; an image data control unit that controls a movement amount of the processing image data, which is moved by the image moving unit, on the basis of the visual motion characteristic data; and a display unit that displays the processing image data. | 10-01-2009 |
20100179799 | Simulation Device, Simulation Program, and Recording Medium Storing Simulation Program - A simulation device includes: a design data acquisition section adapted to acquire lens design data; a lens designing section adapted to design a lens based on the lens design data; an original image data acquisition section adapted to acquire original image data constituting an observation virtual space to be an object of observation by a lens user; a visual motion characteristic data acquisition section adapted to acquire visual motion characteristic data related to motions of a head and eyeballs when the lens user transfers an visual axis to various observation targets; an image processing section adapted to generate processed image data as the original image data viewed through a designed lens designed by the lens designing section; an image moving section adapted to move the processed image data; an image data control section adapted to control a moving distance of the processed image data moved by the image moving section based on the visual motion characteristic data; and a display section adapted to display the processed image data. | 07-15-2010 |
20100245763 | Progressive Power Lens And Method Of Designing The Same - A progressive power lens that prevents degradation in optical characteristics invited by deviation of a pantoscopic angle from the standard value. The lens includes an outer refractive surface and an inner refractive surface, at least one of which is a progressive surface. Because the amount and direction of aberrations generated in distance and near portions are different, correction is given to either or both of the surface powers of the outer and inner surfaces of the lens such that the distance and near portions are differently corrected. | 09-30-2010 |
Patent application number | Description | Published |
20090327629 | Remote Copy Method and Remote Copy System - In a configuration in which it is necessary to transfer data from a first storage system to a third storage system through a storage system between the storage systems, there is a problem that it is inevitable to give an excess logical volume to a second storage system between the storage systems. A remote copy system includes first storage system that sends and receives data to and from an information processing apparatus, a second storage system, and a third storage system. The second storage system virtually has a second storage area in which the data should be written and has a third storage area in which the data written in the second storage area and update information concerning the data are written. Data sent from the first storage system is not written in the second storage area but is written in the third storage area as data and update information. The data and the update information written in the third storage area are read out from the third storage system. | 12-31-2009 |
20100199038 | REMOTE COPY METHOD AND REMOTE COPY SYSTEM - In a configuration in which it is necessary to transfer data from a first storage system to a third storage system through a storage system between the storage systems, there is a problem that it is inevitable to give an excess logical volume to a second storage system between the storage systems. A remote copy system includes first storage system that sends and receives data to and from an information processing apparatus, a second storage system, and a third storage system. The second storage system virtually has a second storage area in which the data should be written and has a third storage area in which the data written in the second storage area and update information concerning the data are written. Data sent from the first storage system is not written in the second storage area but is written in the third storage area as data and update information. The data and the update information written in the third storage area are read out from the third storage system. | 08-05-2010 |
20100262777 | STORAGE APPARATUS AND METHOD FOR ELIMINATING REDUNDANT DATA STORAGE USING STORAGE APPARATUS - A storage apparatus | 10-14-2010 |
20120290787 | REMOTE COPY METHOD AND REMOTE COPY SYSTEM - A remote copy system includes: a first storage system having a first logical volume accompanied with a first plurality of disk drives in the first storage system; a second storage system having a second logical volume, which is a virtual volume not accompanied with a second plurality of disk drives in the second storage system, the virtual volume configuring a first remote copy pair with the first logical volume; and a third storage system having a third logical volume accompanied with a third plurality of disk drives in the third storage system, the third logical volume configuring a second remote copy pair with the virtual volume and storing a copied data of data stored in the first logical volume. If the second storage system receives write data sent from the first storage system to the virtual volume, the second storage system transfers the write data to the third logical volume. | 11-15-2012 |
20140122635 | COMPUTER SYSTEM AND DATA MANAGEMENT METHOD - A computer system comprises a computer, a storage system comprising multiple storage apparatuses, and an edge storage apparatus. The edge storage apparatus stores identification information, which makes it possible to identify a volume, and first access information for accessing a logical storage apparatus, which stores volume data of the volume after associating the identification information with the first access information, a storage apparatus (A1) executes processing for transferring the volume data from a migration source to a logical storage apparatus, which is a migration destination, (A2) stores second access information for accessing the migration-destination logical storage apparatus in the storage apparatus, and (A3) sends the second access information, and the edge storage apparatus (B1) receives the second access information, and (B2) associates the second access information with the identification information enabling the identification of the volume, and stores the associated information in the storage apparatus. | 05-01-2014 |
Patent application number | Description | Published |
20110138187 | SYSTEM AND METHOD OF BIOMETRIC AUTHENTICATION USING MULTIPLE KINDS OF TEMPLATES - In additional enrollment of a template in a biometric authentication system, the template is automatically enrolled on the basis of a plurality of authentication results to assure a user's convenience and security. A post-migration authentication server receives a first template and a second template from a post-migration authentication terminal, performs authentication on the basis of the comparison result between the received first template and the user's preliminarily first enrolled template, and provisionally enrolls the first template and the second template. It repeats the reception, authentication, and provisional enrollment and calculates a match probability from a plurality of comparison results of the provisionally first enrolled templates, determines whether or not to store a second enrolled template on the basis of the match probability, and automatically enrolls the second template in the post-migration authentication server. | 06-09-2011 |
20130013527 | IMMIGRATION CONTROL SYSTEM - The present invention provides a system and a method for speeding up immigration. In first immigration, first biometric information is stored in a immigration biometric information DB. A normal immigration client terminal displays a first result of comparing an ID information watch list with a biometric information watch list. In subsequent second immigration, the first biometric information in the immigration biometric information DB is compared with second biometric information obtained by a simplified immigration client terminal. Then, the simplified immigration client terminal displays a second result of comparing the first biometric information with the watch list information that is added after the first comparison is done. Thus even if the number of registrations in a watch list database is large, a small amount of similar watch list information is displayed, reducing the time for checking the results by the operator. | 01-10-2013 |
20130179957 | PERSONAL IDENTIFICATION SYSTEM AND METHOD - The present invention shortens the time required for watch list verification, and shortens the time required generally for the personal identification processing which includes watch list verification. In a personal identification system, a biometric information watch list comparison function ( | 07-11-2013 |
Patent application number | Description | Published |
20090039477 | SILICON NITRIDE SUBSTRATE, A MANUFACTURING METHOD OF THE SILICON NITRIDE SUBSTRATE, A SILICON NITRIDE WIRING BOARD USING THE SILICON NITRIDE SUBSTRATE, AND SEMICONDUCTOR MODULE - In the silicon nitride substrate concerning an embodiment of the invention, degree of in-plane orientation fa of β type silicon nitride is 0.4-0.8. Here, degree of in-plane orientation fa can be determined by the rate of the diffracted X-ray intensity in each lattice plane orientation in β type silicon nitride. As a result of research by the inventors, it turned out that both high fracture toughness and high thermal conductivity are acquired, when degree of in-plane orientation fa was 0.4-0.8. Along the thickness direction, both the fracture toughness of 6.0 MPa·m | 02-12-2009 |
20090101392 | CIRCUIT BOARD AND SEMICONDUCTOR MODULE USING THIS, PRODUCTION METHOD FOR CIRCUIT BOARD - An object of this invention is to get a circuit board and a semiconductor module with high endurance against thermal cycles, and which is hard to be broken under thermal cycles, even if thick metal circuit board and thick metal heat sink are used, corresponding to high power operation of semiconductor chip. This circuit board comprises, an insulating-ceramic substrate, a metal circuit plate bonded to one face of the insulating-ceramic substrate, a metal heat sink bonded to another face of the insulating-ceramic substrate, wherein (t | 04-23-2009 |
20110176277 | SILICON NITRIDE SINTERED BODY, METHOD OF PRODUCING THE SAME, AND SILICON NITRIDE CIRCUIT SUBSTRATE AND SEMICONDUCTOR MODULE USING THE SAME - Provided are a silicon nitride substrate made of a silicon nitride sintered body that is high in strength and thermal conductivity, a method of producing the silicon nitride substrate, and a silicon nitride circuit substrate and a semiconductor module that use the silicon nitride substrate. | 07-21-2011 |
Patent application number | Description | Published |
20130156164 | EVALUATION AID - The present invention provides an evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray image thereof is taken and then evaluation is carried out through the digital X-ray image, and especially an evaluation aid which can be used for easily evaluating image qualities of a digital X-ray image for X-ray absorption parts having different X-ray absorption ratios at once. The evaluation aid of the present invention is adapted to be used for taking a digital X-ray image thereof through which evaluation is carried out, and contains a substrate (plate-like body) including a plurality of regions having different X-ray absorption ratios; and step members provided on the plate-like body so as to correspond to the plurality of regions, respectively, each step member including a plurality of subregions having different X-ray absorption ratios. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the substrate are different from each other, so that these regions have the different X-ray absorption ratios. | 06-20-2013 |
20140146950 | EVALUATION AID AND EVALUATION DEVICE - The present invention provides an evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and then evaluation is carried out through the digital X-ray dynamic image, and especially an evaluation aid which can be used for evaluating image qualities of a digital X-ray dynamic image for X-ray absorption parts having different X-ray absorption ratios, and an evaluation device provided with such an evaluation aid. The evaluation aid of the present invention is adapted to be used for taking a digital X-ray dynamic image thereof through which evaluation is carried out, and contains a fixed plate (plate-like body) including a plurality of regions having different X-ray absorption ratios; a rotating disk (movable body) having a plurality of wires (wire rods), the rotating disk capable of rotating (moving) with respect to the fixed plate so that the plurality of wires traverse X-ray with which the fixed plate is irradiated; and a driving motor (driving portion) which rotates (moves) the rotating disk with respect to the fixed plate. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the fixed plate are different from each other, so that these regions have the different X-ray absorption ratios. | 05-29-2014 |
20150182186 | EVALUATION AID - The present invention provides an evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray image thereof is taken and then evaluation is carried out through the digital X-ray image, and especially an evaluation aid which can be used for easily evaluating image qualities of a digital X-ray image for X-ray absorption parts having different X-ray absorption ratios at once. The evaluation aid of the present invention is adapted to be used for taking a digital X-ray image thereof through which evaluation is carried out, and contains a substrate (plate-like body) including a plurality of regions having different X-ray absorption ratios; and step members provided on the plate-like body so as to correspond to the plurality of regions, respectively, each step member including a plurality of subregions having different X-ray absorption ratios. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the substrate are different from each other, so that these regions have the different X-ray absorption ratios. | 07-02-2015 |
Patent application number | Description | Published |
20110183519 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - A method of manufacturing a semiconductor device and a substrate processing apparatus capable of providing a TiN film that is higher in quality than a TiN film formed by a conventional CVD method at a higher film-forming rate, that is, with a higher productivity than a TiN film formed by an ALD method. The method includes steps of: (a) loading a substrate into a processing chamber; (b) forming a predetermined film on the substrate by simultaneously supplying the first processing gas and the second processing gas into the processing chamber; (c) stopping the supply of the first processing gas and the second processing gas and removing the first processing gas and the second processing gas remaining in the processing chamber; (d) modifying the film formed on the substrate by supplying the second processing gas into the processing chamber after the step (c); and (e) unloading the substrate from the processing chamber, wherein, in the step (b), a time period for supplying the second processing gas into the processing chamber is longer than a time period for supplying the first processing gas into the processing chamber. | 07-28-2011 |
20110186984 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device which are able to form a conductive film, which is dense, includes a low concentration of source-derived impurities and has low resistivity, at a higher film-forming rate. The substrate processing apparatus includes a processing chamber configured to stack and accommodate a plurality of substrates; a first processing gas supply system configured to supply a first processing gas into the processing chamber; a second processing gas supply system configured to supply a second processing gas into the processing chamber; and a control unit configured to control the first processing gas supply system and the second processing gas supply system. Here, at least one of the first processing gas supply system and the second processing gas supply system includes two nozzles which are vertically arranged in a stacking direction of the substrates and have different shapes, and the control unit is configured to supply at least one of the first processing gas and the second processing gas into the processing chamber through the two nozzles having different shapes when films are formed on the substrates by supplying the first processing gas and the second processing gas into the processing chamber at pulses having different film-forming rates. | 08-04-2011 |
20110230057 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS - An excellent type of a film is realized by modifying conventional types of films. A carbonitride film of a predetermined thickness is formed on a substrate by performing, a predetermined number of times, a cycle including the steps of: supplying a source gas into a process vessel accommodating the substrate under a condition where a CVD reaction is caused, and forming a first layer including an element on the substrate; supplying a carbon-containing gas into the process vessel to form a layer including carbon on the first layer, and forming a second layer including the element and the carbon; supplying the source gas into the process vessel under a condition where a CVD reaction is caused to additionally form a layer including the element on the second layer, and forming a third layer including the element and the carbon; and supplying a nitrogen-containing gas into the process vessel to nitride the third layer, and forming a carbonitride layer serving as a fourth layer including the element, the carbon, and nitrogen. | 09-22-2011 |
20120108077 | SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - Disclosed is a substrate processing apparatus that includes: a substrate supporting member that supports a substrate; a processing chamber capable of housing the substrate supporting member; a rotating mechanism that rotates the substrate supporting member; a carrying mechanism that carries out the substrate supporting member from the processing chamber; a material gas supply system that supplies material gas into the processing chamber; a nitrogen-containing-gas supply system that supplies nitrogen containing gas into the processing chamber; and a controller that controls the material gas supply system, the nitrogen-containing-gas supply system, the carrying mechanism, and the rotating mechanism, after forming a nitride film on the substrate by using the material gas and the nitrogen containing gas, to carry out the substrate supporting member that supports the substrate while being rotated from the processing chamber. | 05-03-2012 |
20120214300 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS - Provided are a semiconductor device manufacturing method and a substrate processing apparatus that are capable of increasing a work function of a film to be formed, in comparison with a related art. A cycle including (a) supplying a metal-containing gas into a processing chamber where a substrate is accommodated (b) supplying a nitrogen-containing gas into the processing chamber; and (c) supplying one of an oxygen-containing gas, a halogen-containing gas and a combination thereof into the processing chamber, is performed a plurality of times to form a metal-containing film on the substrate. | 08-23-2012 |
20140073146 | Reaction Tube, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device - Provided are a reaction tube, a substrate processing apparatus, and a method of manufacturing a semiconductor device capable of suppressing a non-uniform distribution of a gas in a top region to improve the flow of the gas and film uniformity within and between substrate surfaces. The reaction tube has a cylindrical shape, accommodates a plurality of substrates stacked therein, and includes a cylindrical portion and a ceiling portion covering an upper end portion of the cylindrical portion, the ceiling portion having a substantially flat top inner surface. A thickness of a sidewall of the ceiling portion is greater than that of a sidewall of the cylindrical portion. | 03-13-2014 |
20140162454 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a method of manufacturing a semiconductor device. The method includes (a) loading a substrate into a processing chamber; (b) starting a supply of a first processing gas into the processing chamber; (c) starting a supply of a second processing gas into the processing chamber during the supply of the first processing gas; (d) stopping the supply of the second processing gas during the supply of the first processing gas; (e) stopping the supply of the first processing gas after performing the step (d); (f) removing the first processing gas and the second processing gas remaining after performing the step (e) from the processing chamber; and (g) unloading the substrate from the processing chamber. | 06-12-2014 |
20140295667 | Method of Manufacturing Semiconductor Device - To improve quality or manufacturing throughput of a semiconductor device, a method includes supplying a source gas to a substrate in a process chamber; exhausting an inside of the process chamber; supplying a reaction gas to the substrate; and exhausting the inside of the process chamber, wherein the source gas and/or the reaction gas is supplied in temporally separated pulses in the supply of the source gas and/or in the supply of the reaction gas. Then, the source gas and/or the reaction gas is supplied in temporally separated pulses to form a film during a gas supply time determined by a concentration distribution of by-products formed on a surface of the substrate. | 10-02-2014 |
20150225852 | METHOD OF FORMING METAL-CONTAINING FILM - Provided are a semiconductor device manufacturing method and a substrate processing apparatus that are capable of increasing a work function of a film to be formed, in comparison with a related art. The method comprises: (a) supplying a metal-containing gas simultaneously with one selected from the group consisting of an oxygen-containing gas, a halogen-containing gas and combinations thereof into a processing chamber accommodating the substrate; and (b) supplying a nitrogen-containing gas with one of the oxygen-containing gas, the halogen-containing gas and the combinations thereof into the processing chamber. | 08-13-2015 |
Patent application number | Description | Published |
20100297846 | Method of manufacturing a semiconductor device and substrate processing apparatus - A method of manufacturing a semiconductor device includes the steps of: forming a first metal film on the substrate placed in a processing chamber by alternately supplying at least one type of a metal compound that is an inorganic raw material and a reactant gas that has reactivity to the metal compound to the processing chamber more than once; forming a second metal film on the substrate by simultaneously supplying at least one type of a metal compound that is an inorganic raw material and a reactant gas that has reactivity to the metal compound to the processing chamber once so that the metal compound and the reactant gas are mixed with each other; and modifying at least one of the first metal film and the second metal film is modified using at least one of the reactant gas and an inert gas after at least one of the alternate supply process and the simultaneous supply process. It thus becomes possible to provide a dense, low-resistive metal film having a smooth film surface with a better quality in comparison with a titanium nitride film formed by the CVD method at a higher deposition rate, that is, at a higher productivity, in comparison with a titanium nitride film formed by the ALD method at a low temperature. | 11-25-2010 |
20110031593 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND SEMICONDUCTOR DEVICE - There are provided a method of manufacturing a semiconductor device, a substrate processing apparatus, and a semiconductor device. The method allows rapid formation of a conductive film, which has a low concentration of impurities permeated from a source owing to its dense structure, and a low resistivity. The method is performed by simultaneously supplying two or more kinds of sources into a processing chamber to form a film on a substrate placed in the processing chamber. The method comprises: performing a first source supply process by supplying at least one kind of source into the processing chamber at a first supply flow rate; and performing a second source supply process by supplying the at least one kind of source into the processing chamber at a second supply flow rate different from the first supply flow rate. | 02-10-2011 |
20110059600 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS - It is possible to efficiently remove deposited materials such as a conductive film or insulting film adhered to parts such as the inner wall of a processing chamber and a substrate supporting tool disposed in the processing chamber. There is provided a method of manufacturing a semiconductor device. The method comprises: loading a substrate into a processing chamber; forming a conductive film or an insulating film on the substrate by supplying a plurality of source gases into the processing chamber; unloading the substrate from the processing chamber; and modifying a conductive film or an insulating film adhered to the processing chamber by supplying a modifying gas into the processing chamber. After performing a cycle of the loading, the forming, the unloading, and the modifying processes a plurality of times, the modified conductive film or the modified insulating film adhered to the processing chamber is removed from the processing chamber by supplying a cleaning gas into the processing chamber. | 03-10-2011 |
20110290182 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS - It is possible to efficiently remove deposited materials such as a conductive film or insulting film adhered to parts such as the inner wall of a processing chamber and a substrate supporting tool disposed in the processing chamber. There is provided a method of manufacturing a semiconductor device. The method comprises: loading a substrate into a processing chamber; forming a conductive film or an insulating film on the substrate by supplying a plurality of source gases into the processing chamber; unloading the substrate from the processing chamber; and modifying a conductive film or an insulating film adhered to the processing chamber by supplying a modifying gas into the processing chamber. After performing a cycle of the loading, the forming, the unloading, and the modifying processes a plurality of times, the modified conductive film or the modified insulating film adhered to the processing chamber is removed from the processing chamber by supplying a cleaning gas into the processing chamber. | 12-01-2011 |
20130095668 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS - Provided is a semiconductor device manufacturing method of forming a film of less than one atomic layer on a substrate. The method includes (a) supplying a source gas into a processing chamber accommodating the substrate to adsorb the source gas on the substrate; (b) supplying a reactive gas different from the source gas into the processing chamber to cause a reaction of the reactive gas with the source gas adsorbed on the substrate before the source gas is saturatively adsorbed on the substrate; (c) removing an inner atmosphere of the processing chamber; and (d) supplying a modifying gas into the processing chamber to modify the source gas adsorbed on the substrate. | 04-18-2013 |
20140080317 | MEHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - A stress of a film formed on a substrate can be reduced. A method of manufacturing a semiconductor device includes: forming a film on the substrate by supplying a process gas to the substrate while heating the substrate to a first temperature; controlling a stress to the film by changing a stress value of the film formed on the substrate, by supplying a plasma-excited process gas to the substrate while changing a temperature of the substrate to a second temperature different from the first temperature; and unloading the substrate from the processor chamber. | 03-20-2014 |
20150214045 | Semiconductor Device Manufacturing Method and Substrate Processing Apparatus - Provided is a semiconductor device manufacturing method including: (a) supplying a source gas containing a first element and chlorine to a substrate accommodated in a processing chamber to form an adsorption layer of the source gas on the substrate; (b) supplying a chlorine-containing gas having a composition different from that of the source gas to the substrate while supplying the sources gas before an adsorption of the source gas to the substrate is saturated to suppress the adsorption of the source gas to the substrate; (c) removing the source gas and the chlorine-containing gas remaining on the substrate; (d) supplying a modifying gas including a second element to the substrate to form a layer including the first element and the second element on the substrate by modifying the adsorption layer of the source gas; and (e) removing the modifying gas remaining on the substrate. | 07-30-2015 |
20150262816 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - There are provided a method of manufacturing a semiconductor device, a substrate processing apparatus, and a semiconductor device. The method allows rapid formation of a conductive film, which has a low concentration of impurities permeated from a source owing to its dense structure, and a low resistivity. The method is performed by simultaneously supplying two or more kinds of sources into a processing chamber to form a film on a substrate placed in the processing chamber. The method comprises: performing a first source supply process by supplying at least one kind of source into the processing chamber at a first supply flow rate; and performing a second source supply process by supplying the at least one kind of source into the processing chamber at a second supply flow rate different from the first supply flow rate. | 09-17-2015 |
20150325447 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique of adjusting a work function. A method of manufacturing a semiconductor device includes forming a film having a predetermined thickness and containing a first metal element, carbon and nitrogen on a substrate by: (a) forming a first layer containing the first metal element and carbon by supplying a metal-containing gas containing the first metal element and a carbon-containing gas to the substrate M times and (b) forming a second layer containing the first metal element, carbon and nitrogen by supplying a nitrogen-containing gas to the substrate having the first layer formed thereon N times to nitride the first layer, wherein M and N are selected in a manner that a work function of the film has a predetermined value (where M and N are natural numbers). | 11-12-2015 |