Patent application number | Description | Published |
20080224198 | APPARATUS FOR WORKING AND OBSERVING SAMPLES AND METHOD OF WORKING AND OBSERVING CROSS SECTIONS - The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance. | 09-18-2008 |
20080302961 | SAMPLE RELOCATION METHOD IN CHARGED PARTICLE BEAM APPARATUS AND CHARGED PARTICLE BEAM APPARATUS AS WELL AS SAMPLE FOR TRANSMISSION ELECTRON MICROSCOPE - In a chamber of a charged particle beam apparatus, the sample on the sample substrate is gripped and carried to the sample holder, and there is controlled the attitude of the sample when the sample is fixed on the sample holder. There possesses a marking process applying, in the chamber, a marking to a surface of the sample Wb existing on the sample substrate by a beam, a carriage process gripping the sample by a sample gripping means and carrying it from the sample substrate to the sample holder, and an attitude control process controlling, when fixing the sample to the sample holder, the attitude of the sample while observing the marking applied to the surface of the sample. | 12-11-2008 |
20090114842 | Sample preparing device and sample posture shifting method - After a certain direction of a sample piece is allowed to coincide with an intersection line made by two planes of a surface of the sample and a conical side plane obtained by rotating, around a manipulator rotation axis, a line segment which is vertical to the surface of the sample and of which one end is an intersection of the surface of a sample and the manipulator rotation axis, the sample piece is supported by a manipulator and the manipulator rotation axis is operated. | 05-07-2009 |
20090134327 | Defect recognizing method, defect observing method, and charged particle beam apparatus - There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition. | 05-28-2009 |
20100008563 | Section processing method and its apparatus - a section processing method of the invention is the section processing method including a mark portion forming step of forming a mark portion capable of being processed by the removal processing and capable of identifying a mark shape in the section for observation within a range of capable of forming the section for observation at a vicinity of the observation target section, a section forming step of forming the section for observation by subjecting the sample and the mark portion to the removal processing within a range of including the mark portion formed by the mark portion forming step, and an observation image acquiring step of acquiring an observation image of the section for observation in the midst of being formed or after having been formed by the section forming step. | 01-14-2010 |
20100155624 | FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME, AND COMPUTER PROGRAM FOR FOCUSED ION BEAM PROCESSING - A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image. | 06-24-2010 |
20100213386 | FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME - A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers. | 08-26-2010 |
20110052044 | METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION - A cross-section processing and observation method includes: forming a cross section in a sample by a focused ion beam through etching processing; obtaining a cross-section observation image through cross-section observation by the focused ion beam; and forming a new cross section by performing etching processing in a region including the cross section and obtaining a cross-section observation image of the new cross section. A surface observation image of a region including a mark on the sample and the cross section is obtained. A position of the mark is recognized in the surface observation image and etching processing is performed on the cross section by setting, in reference to the position of the mark, a focused ion beam irradiation region in which to form the new cross section. Cross-section processing and observation is thus enabled continuously and efficiently using a focused ion beam apparatus having no SEM apparatus. | 03-03-2011 |
20110063431 | METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION - A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample. | 03-17-2011 |
20110186734 | Electron microscope and specimen analyzing method - An electron microscope includes: an electron beam column for irradiating a specimen with an electron beam; a specimen stage that supports the specimen; a scattered electron detector for detected backscattered electrons released from the specimen; and a focused ion beam column for irradiating the specimen with a focused ion beam. | 08-04-2011 |
20110226948 | Sample processing and observing method - There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella. | 09-22-2011 |