Patent application number | Description | Published |
20090047606 | Lithography meandering order - An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another. | 02-19-2009 |
20090057267 | Imprint lithography - A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. | 03-05-2009 |
20090146347 | Imprint lithography - An imprint template cover for an imprint template having a pattern feature thereon. The cover is configured such that, in use, it extends around the pattern feature of the imprint template, and such that the cover does not contact the pattern feature. | 06-11-2009 |
20100193994 | IMPRINT LITHOGRAPHY METHOD AND APPARATUS - An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint. | 08-05-2010 |
20100258274 | COOLING DEVICE UTILIZING INTERNAL SYNTHETIC JETS - A synthetic jet cooling device ( | 10-14-2010 |
20110049097 | IMPRINT LITHOGRAPHY METHOD AND APPARATUS - In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate. | 03-03-2011 |
20110079939 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed. | 04-07-2011 |
20110200795 | IMPRINT LITHOGRAPHY - An imprint lithography template is disclosed. The imprint lithography template includes a plurality of pattern features extending from a plane of a body of the imprint lithography template, and away from that body, the pattern features to be used to apply a pattern into an imprintable medium. The imprint lithography template further includes a plurality of assist features in the form of recesses extending from the plane of that body of the imprint lithography template, and into that body. A method for forming the assist features in the imprint lithography template, using self-assembled block copolymers as an etch resist, is also disclosed. | 08-18-2011 |
20120153538 | IMPRINT LITHOGRAPHY - A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. | 06-21-2012 |
20130160230 | VACUUM CLEANING DEVICE, COMPRISING A UNIT WITH A MOVABLE SURFACE FOR GENERATING AN OSCILLATING AIRFLOW - A vacuum cleaning device comprises a unit ( | 06-27-2013 |
20130269151 | VACUUM CLEANING DEVICE, COMPRISING A UNIT WITH A MOVABLE SURFACE FOR GENERATING AN OSCILLATING AIRFLOW - A vacuum cleaning device comprises a unit ( | 10-17-2013 |
20140047669 | VACUUM CLEANING DEVICE - A vacuum cleaning device comprises a unit ( | 02-20-2014 |
20140047714 | NOZZLE PLATE FABRICATION - There is provided a method of improving the yield of a nozzle plate fabrication process, the method comprising determining a variation in the size of nozzles in a nozzle plate from a predetermined size or range of sizes for the nozzles, the nozzles in the nozzle plate having been fabricated using a plurality of mandrels, each mandrel defining a respective nozzle in the nozzle plate and determining modifications to the size of one or more mandrels in the plurality of mandrels to compensate for the determined variation in the size of nozzles in the nozzle plate. Also provided is a method of fabricating a nozzle plate, the method comprising fabricating a nozzle plate having a plurality of nozzles using a plurality of mandrels on a substrate, each mandrel defining a respective nozzle in the nozzle plate, the mandrels in the plurality of mandrels having varying sizes in order to compensate for local variations in the fabrication process that would result in local variations in the size of nozzles in the nozzle plate from a predetermined size or range of sizes. | 02-20-2014 |
20140199485 | IMPRINT LITHOGRAPHY - A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head; or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. | 07-17-2014 |
20140346245 | NEBULIZER, A CONTROL UNIT FOR CONTROLLING THE SAME, A NEBULIZING ELEMENT AND A METHOD OF OPERATING A NEBULIZER - There is provided a control unit for controlling the operation of a nebulizer, the nebulizer comprising a reservoir chamber for storing a liquid to be nebulised, an actuator, and a nebulizing element comprising a plurality of nozzles arranged to nebulize the liquid upon operation of the actuator; wherein the control unit is configured to obtain an indication of the size of the nozzles in the nebulizing element; and control the operation of the actuator based on the obtained indication to provide nebulised liquid at a required output rate and/or with droplets of a required size. | 11-27-2014 |
20150020804 | ANALYSIS AND CONTROL OF AEROSOL FLOW - An aerosol generation system has a light source arrangement which provides signals at first and second wavelengths, and the detected light signals are recorded. The detected signals are processed to derive at least a measure of the aerosol particle size. This can be used in combination with the other parameters which are conventionally measured, namely the aerosol density and flow velocity. Thus, optical measurement (possibly in combination with an air flow measurement) can be used to estimate the aerosol output rate as well as the particle size. | 01-22-2015 |