Jang, Chungcheongnam-Do
Bonghee Jang, Chungcheongnam-Do KR
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20130029473 | METHOD OF CLEAVING SUBSTRATE AND METHOD OF MANUFACTURING BONDED SUBSTRATE USING THE SAME - A method of cleaving a substrate and a method of manufacturing a bonded substrate using the same, in which warping in a cleaved substrate is reduced. The method includes the following steps of: forming an ion implantation layer by implanting ions into a substrate; annealing the substrate in which the ion implantation layer is formed; implanting ions again into the ion implantation layer of the substrate; and cleaving the substrate along the ion implantation layer by heating the substrate into which ions are implanted. | 01-31-2013 |
20130049009 | Substrate For Vertical Light-Emitting Diode - A multi-layer substrate for a vertical light-emitting diode (LED) includes a conductive and reflective base substrate and an n-type gallium nitride (GaN) layer formed on the base substrate. | 02-28-2013 |
20130093059 | Bonded Substrate And Method Of Manufacturing The Same - A bonded substrate, the surface roughness of which is reduced, and a method of manufacturing the same. The bonded substrate includes a base substrate and an intermediate layer disposed on the base substrate. The intermediate layer has a greater bubble diffusivity than the base substrate. A thin film layer is bonded onto the intermediate layer, and has a different chemical composition from the base substrate. | 04-18-2013 |
20130093063 | BONDED SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A bonded substrate having a plurality of grooves and a method of manufacturing the same. The method includes the following steps of implanting ions into a first substrate, thereby forming an ion implantation layer, bonding the first substrate to a second substrate having a plurality of grooves in one surface thereof such that the first substrate is bonded to the one surface, and cleaving the first substrate along the ion implantation layer. | 04-18-2013 |
Eun-Hye Jang, Chungcheongnam-Do KR
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20140171752 | APPARATUS AND METHOD FOR CONTROLLING EMOTION OF DRIVER - An apparatus for controlling emotion of a driver includes an emotion sensor unit configured to collect a biomedical signal from the driver, and generate biomedical information data based on the collected biomedical signal, a user memory unit configured to store driver information that includes biomedical signals for respective emotional states of the driver and a plurality of correspondence contents, and deliver the driver information and the correspondence content in response to a received request, and an emotion management unit configured to determine the emotional state of the driver from the driver information received from the user memory unit and the biomedical information data received from the emotion sensor unit, request a correspondence content corresponding to the determined emotional state of the driver from the user memory unit, and provide the driver with the content received from the user memory unit. | 06-19-2014 |
Gil Sun Jang, Chungcheongnam-Do KR
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20130130497 | PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE - Provided is a production method for a semiconductor device comprising a metal silicide layer. According to one embodiment of the present invention, the production method for a semiconductor device comprises the steps of: forming an insulating layer on a substrate, on which a polysilicon pattern has been formed, in such a way that the polysilicon pattern is exposed; forming a silicon seed layer on the exposed polysilicon pattern that has been selectively exposed with respect to the insulating layer; forming a metal layer on the substrate on which the silicon seed layer has been formed; and forming a metal silicide layer by carrying out a heat treatment on the substrate on which the metal layer has been formed. | 05-23-2013 |
20130178066 | METHOD AND APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL-STRUCTURE MEMORY DEVICE - Provided is a method of manufacturing a memory device having a 3-dimensional structure, which includes alternately stacking one or more dielectric layers and one or more sacrificial layers on a substrate, forming a through hole passing through the dielectric layers and the sacrificial layers, forming a pattern filling the through hole, forming an opening passing through the dielectric layers and the sacrificial layers, and supplying an etchant through the opening to remove the sacrificial layers. The stacking of the dielectric layers includes supplying the substrate with one or more gases selected from the group consisting of SiH | 07-11-2013 |
20140261186 | METHOD AND APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL-STRUCTURE MEMORY DEVICE - Provided is a method of manufacturing a memory device having a 3-dimensional structure, which includes alternately stacking one or more dielectric layers and one or more sacrificial layers on a substrate, forming a through hole passing through the dielectric layers and the sacrificial layers, forming a pattern filling the through hole, forming an opening passing through the dielectric layers and the sacrificial layers, and supplying an etchant through the opening to remove the sacrificial layers. The stacking of the dielectric layers includes supplying the substrate with one or more gases selected from the group consisting of SiH | 09-18-2014 |
Hee-Heon Jang, Chungcheongnam-Do KR
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20110166399 | METHOD FOR IMPROVING PRODUCTIVITY AND PROCESS STABILITY IN STYRENE MANUFACTURING SYSTEM HAVING MULTIPLE REACTORS CONNECTED IN SERIES - Provided is a method for improving productivity and process stability in styrene monomer manufacturing system which uses ethylbenzene dehydrogenation and multiple reactors connected in series by divergence of the feed containing steam and ethylbenzene and injection thereof into a certain point of the system. | 07-07-2011 |
Hyun Tae Jang, Chungcheongnam-Do KR
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20110172084 | PREPARATION OF MESO-POROUS POLYMER BASED NANO-POLYMERIZED COMPOSITE MATERIAL - Disclosed herein is a method for preparation of a mesoporous polymer nano-composite material, more particularly, a method for preparation of a meso-porous polymer nano-polymerized composite material which includes: drying a solid material having pores under vacuum at ambient temperature and pressure; adding a first organic solvent to the vacuum dried solid material in the reactor and dispersing the first organic solvent in pores of the solid material by an ultrasonicator to remove air while wetting a surface of the solid material with acetonitrile; adding a constant amount of a material having radicals or functional groups relative to weight of the mixture containing the solid material and the first organic solvent in a reactor, which was prepared in the above step, and agitating the mixture; introducing a polymerization initiator into the reactor containing the mixture prepared in the above step, in order to initiate polymerization of the mixture in the reactor; using a second organic solvent to filter and wash the reaction product after completion of the polymerization, in order to remove the unreacted material having radicals or functional groups as well as the polymerization initiator from the product; and drying the treated product to eliminate the second organic solvent from the same after removal of the unreacted material having radicals or functional groups as well as the polymerization initiator from the product. | 07-14-2011 |
Jae Hyeok Jang, Chungcheongnam-Do KR
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20100233356 | Preparation of Prussian Blue Coating Film for Electrochromic Device - The present invention relates to a method for preparing a Prussian blue coating film for an electrochromic device, more particularly to a method for preparing a Prussian blue coating film for an electrochromic device comprising an electrochromic layer coated on a light transmitting substrate including a coating of a transparent electrode, an ion storage layer coated on another light transmitting substrate including a coating of a transparent electrode and an electrolyte layer formed between the electrochromic layer and the ion storage layer, wherein the ion storage layer is formed with a specific nano-dispersed composition comprising Prussian blue by wet coating, thereby providing comparable or better physical properties, including light transmittance, response time, durability, etc., when compared with the conventional electrochemical techniques, simplifying the manufacturing processes and significantly improving the productivity. With improved economic advantages, the present invention enables the realization of large-sized electrochromic devices. | 09-16-2010 |
Jin Wook Jang, Chungcheongnam-Do KR
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20110309700 | CONNECTING MOLDING FOR AUTOMATION OF THREE-PHASE MOTOR WINDING - The present invention relates to a connection molding for automation of a three- phase motor winding, which specifically comprises: a fixed coil part fixed inside of a main body, a coil part installed within the fixed coil part, a central shaft fixed to the main body and passing through the coil part, and a connector part coupled to the top of the coil part so that the coil of the coil part is connected thereto and the central shaft passes and is coupled therethrough. | 12-22-2011 |
Keon Jang, Chungcheongnam-Do KR
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20100103827 | SYSTEM AND METHOD FOR ESTIMATING INTERNET-WIDE TRANSMISSION PATH AND TRANSMISSION DELAY - Disclosed herein is a system and method for estimating an Internet-wide transmission path and transmission delay. The system includes indexing construction means configured to function as storage for storing the results of actual measurement of transmission delay for all destinations on the Internet, and configured to, in order to search for necessary actual measurement results using Autonomous System (AS) numbers, translate IP addresses constituting the actual measurement results into AS numbers and index respective path segments with AS numbers, mapping means for mapping the IP addresses of queried two points to AS numbers, AS path estimation means for estimating an AS path between the two AS numbers, and path stitching means for searching for respective path segments constituting the estimated AS path, stitching the found path segments together and stitching IP paths corresponding to the AS path, thereby obtaining a plurality of stitched paths and corresponding transmission delay. | 04-29-2010 |
Kun Yong Jang, Chungcheongnam-Do KR
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20090058250 | Filter for display apparatus - A filter for a display apparatus is placed in front of a display panel, wherein CIE chromaticity coordinates of the filter under a standard of a D65 light source have values of −2.0≦a*≦2.0 and −2.0≦b*≦2.0. The CIE chromaticity coordinates of the filter under the standard of the D65 light source have a value of 60≦L*≦80. The colorants include a first colorant absorbing 380 nm to 480 nm wavelength light, a second colorant absorbing 450 nm to 550 nm wavelength light, and a third colorant absorbing 560 nm to 620 nm wavelength light. The first to third colorants can be contained in at least one of a color compensating layer, a low-refraction layer having a refractive index of 1.5 or less, an external light shielding layer, a hard coating layer and an adhesive layer. | 03-05-2009 |
20110007398 | DISPLAY FILTER AND PROTECTIVE CASE HAVING GRADATION - A display filter having a gradation, in use for a display device has a display module therein. The display filter includes a base substrate; and a light blocking section having a light blocking material formed on a periphery area of the base substrate to define an effective image-displaying area of the base substrate. The light blocking material blocks light, and at least a portion of the light blocking section becomes gradually darker in a predetermined direction. | 01-13-2011 |
20110032622 | OPTICAL FILTER FOR DISPLAY DEVICE - An optical filter for a display device includes a base substrate, an EMI shielding coating formed directly on an upper surface of the base substrate to filter EMI, and a color control resin coating applied directly on a lower surface of the base substrate or an upper surface of the EMI shielding coating. Due to the EMI shielding coating and the color control resin coating formed directly on the base substrate, it is possible to simplify a manufacturing process, improve productivity, and reduce manufacturing costs. | 02-10-2011 |
Kyung Doc Jang, Chungcheongnam-Do KR
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20100158094 | APPARATUS AND METHOD FOR OFDM CHANNEL EQUALIZATION - An apparatus and method for orthogonal frequency division multiplexing (OFDM) channel equalization are disclosed. The apparatus includes a compensation value setting unit setting a compensation value in the form of a diagonal matrix by use of a diagonal matrix of diagonal elements extracted from a channel matrix of an OFDM receiver, and a preset divergence suppression value, an initial estimation value calculation unit calculating an initial estimate value by use of a fast Fourier transform (FFT)-processed signal of the OFDM receiver and the compensation value, an equalization unit detecting a transmission signal to be processed by use of the compensation value, the channel matrix and the diagonal matrix, and a symbol decision unit determining a symbol for an adjacent signal of a transmission signal, which is to be processed among a plurality of signals output from the equalization unit, and providing the symbol-determined adjacent signal to the equalization unit. | 06-24-2010 |
Seok Jun Jang, Chungcheongnam-Do KR
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20150129000 | APPARATUS FOR CLEANING A SUBSTRATE - An apparatus for cleaning a substrate includes a substrate transferring unit configured to support a substrate at a polar angle from a first direction, and transfer the substrate along a second direction orthogonal to the first direction. A cleaning unit is disposed on the substrate transferring unit. The cleaning unit includes a plurality of two-fluid nozzles. The cleaning unit has an azimuth angle from the first direction. The two-fluid nozzles mix a cleaning solution and compressed gas together and spray the mixture. | 05-14-2015 |
Seon Hee Jang, Chungcheongnam-Do KR
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20120171366 | METHOD FOR FORMING WIRING AND ELECTRODE USING METAL NANO PASTE - Disclosed herein is a method for forming a metal wiring and an electrode using a metal nano paste, including a sintering process, wherein the sintering includes: placing a substrate on which a metal nano paste is printed in a furnace and raising a temperature of the furnace to 220 to 240° C. under a nitrogen atmosphere; heating the substrate under a mixed atmosphere of carboxylic acid and air while the temperature of the furnace is maintained at the temperature range; | 07-05-2012 |
20130156951 | METHOD FOR MANUFACTURING SILICON OXIDE NANO WIRES - Disclosed herein is a method for manufacturing silicon oxide nano wires, the method including: a metal nano particle applying step of applying metal nano particles to a silicon wafer; and a heat treatment step of performing heat treatment under an atmosphere of reactive gas including hydrogen gas. Therefore, the silicon oxide nano wires may be manufactured by a simple process and a separate silicon source needs not to be injected, such that a manufacturing cost may be decreased and manufacturing efficiency may be improved, as compared with methods according to the related art. | 06-20-2013 |
Sung-Ho Jang, Chungcheongnam-Do KR
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20090101180 | Substrate treating apparatus and method of manufacturing the same - Provided are a substrate treating apparatus and a method of manufacturing the substrate treating apparatus. Processing units of a process equipment are modularized, and the modularized processing units are detachably disposed in a main frame. According to this characteristic, work time and work effort required for manufacturing the process equipment can be reduced. In addition, maintenance/repair of each of the processing units can be further easily performed. | 04-23-2009 |
Yong-Ju Jang, Chungcheongnam-Do KR
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20090056765 | SINGLE TYPE SUBSTRATE TREATING APPARATUS AND CLEANING METHOD THEREOF - Provided is a single type substrate treating apparatus and a cleaning method the substrate treating apparatus. A cleaning process is periodically performed on a substrate support member after a series of repeated substrate treating processes is performed to remove contaminants remaining on the substrate support member and minimize thermal deformation of the substrate support member due to a high temperature chemical solution. | 03-05-2009 |
Yong Su Jang, Chungcheongnam-Do KR
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20130284093 | SUBSTRATE TREATING APPARATUS - Provided is a substrate treating apparatus. The substrate treating apparatus includes a process chamber providing an inner space in which a substrate is treated, a substrate support member disposed within the process chamber to support the substrate, a showerhead disposed to face the substrate support member and partitioning the inner space into an upper space and a lower space, the showerhead having a plasma supply hole through which the upper space and the lower space communicate with each other, an excitation gas supply unit supplying an excitation gas into the upper space, a process gas supply unit supplying a process gas into the lower space, and a microwave apply unit applying a microwave into the upper space. | 10-31-2013 |
Yun-Sung Jang, Chungcheongnam-Do KR
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20120000775 | Apparatus for Forming Electronic Material Layer - Disclosed is an apparatus for forming an electronic material layer, in which charged particles damaging the electronic material layer are prevented from arriving at a substrate but processing gas ions maximizing activation of the electronic material layer are accelerated and passed while the electronic material layer is formed on the substrate or the substrate having a functional layer thereon by sputtering, thereby forming the electronic material layer having good electrical/physical characteristics at room temperature. | 01-05-2012 |
20130161184 | APPARATUS FOR FORMING GAS BLOCKING LAYER AND METHOD THEREOF - A gas blocking layer forming apparatus comprises a vacuum chamber that provides a space where a chemical vapor deposition process and a sputtering process are performed; a holding unit that is provided at a lower side within the vacuum chamber and mounts thereon a target object on which an organic/inorganic mixed multilayer gas blocking layer is formed; a neutral particle generation unit that is provided at an upper side within the vacuum chamber and generates a neutral particle beam having a high-density flux with a current density of about 10 A/m | 06-27-2013 |